Patents by Inventor Joseph Gregory Camilleri

Joseph Gregory Camilleri has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method and system for deep trench silicon etch
    Publication number: 20040256353
    Abstract: A method and system for deep trench silicon etch is presented. The method comprises introducing a reactive process gas and a Noble gas to a plasma processing system, wherein the reactive process gas comprises two or more of HBr, a fluorine-containing gas, and O2, and the Noble gas comprises at least one of He, Ne, Ar, Xe, Kr, and Rn. Additionally, radio frequency (RF) power is applied to the substrate holder, upon which the substrate rests, at two different frequencies. The first RF frequency is greater than 10 MHz, and the second frequency is less than 10 MHz.
    Type: Application
    Filed: April 9, 2004
    Publication date: December 23, 2004
    Applicants: Tokyo Electron Limited, International Business Machines Corporation
    Inventors: Siddhartha Panda, Aelan Mosden, Richard Wise, Kenro Sugiyama, Joseph Gregory Camilleri