Patents by Inventor Joseph G. Hoffarth

Joseph G. Hoffarth has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 5191174
    Abstract: A multilayered circuit board assembly which includes a plurality of layered subassemblies each having electrically conducting wiring and at least one through hole therein. A first of these subassemblies possesses a greater wiring dnesity than the others while a second subassembly possesses a lesser resistance (and wiring density) than the others. In one example, several (e.g. at least four) such layered subassemblies may be included in the overall assembly such that those layers located along one side of the board may possess substantially greater wiring densities than the layers on the other side of the board while those layers on said other side will in turn possess lesser resistance (and greater current capacities). There are also described at least three methods for making the above multilayered circuit board assembly. Such a structure may be utilized in supercomputer applications.
    Type: Grant
    Filed: August 1, 1990
    Date of Patent: March 2, 1993
    Assignee: International Business Machines Corporation
    Inventors: Chi S. Chang, Joseph G. Hoffarth, Voya R. Markovich, Keith A. Snyder, John P. Wiley
  • Patent number: 5114518
    Abstract: A multilayer circuit board having a conformal layer of an insulating material separating a circuit core from an adjacent insulating layer is disclosed. The conformal layer encapsulates the substrate and conductive pattern of circuit lines in the circuit core, thereby reducing failures caused by impurities trapped during lamination. The multilayer circuit board is manufactured by coating at least one circuit core with the conformal layer of insulating material before final lamination of the circuit cores into a multilayer circuit board.
    Type: Grant
    Filed: January 10, 1990
    Date of Patent: May 19, 1992
    Assignee: International Business Machines Corporation
    Inventors: Joseph G. Hoffarth, Donald J. Lazzarini, John A. Welsh, John P. Wiley
  • Patent number: 5053104
    Abstract: A plasma etching process is disclosed wherein the substrate to be etched is first exposed to an etchant gas containing a volatile organohalide. When the etch rate is stabilized, the organohalide in the etchant gas is replaced by oxygen whereby the etch rate of the substrate is immediately increased to a substantially higher value. When the above is repeatedly done a substantially higher average etch rate is obtained.
    Type: Grant
    Filed: November 29, 1989
    Date of Patent: October 1, 1991
    Assignee: International Business Machines Corporation
    Inventors: Suryadevara V. Babu, Joseph G. Hoffarth, Allan R. Knoll, Walter E. Mlynko, John F. Rembetski, Kenneth D. Mack
  • Patent number: 4918574
    Abstract: A multilayer circuit board having a conformal layer of an insulating material separating a circuit core from an adjacent insulating layer is disclosed. The conformal layer encapsulates the substrate and conductive pattern of circuit lines in the circuit core, thereby reducing failures caused by impurities trapped during lamination. The multilayer circuit board is manufactured by coating at least one circuit core with the conformal layer of insulating material before final lamination of the circuit cores into a multilayer circuit board.
    Type: Grant
    Filed: April 15, 1988
    Date of Patent: April 17, 1990
    Assignee: International Business Machines Corporation
    Inventors: Joseph G. Hoffarth, Donald J. Lazzarini, John A. Welsh, John P. Wiley
  • Patent number: 4868350
    Abstract: The invention features a method of fabricating a printed circuit board having improved circuit board performance. The circuit board utilizes low dielectric materials having dielectric constants of less than 3.0. The dielectric layers are spaced apart from plated through-holes, thus eliminating the interface between the metallized surface of the through-hole and the dielectric sheet. Thus, the low dielectric layer is not required to be plated.The lower dielectric character of the laminates improves wiring density, circuit speed, and provides for thinner laminates and cores.
    Type: Grant
    Filed: March 7, 1988
    Date of Patent: September 19, 1989
    Assignee: International Business Machines Corporation
    Inventors: Joseph G. Hoffarth, John P. Wiley
  • Patent number: 4810326
    Abstract: A method for improving the adhesion of a polymer such as an epoxy resin to an electrolytic copper surface wherein the copper surface to be adhered is exposed to gas plasma containing a fluorohydrocarbon.
    Type: Grant
    Filed: August 31, 1987
    Date of Patent: March 7, 1989
    Assignee: International Business Machines Corporation
    Inventors: Suryadevara V. Babu, Vu Q. Bui, Joseph G. Hoffarth, John A. Welsh
  • Patent number: 4797178
    Abstract: The present invention provides a process for plasma cleaning and an improved gas mixture for use in a plasma cleaning process. The gas mixture of the present invention includes the normal process gases such as oxygen and carbon tetrafluoride. However, the mixture also includes a small percentage of a large mass inert gas such as Argon or Krypton. This large mass gas molecule mechanically removes any polymerized fluorocarbon that forms on the surface being cleaned thereby significantly enhancing the rate of etch or cleaning.It has been found that five to twenty percent of the inert gas is the preferred range and that ten percent produces optimum results.
    Type: Grant
    Filed: May 13, 1987
    Date of Patent: January 10, 1989
    Assignee: International Business Machines Corporation
    Inventors: Vu Q. Bui, Kevin K. Chan, Joseph G. Hoffarth, Vicki J. Malueg
  • Patent number: 4735820
    Abstract: Residual catalyst is removed from a dielectric substrate by exposing the substrate to a plasma formed from an inert gas.
    Type: Grant
    Filed: May 18, 1987
    Date of Patent: April 5, 1988
    Assignee: International Business Machines Corporation
    Inventors: Peter A. Agostino, Suryadevara V. Babu, Joseph G. Hoffarth
  • Patent number: 4718972
    Abstract: A method of making a printed circuit board is disclosed wherein metallic seed particles are applied to a surface of the substrate. An image of the desired conductor pattern is defined by a maskant layer to permit the subsequent electroless deposition of the conductor material upon the exposed seeded areas of the substrate. Then, the substrate surface is subjected to a plasma discharge to facilitate removal of the seed particles.
    Type: Grant
    Filed: January 24, 1986
    Date of Patent: January 12, 1988
    Assignee: International Business Machines Corporation
    Inventors: Suryadevara V. Babu, William F. Herrmann, Joseph G. Hoffarth, Voya Markovich, Robert T. Wiley
  • Patent number: 4599134
    Abstract: A procedure for cleaning drilled holes in laminated workpieces such as printed electric circuit boards includes the steps of coating a cutting instrument, such as a drill bit, with a liquid tracer prior to a cutting or drilling operation. During the cutting or drilling operation, the liquid tracer becomes mixed with material such as an electrically insulating binder layer disposed between opposed metal plates of the circuit board. Any smearing of the insulation material upon exposed metal surfaces of the drilled hole contain elements of chemical compounds used in the tracer. After extraction of the drill bit from the circuit board, the board is placed in a plasma reactor wherein the metal surfaces are etched to remove any smears and debris of the insulation material found on the exposed metal surfaces. The tracer elements, such as deuterium and phosphorus are monitored in the effluent plasma of the reactor to determine when the cleaning of drilled holes in the board is completed.
    Type: Grant
    Filed: June 10, 1985
    Date of Patent: July 8, 1986
    Assignee: IBM Corporation
    Inventors: Suryadevara V. Babu, Joseph G. Hoffarth, John A. Welsh