Patents by Inventor Joseph Fragala

Joseph Fragala has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Metrology probe with built-in angle and method of fabrication thereof
    Patent number: 11719719
    Abstract: A method of batch-fabricating an array of probe devices for a surface analysis instrument, such as an atomic force microscope (AFM), includes providing a wafer, and photolithographically forming a base and a cantilever for each probe. The cantilever includes a built-in angle, ?, relative to the base, and the base is substantially parallel to a sample holder when the probe device is mounted in a probe holder of the surface analysis instrument.
    Type: Grant
    Filed: June 16, 2021
    Date of Patent: August 8, 2023
    Assignee: Bruker Nano, Inc.
    Inventors: Jeffrey Wong, Joseph Fragala, Weijie Wang, Deepkishore Mukhopadhyay, Xing Zhao, Rakesh Poddar
  • Metrology Probe with Built-In Angle and Method of Fabrication Thereof
    Publication number: 20220404392
    Abstract: A method of batch-fabricating an array of probe devices for a surface analysis instrument, such as an atomic force microscope (AFM), includes providing a wafer, and photolithographically forming a base and a cantilever for each probe. The cantilever includes a built-in angle, ?, relative to the base, and the base is substantially parallel to a sample holder when the probe device is mounted in a probe holder of the surface analysis instrument.
    Type: Application
    Filed: June 16, 2021
    Publication date: December 22, 2022
    Inventors: Jeffrey Wong, Joseph Fragala, Weijie Wang, Deepkishore Mukhopadhyay, Xing Zhao, Rakesh Poddar
  • Protosubstrates
    Patent number: 7199305
    Abstract: The invention provides a nanolithographic protosubstrate adapted for nanolithographic formation of nanostructures on the protosubstrate comprising: a substrate having a top surface exposed for nanolithographic formation of nanostructures, wherein the top surface comprises: electrically insulating surface regions; and at least one discreet electrode topology surrounded by the electrically insulating surface regions, wherein the electrode topology is adapted with electrical interconnections for electrically coupling the electrode topology to an external device.
    Type: Grant
    Filed: May 23, 2003
    Date of Patent: April 3, 2007
    Assignee: NanoInk, Inc.
    Inventors: Sylvain Cruchon-Dupeyrat, Michael Nelson, Jeff Rendlen, Joseph Fragala
  • Methods and apparatus for ink delivery to nanolithographic probe systems
    Publication number: 20070008390
    Abstract: Inkwells adapted for use in direct-write nanolithography and other applications including use of wells, channels, and posts. The wells can possess a geometry which matches the geometry of tips which are dipped into the inkwells. The channels can be open or closed. Hydrophilicity and hydrophobicity can be used to control ink flow. SEM can be used to characterize the inkwells. Ink flow can be monitored with video. Hydrophobic material layers can be used to prevent cross contamination. Microsyringes can be used to fill reservoirs. Satellite reservoirs can be used to prevent bubble formation.
    Type: Application
    Filed: April 7, 2006
    Publication date: January 11, 2007
    Inventors: Sylvain Cruchon-Dupeyrat, Michael Nelson, Robert Elghanian, Joseph Fragala, Igor Touzov, Debjyoti Banerjee
  • Methods and apparatus for ink delivery to nanolithographic probe systems
    Publication number: 20050035983
    Abstract: Inkwells adapted for use in direct-write nanolithography and other applications including use of wells, channels, and posts. The wells can possess a geometry which matches the geometry of tips which are dipped into the inkwells. The channels can be open or closed. Hydrophilicity and hydrophobicity can be used to control ink flow. SEM can be used to characterize the inkwells. Ink flow can be monitored with video. Hydrophobic material layers can be used to prevent cross contamination. Microsyringes can be used to fill reservoirs. Satellite reservoirs can be used to prevent bubble formation.
    Type: Application
    Filed: November 12, 2003
    Publication date: February 17, 2005
    Inventors: Sylvain Cruchon-Dupeyrat, Michael Nelson, Robert Elghanian, Joseph Fragala, Igor Touzov, Debjyoti Banerjee
  • Protosubstrates
    Publication number: 20040026681
    Abstract: The invention provides a nanolithographic protosubstrate adapted for nanolithographic formation of nanostructures on the protosubstrate comprising: a substrate having a top surface exposed for nanolithographic formation of nanostructures, wherein the top surface comprises: electrically insulating surface regions; and at least one discreet electrode topology surrounded by the electrically insulating surface regions, wherein the electrode topology is adapted with electrical interconnections for electrically coupling the electrode topology to an external device.
    Type: Application
    Filed: May 23, 2003
    Publication date: February 12, 2004
    Applicant: Nanolnk, Inc.
    Inventors: Sylvain Cruchon-Dupeyrat, Michael Nelson, Jeff Rendlen, Joseph Fragala