Abstract: A layer of a chalcogenide glass resist material, on a substrate on which a microlithographic pattern is to be formed, has a deposit of silver halide on its outer surface. By actinic irradiation a latent silver image replicating the desired pattern is formed in the halide deposit. This image is developed to a metallic silver, which is used to photodope the resist material for subsequent etching to produce the microlithographic pattern on the substrate. Positive and negative patterns are possible from the same starting laminate. One form of a microlithograhic pattern is a mask for producing electronic circuits.

Abstract: Surface sensitization of a chalcogenide glass is achieved by depositing an extremely thin silver layer, for example, by depositing a silver halide and developing and fixing in the absence of exposure. The sensitized chalcogenide can then be exposed to light to make it etch-resistant. Further exposure reverses the etch resistance, permitting positive or negative images and permitting erasure. Microlithographic resists such as masks can be formed.

Abstract: A layer of a chalcogenide glass resist material, on a substrate on which a microlithographic pattern is to be formed, has a deposit of silver halide on its outer surface. By actinic irradiation a latent silver image replicating the desired pattern is formed in the silver halide deposit. This image is developed to a metallic silver, which is used to photodope the resist material for subsequent etching to produce the microlithographic pattern on the substrate. Positive and negative patterns are possible from the same starting laminate. One form of a microlithographic pattern is a mask for producing electronic circuits.