Abstract: Techniques for efficiently generating and displaying light-field data are disclosed. In one particular embodiment, the techniques may be realized as a method for generating light-field data, the method comprising receiving input image data, synthesizing a first plurality of viewpoints based on the input image data, synthesizing a second plurality of viewpoints based on cached image data, combining the first and second plurality of viewpoints, yielding a plurality of blended viewpoints, displaying the plurality of blended viewpoints, and caching image data associated with the plurality of blended viewpoints.

Abstract: Techniques for efficiently generating and displaying light-field data are disclosed. In one particular embodiment, the techniques may be realized as a method for generating light-field data, the method comprising receiving input image data, synthesizing a first plurality of viewpoints based on the input image data, synthesizing a second plurality of viewpoints based on cached image data, combining the first and second plurality of viewpoints, yielding a plurality of blended viewpoints, displaying the plurality of blended viewpoints, and caching image data associated with the plurality of blended viewpoints.

Abstract: In various embodiments, sputtering targets are formed by introducing molybdenum powder into a sheet bar mold, pressing the powder to form a sheet bar, sintering the sheet bar to form an ingot having a density of at least 90% of a theoretical density, preheating the ingot, rolling the ingot to form a plate, and heat treating the plate.

Abstract: In various embodiments, an electrode has a shaft extending from an electrode head and a cooling passage extending from an open end disposed at an attachment end of the shaft to a closed end disposed within the electrode head. The electrode head has an approximately teardrop shape with a smoothly rounded outer contour.

Abstract: In various embodiments, sputtering targets are formed by introducing molybdenum powder into a sheet bar mold, pressing the powder to form a sheet bar, sintering the sheet bar to form an ingot having a density of at least 90% of a theoretical density, preheating the ingot, rolling the ingot to form a plate, and heat treating the plate.

Abstract: In various embodiments, tubular sputtering targets comprising molybdenum are provided and sputtered to produce thin films comprising molybdenum. The sputtering targets may be formed by forming a tubular billet having an inner diameter IDI and an outer diameter ODI, the formation comprising pressing molybdenum powder in a mold and sintering the pressed molybdenum powder, working the tubular billet to form a worked billet having an outer diameter ODf smaller than ODI, and heat treating the worked billet. The sputtering targets may have a substantially uniform texture of (a) a 110 orientation parallel to a longitudinal direction and (b) a 111 orientation parallel to a radial direction.

Abstract: In various embodiments, tubular sputtering targets comprising molybdenum are provided and sputtered to produce thin films comprising molybdenum. The sputtering targets may be formed by forming a tubular billet having an inner diameter IDI and an outer diameter ODI, the formation comprising pressing molybdenum powder in a mold and sintering the pressed molybdenum powder, working the tubular billet to form a worked billet having an outer diameter ODf smaller than ODI, and heat treating the worked billet. The sputtering targets may have a substantially uniform texture of (a) a 110 orientation parallel to a longitudinal direction and (b) a 111 orientation parallel to a radial direction.

Abstract: In various embodiments, planar sputtering targets are produced by forming a billet at least by pressing molybdenum powder in a mold and sintering the pressed powder, working the billet to form a worked billet, heat treating the worked billet, working the worked billet to form a final billet, and heat treating the final billet.

Abstract: An electrode comprises a shaft extending from an electrode head. A cooling passage extends from an open end disposed at an attachment end of the shaft to a closed end, which is disposed within the electrode head. The electrode head is formed to have approximately a teardrop shape, which may be formed according to a radial profile rotated about a centerline of the shaft, where the radial profile has a center disposed within the electrode head and on the centerline. The radial profile may exhibit a single maximum within a middle portion of the radial profile. Alternatively, or in addition, the middle portion of the radial profile may be negatively curved.

Abstract: In various embodiments, an electrode has a shaft extending from an electrode head and a cooling passage extending from an open end disposed at an attachment end of the shaft to a closed end disposed within the electrode head.

Abstract: In various embodiments, planar sputtering targets are produced by forming a billet at least by pressing molybdenum powder in a mold and sintering the pressed powder, working the billet to form a worked billet, heat treating the worked billet, working the worked billet to form a final billet, and heat treating the final billet.

Abstract: In various embodiments, tubular sputtering targets are produced by forming a tubular billet at least by pressing molybdenum powder in a mold and sintering the pressed molybdenum powder, working the tubular billet to form a worked billet, and heat treating the worked billet.

Abstract: In various embodiments, tubular sputtering targets are produced by forming a tubular billet at least by pressing molybdenum powder in a mold and sintering the pressed molybdenum powder, working the tubular billet to form a worked billet, and heat treating the worked billet.

Abstract: An electrode comprises a shaft extending from an electrode head. A cooling passage extends from an open end disposed at an attachment end of the shaft to a closed end, which is disposed within the electrode head. The electrode head is formed to have approximately a teardrop shape, which may be formed according to a radial profile rotated about a centerline of the shaft, where the radial profile has a center disposed within the electrode head and on the centerline. The radial profile may exhibit a single maximum within a middle portion of the radial profile. Alternatively, or in addition, the middle portion of the radial profile may be negatively curved.

Abstract: Molybdenum, sputtering targets and sintering characterized as having no or minimal texture banding or through thickness gradient. The molybdenum sputtering targets having a fine, uniform grain size as well as uniform texture, are high purity and can be micro-alloyed to improved performance. The sputtering targets can be round discs, square, rectangular or tubular and can be sputtered to form thin films on substrates. By using a segment-forming method, the size of the sputtering target can be up to 6 m×5.5 m. The thin films can be used in electronic components such as Thin Film Transistor-Liquid Crystal Displays, Plasma Display Panels, Organic Light Emitting Diodes, Inorganic Light Emitting Diode Displays, Field Emitting Displays, solar cells, sensors, semiconductor devices, and gate device for CMOS (complementary metal oxide semiconductor) with tunable work functions.

Abstract: Molybdenum sputtering targets and sintering characterized as having no or minimal texture banding or through thickness gradient. The molybdenum sputtering targets having a fine, uniform grain size as well as uniform texture, are high purity and can be micro-alloyed to improved performance. The sputtering targets can be round discs, square, rectangular or tubular and can be sputtered to form thin films on substrates. By using a segment-forming method, the size of the sputtering target can be up to 6 m×5.5 m. The thin films can be used in electronic components such as Thin Film Transistor—Liquid Crystal Displays, Plasma Display Panels, Organic Light Emitting Diodes, Inorganic Light Emitting Diode Displays, Field Emitting Displays, solar cells, sensors, semiconductor devices, and gate device for CMOS (complementary metal oxide semiconductor) with tunable work functions.

Abstract: The invention relates to a process for making a cross-directionally worked molybdenum plate, the process comprising: (a) reducing ammonium molybdate and forming molybdenum metal powder; (b) consolidating a molybdenum component comprised of molybdenum metal powder and an alloying element to a first workpiece, the alloying element being selected from the group consisting of titanium, zirconium, hafnium, carbon, lanthanum oxide, and combinations thereof; (c) thermally treating the first workpiece and subjecting the workpiece to thermo-mechanical forces in a first direction, and thereby forming a second workpiece; (d) thermally treating the second workpiece and subjecting the second workpiece to thermo-mechanical forces in a second direction that is different from the first direction; (e) subjecting the thermomechanically treated second workpiece to a recrystallization heat treatment step, and thereby forming a heat-treated crossdirectionally worked workpiece; and (f) subjecting the heat-treated, cross-directiona

Abstract: Molybdenum, sputtering targets and sintering characterized as having no or minimal texture banding or through thickness gradient. The molybdenum sputtering targets having a fine, uniform grain size as well as uniform texture, are high purity and can be micro-alloyed to improved performance. The sputtering targets can be round discs, square, rectangular or tubular and can be sputtered to form thin films on substrates. By using a segment-forming method, the size of the sputtering target can be up to 6 m×5.5 m. The thin films can be used in electronic components such as Thin Film Transistor—Liquid Crystal Displays, Plasma Display Panels, Organic Light Emitting Diodes, Inorganic Light Emitting Diode Displays, Field Emission Displays, solar cells, sensors, semiconductor devices, and gate device for CMOS (complementary metal oxide semiconductor) with tunable work functions.

Abstract: The invention disclosed herein relates to a multipositional ratchet device for use in conjunction with a surgical retractor assembly. The ratchet device of the invention permits both independent and simultaneous adjustment of the longitudinal axial positioning of a retractor blade stem relative to the device as well as the vertical tilt position of the retractor blade. Furthermore, the device is structured with the adjustment tabs positioned to permit the aforementioned adjustments using continuously maintained finger contact on the tabs using a single hand. The device affords the user improved ergonomics and accuracy of use by virtue of its structural and functional features.

Abstract: The invention disclosed herein relates to a multipositional ratchet device for use in conjunction with a surgical retractor assembly. The ratchet device of the invention permits both independent and simultaneous adjustment of the longitudinal axial positioning of a retractor blade stem relative to the device as well as the vertical tilt position of the retractor blade. Furthermore, the device is structured with the adjustment tabs positioned to permit the aforementioned adjustments using continuously maintained finger contact on the tabs using a single hand. The device affords the user improved ergonomics and accuracy of use by virtue of its structural and functional features.