Patents by Inventor Joseph E. Oberlander
Joseph E. Oberlander has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 8088548Abstract: Developable bottom antireflective coating compositions are provided.Type: GrantFiled: October 23, 2007Date of Patent: January 3, 2012Assignee: AZ Electronic Materials USA Corp.Inventors: Francis M. Houlihan, Shinji Miyazaki, Mark O. Neisser, Alberto D. Dioses, Joseph E. Oberlander
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Patent number: 8039202Abstract: The present invention relates to a positive bottom photoimageable antireflective coating composition which is capable of being developed in an aqueous alkaline developer, wherein the antireflective coating composition comprises a polymer comprising at least one recurring unit with a chromophore group and one recurring unit with a hydroxyl and/or a carboxyl group, a vinyl ether terminated crosslinking agent, and optionally, a photoacid generator and/or an acid and/or a thermal acid generator. The invention further relates to a process for using such a composition.Type: GrantFiled: October 24, 2007Date of Patent: October 18, 2011Assignee: AZ Electronic Materials USA Corp.Inventors: Yu Sui, Hengpeng Wu, Wenbing Kang, Mark O. Neisser, Tomohide Katayama, Shuji S. Ding-Lee, Aritaka Hishida, Joseph E. Oberlander, Medhat E. Toukhy
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Patent number: 7824837Abstract: The present invention relates to a positive bottom photoimageable antireflective coating composition which is capable of being developed in an aqueous alkaline developer, wherein the antireflective coating composition comprises a polymer comprising at least one recurring unit with a chromophore group and one recurring unit with a hydroxyl and/or a carboxyl group, a vinyl ether terminated crosslinking agent, and optionally, a photoacid generator and/or an acid and/or a thermal acid generator. The invention further relates to a process for using such a composition.Type: GrantFiled: October 22, 2007Date of Patent: November 2, 2010Assignee: AZ Electronic Materials USA Corp.Inventors: Hengpeng Wu, Mark O. Neisser, Shuji S Ding-Lee, Aritaka Hishida, Joseph E. Oberlander, Medhat E. Toukhy
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Patent number: 7754414Abstract: Antireflective coating compositions with reduced outgassing are disclosed.Type: GrantFiled: July 12, 2006Date of Patent: July 13, 2010Assignee: AZ Electronic Materials USA Corp.Inventor: Joseph E. Oberlander
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Publication number: 20090104559Abstract: Developable bottom antireflective coating compositions are provided.Type: ApplicationFiled: October 23, 2007Publication date: April 23, 2009Inventors: Francis M. Houlihan, Shinjl Miyazaki, Mark O. Neisser, Alberto D. Dioses, Joseph E. Oberlander
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Publication number: 20080014529Abstract: Antireflective coating compositions with reduced outgassing are disclosed.Type: ApplicationFiled: July 12, 2006Publication date: January 17, 2008Inventor: Joseph E. Oberlander
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Publication number: 20070270625Abstract: The present invention provides for a method for treating polysilazane waste material.Type: ApplicationFiled: May 18, 2006Publication date: November 22, 2007Inventors: Joshua Gurman, Joseph E. Oberlander, Bruce Kiker, Tom Carl
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Patent number: 7264913Abstract: The present invention relates to a novel antireflective coating composition comprising a polymer, a crosslinking agent and an acid generator. The present invention further relates to a process for using the novel composition, particularly at 193 nm. The polymer of the present invention contains at least one unit selected from structures 1, 2 and 3, where, Y is a hydrocarbyl linking group of 1 to about 10 carbon atoms, R, R1, R? and R? are independently hydrogen, hydrocarbyl group of 1 to about 10 carbon atoms, halogen, —O(CO)Z, —C(CF3)2Z, —C(CF3)2(CO)OZ, —SO2CF3, —(CO)OZ, —SO3Z, —COZ, —OZ, —NZ2, —SZ, —SO2Z, —NHCOZ, —NZCOZ or —SO2NZ2, where Z is H or a hydrocarbyl group of 1 to about 10 carbon atoms, n=1–4, X is O, CO, S, COO, CH2O, CH2COO, SO2, NH, NL, OWO, OW, W, and where L and W are independently hydrocarbyl groups of 1 to about 10 carbon atoms, and m=0–3.Type: GrantFiled: November 21, 2002Date of Patent: September 4, 2007Assignee: AZ Electronic Materials USA Corp.Inventors: Hengpeng Wu, Shuji Ding-Lee, Zhong Xiang, Joseph E. Oberlander, Mark O. Neisser, Eleazar Gonzalez, Jainhui Shan
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Patent number: 7078157Abstract: A composition that comprises a photopolymerizable compound containing at least two pendant unsaturated groups; at least one ethylenically unsaturated photopolymerizable polyalkylene oxide hydrophilic monomer; at least one nonionic surfactant; and at least one photoinitiator is provided. The composition also preferably contains at least one amine modified acrylic oligomer and a dye. Other conventional photoresist components such as photosensitizers, adhesion promoters, leveling agents and solvents may also be included in the composition. Such compositions are useful for forming a pattern on a substrate, such as patterning microlithographic circuits on a substrate.Type: GrantFiled: February 27, 2003Date of Patent: July 18, 2006Assignee: AZ Electronic Materials USA Corp.Inventors: Hong Zhuang, Joseph E. Oberlander, Ping-Hung Lu, Stanely F. Wanat, Robert R. Plass
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Patent number: 7070914Abstract: Disclosed is a process for forming an image on a substrate, comprising the steps of: (a) coating on the substrate a first layer of a radiation sensitive, antireflective composition; (b) coating a second layer of a photoresist composition onto the first layer of the antireflective composition; (c) selectively exposing the coated substrate from step (b) to actinic radiation; and (d) developing the exposed coated substrate from step (c) to form an image; wherein both the photoresist composition and the antireflective composition are exposed in step (c); both are developed in step (d) using a single developer; wherein the antireflective composition of step (a) is a first minimum bottom antireflective coating (B.A.R.C.) composition, having a solids content of up to about 8% solids, and a maximum coating thickness of the coated substrate of ? 2 ? n wherein ? is the wavelength of the actinic radiation of step (c) and n is the refractive index of the B.A.R.C. composition.Type: GrantFiled: January 9, 2002Date of Patent: July 4, 2006Assignee: AZ Electronic Materials USA Corp.Inventors: Mark O. Neisser, Joseph E. Oberlander, Medhat A. Toukhy, Raj Sakamuri, Shuji Ding-Lee
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Patent number: 6911293Abstract: Disclosed is a photoresist composition comprising: a) at least one film forming resin selected from the group consisting of novolak resins, and polyhydroxystyrenes; b) at least one photoactive compound or photoacid generator; and c) a solvent composition comprising at least one solvent selected from the group consisting of acetals and ketals. Also disclosed is a photoresist composition comprising a polycarbonate resin and a solvent composition comprising at least one solvent selected from the group consisting of acetals and ketals. Also disclosed is a process for imaging a photoresist composition, comprising the steps of: a) coating a suitable substrate with any of the aforementioned photoresist compositions; b) baking the substrate to substantially remove the solvent; c) imagewise irradiating the photoresist film; and d) removing the imagewise exposed or, alternatively, the unexposed areas of the coated substrate with a suitable developer.Type: GrantFiled: April 11, 2002Date of Patent: June 28, 2005Assignee: Clariant Finance (BVI) LimitedInventors: Stanley F. Wanat, Joseph E. Oberlander, Robert R. Plass, Douglas McKenzie
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Patent number: 6844131Abstract: The present invention relates to a novel absorbing, photoimageable and aqueous developable positive-working antireflective coating composition comprising a photoacid generator and a polymer comprising at least one unit with an acid labile group and at least one unit with an absorbing chromophore. The invention further relates to a process for using such a composition. The present invention also relates to a novel absorbing, photoimageable and aqueous alkali developable positive-working antireflective coating composition comprising a polymer comprising at least one unit with an acid labile group, a dye and a photoacid generator. The invention further relates to a process for using such a composition. The invention also relates to a novel process for forming a positive image with a positive photoresist and a novel photoimageable and aqueous developable positive-working antireflective coating composition, where the antireflective coating comprises a polymer comprising an acid labile group.Type: GrantFiled: January 9, 2002Date of Patent: January 18, 2005Assignee: Clariant Finance (BVI) LimitedInventors: Joseph E. Oberlander, Ralph R. Dammel, Shuji Ding-Lee, Mark O. Neisser, Medhat A. Toukhy
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Publication number: 20040175653Abstract: A composition that comprises a photopolymerizable compound containing at least two pendant unsaturated groups; at least one ethylenically unsaturated photopolymerizable polyalkylene oxide hydrophilic monomer; at least one nonionic surfactant; and at least one photoinitiator is provided. The composition also preferably contains at least one amine modified acrylic oligomer and a dye. Other conventional photoresist components such as photosensitizers, adhesion promoters, leveling agents and solvents may also be included in the composition. Such compositions are useful for forming a pattern on a substrate, such as patterning microlithographic circuits on a substrate.Type: ApplicationFiled: February 27, 2003Publication date: September 9, 2004Inventors: Hong Zuang, Joseph E. Oberlander, Ping-Hung Lu, Stanely F. Wanat, Robert R. Plass
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Publication number: 20040101779Abstract: The present invention relates to a novel antireflective coating composition comprising a polymer, a crosslinking agent and an acid generator. The present invention further relates to a process for using the novel composition, particularly at 193 nm.Type: ApplicationFiled: November 21, 2002Publication date: May 27, 2004Inventors: Hengpeng Wu, Shuji Ding-Lee, Zhong Xiang, Joseph E. Oberlander, Mark O. Neisser, Eleazar Gonzalez, Jainhui Shan
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Publication number: 20030215736Abstract: The present invention relates to novel negative-working, photoimageable, and aqueous developable antireflective coating compositions and their use in image processing by forming a thin layer of the novel antireflective coating composition between a reflective substrate and a photoresist coating. The negative bottom photoimageable antireflective coating composition is capable of being developed in an alkaline developer and is coated below a negative photoresist.Type: ApplicationFiled: December 18, 2002Publication date: November 20, 2003Inventors: Joseph E. Oberlander, Ralph R. Dammel, Shuji Ding-Lee, Mark O. Neisser, Medhat A. Toukhy
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Publication number: 20030194636Abstract: Disclosed is a photoresist composition comprising: a) at least one film forming resin selected from the group consisting of novolak resins, and polyhydroxystyrenes; b) at least one photoactive compound or photoacid generator; and c) a solvent composition comprising at least one solvent selected from the group consisting of acetals and ketals. Also disclosed is a photoresist composition comprising a polycarbonate resin and a solvent composition comprising at least one solvent selected from the group consisting of acetals and ketals. Also disclosed is a process for imaging a photoresist composition, comprising the steps of: a) coating a suitable substrate with any of the aforementioned photoresist compositions; b) baking the substrate to substantially remove the solvent; c) imagewise irradiating the photoresist film; and d) removing the imagewise exposed or, alternatively, the unexposed areas of the coated substrate with a suitable developer.Type: ApplicationFiled: April 11, 2002Publication date: October 16, 2003Inventors: Stanley F. Wanat, Joseph E. Oberlander, Robert R. Plass, Douglas McKenzie
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Publication number: 20030129531Abstract: The present invention relates to a novel absorbing, photoimageable and aqueous developable positive-working antireflective coating composition comprising a photoacid generator and a polymer comprising at least one unit with an acid labile group and at least one unit with an absorbing chromophore. The invention further relates to a process for using such a composition. The present invention also relates to a novel absorbing, photoimageable and aqueous alkali developable positive-working antireflective coating composition comprising a polymer comprising at least one unit with an acid labile group, a dye and a photoacid generator. The invention further relates to a process for using such a composition. The invention also relates to a novel process for forming a positive image with a positive photoresist and a novel photoimageable and aqueous developable positive-working antireflective coating composition, where the antireflective coating comprises a polymer comprising an acid labile group.Type: ApplicationFiled: January 9, 2002Publication date: July 10, 2003Inventors: Joseph E. Oberlander, Ralph R. Dammel, Shuji Ding-Lee, Mark O. Neisser, Medhat A. Toukhy
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Publication number: 20030129547Abstract: Disclosed is a process for forming an image on a substrate, comprising the steps of: (a) coating on the substrate a first layer of a radiation sensitive, antireflective composition; (b) coating a second layer of a photoresist composition onto the first layer of the antireflective composition; (c) selectively exposing the coated substrate from step (b) to actinic radiation; and (d) developing the exposed coated substrate from step (c) to form an image; wherein both the photoresist composition and the antireflective composition are exposed in step (c); both are developed in step (d) using a single developer; wherein the antireflective composition of step (a) is a first minimum bottom antireflective coating (B.A.R.C.Type: ApplicationFiled: January 9, 2002Publication date: July 10, 2003Inventors: Mark O. Neisser, Joseph E. Oberlander, Medhat A. Toukhy, Raj Sakamuri, Shuji Ding-Lee
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Patent number: 6531267Abstract: Disclosed is a method for producing an acid sensitive liquid composition. The method involves passing an acid sensitive liquid composition containing a carbonate represented by the formula ROC(═O)OR1 wherein R and R1 independently are a hydrocarbyl group of 1 to about 10 carbon atoms, through at least one of the following two filter sheets: (a) a filter sheet containing a self-supporting fibrous matrix having immobilized therein a particulate filter aid and a particulate ion exchange resin having an average particle size of from about 2 to about 10 microns, wherein the particulate filter aid and ion exchange resin particles are distributed substantially uniformly throughout a cross-section of said matrix; and/or (b) a filter sheet containing a self-supporting matrix of fibers having immobilized therein particulate filter aid and binder resin, and having an average pore size of about 0.05 to 0.5 &mgr;m.Type: GrantFiled: April 11, 2001Date of Patent: March 11, 2003Assignee: Clariant Finance (BVI) LimitedInventor: Joseph E. Oberlander
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Patent number: 6524775Abstract: An edge bead remover for a photoresist composition disposed as a film on a surface, consisting essentially of a solvent mixture comprising from about 50 to about 80 parts by weight, based on the weight of the solvent mixture, of at least one di(C1-C3)alkyl carbonate and from about 20 to about 50 parts by weight, based on the weight of the solvent mixture, of cyclopentanone. A method is also provided for treating a photoresist composition film disposed on a surface which method comprises contacting the photoresist composition with a solvent mixture, in an amount sufficient to produce a substantially uniform film thickness of the photoresist composition across the surface, wherein the solvent mixture comprises from about 50 to about 80 parts by weight, based on the weight of the solvent mixture, of at least one di(C1-C3)alkyl carbonate and from about 20 to about 50 parts by weight, based on the weight of the solvent mixture, of cyclopentanone.Type: GrantFiled: October 20, 2000Date of Patent: February 25, 2003Assignee: Clariant Finance (BVI) LimitedInventors: Joseph E. Oberlander, Craig Traynor, Ernesto S. Sison, Jeff Griffin