Abstract: An incandescent lamp that emits infrared light and a method of making the lamp includes a filament assembly inside a polycrystalline aluminum oxide (PCA) envelope, where the filament assembly preferably has a coiled tungsten filament, solid metal ends of tungsten or molybdenum attached to the coiled tungsten filament, and leads at distal ends of the solid metal ends. End caps are attached to ends of the envelope and have openings through which a respective one of the leads extends, where the leads are each made of an electrically conductive material having a coefficient of thermal expansion compatible with the end caps, such as niobium. The leads are attached to the end caps with glass-ceramic sealing frits. The end caps and sealing frits seal a suitable gas inside the envelope.

Abstract: An amalgam assembly for a fluorescent lamp includes a glass exhaust tubulation extending toward a base portion of the lamp, the tubulation being closed at an end thereof adjacent the lamp base portion, and a retaining structure disposed in the tubulation and retained by a pinched portion of the tubulation. A mercury amalgam body is disposed in the tubulation between the retaining structure and the tubulation closed end. The amalgam body includes lithium for wetting internal surfaces of the glass tubulation to cause the amalgam to adhere to the tubulation internal surfaces when the amalgam body is liquidized, and to thereby prevent the amalgam from flowing past the retaining structure and into the lamp envelope.

Abstract: A method for making a tantala/silica interference filter on a vitreous substrate, which filter retains integrity at temperatures in excess of 600.degree. C., includes the steps of depositing by low pressure chemical vapor deposition a first coating of tantala/silica on the substrate, heat treating the first coating, and depositing by low pressure chemical vapor deposition a second coating of tantala/silica, the first and second coatings in combination providing a tantala/silica interference filter with a thickness of at least 3.5 microns on the vitreous substrate. There is further presented an electric lamp having an envelope and an interference filter applied thereto, in accordance with the above method.

Abstract: An apparatus and method for the controlled delivery of vaporized chemical precursor to an LPCVD reactor is disclosed. A liquid flow controller is closely coupled with a highly efficient liquid vaporizer. The liquid flow controller, which contains no moving parts or polymeric seals, employs as a basic element an efficient gas-liquid separator downstream of the flow control element which assures that an uninterrupted constant velocity flow of liquid enters the high-temperature zone of the vaporizer. When the output of the vaporized-precursor delivery system is linked with the gas inlet of an LPCVD reactor, the very precise vapor delivery rates obtained translate into very precisely controlled thin film deposition rates.

Abstract: Method and apparatus for the controlled delivery of vaporized chemical precursor to a low pressure chemical vapor deposition (LPCVD) reactor. A flow of liquid precursor containing dissolved inert gas is passed through a restrictor element. The dissolved inert gas is released from the liquid precursor at or near the downstream side of the restrictor element. The inert gas is separated from the liquid precursor, thereby producing a continuous flow of liquid precursor, and this flow is fed into an inlet of a-vaporizer. The vaporized precursor is delivered into an LPCVD reactor.

Abstract: An apparatus and method for the low temperature deposition of SiO.sub.2 in a low pressure chemical vapor deposition system is disclosed. The apparatus makes use of a prereactor to form an activated form of diacetoxyditertiarybutoxysilane (DADBS) from which SiO.sub.2 is deposited. The prereactor may be positioned upstream of an SiO.sub.2 deposition reactor or may be incorporated into the front end thereof.

Abstract: A method for controlling the water present in hydrogen fluoride is described which effectively removes all the water contained in the hydrogen fluoride solution to form other compounds that either have extremely low vapor pressure or are acceptable in a process such as chemical vapor purification. The method involves as one of the steps the contacting of a reactive metal halide with a hydrogen fluoride containing water. The metal halide reacts with the water contained in the hydrogen fluoride solution yielding a metal oxide, hydrogen halide, and anhydrous hydrogen fluoride. The metal oxide is a solid, with low vapor pressure, thereby effectively removing oxygen-bearing species from the hydrogen fluoride.

Abstract: A laser device with a discharge tube forming a closed envelope with cylindrical end portions connected by an elongated constricted center portion and having external electrodes at the end portions, fed from a source of short pulses with a width measured in nanoseconds, capacity coupled to the discharge plasma. The discharge plasma may include metal vapor, a metal halide, including mercury halide, and internal electrodes may be included in the closed envelope but coupled to the external electrodes by capacity coupling so as to avoid any connections from electrodes passing through the glass or fused silica envelope.

Abstract: Molybdenum is removed from an aqueous solution containing tungsten and molybdenum by extracting the molybdenum from the aqueous solution having a pH greater than 8.5 with a liquid organic extractant containing a preferred complexing agent, 3,4-dimercaptotoluene.

Abstract: A catalytic process for the reduction to elemental sulfur of the sulfur dioxide contained in gas streams using a reducing gas such as hydrogen, or preferably carbon monoxide, in a reactor charged with a material represented by the general formula M.sup.II M.sub.2.sup. III O.sub.4 crystallized in the spinel structure wherein M.sup.II is a divalent metal and M.sup.III is a trivalent metal from the first transition period of the Periodic Table of the Elements, or derivatives of the materials of the above formula resulting from pretreatment with hydrogen or, preferably carbon monoxide, and/or exposure to the sulfur dioxide-containing gas stream.