Abstract: Deposition of carbene monolayers that excluded starting anions, such as iodide ions, has been achieved. Anions such as iodide are a typical contaminant in carbene hydrogen carbonate salts when synthesized using the state-of-the-art method. A method is described for eliminating substantially all starting anion (e.g., iodide) contamination from the monolayer. Air stable, purified carbenes precursors were used to deposit an intact monolayer on the surface of some industrially relevant metals. The monolayer's ability to protect these metals against, for example, oxidation has been demonstrated.

Abstract: Deposition of carbene monolayers that excluded starting anions, such as iodide ions, has been achieved. Anions such as iodide are a typical contaminant in carbene hydrogen carbonate salts when synthesized using the state-of-the-art method. A method is described for eliminating substantially all starting anion (e.g., iodide) contamination from the monolayer. Air stable, purified carbenes precursors were used to deposit an intact monolayer on the surface of some industrially relevant metals. The monolayer's ability to protect these metals against, for example, oxidation has been demonstrated.