Abstract: The present disclosure relates to a process for forming a refined metal-containing unit by reducing yield impurities with acidified deionized water. Another embodiment is a composition comprising the refined metal-containing unit. Yet another embodiment is a process for forming a patterned substrate by depositing a composition comprising the refined metal-containing unit on a substrate, drying the film comprising the refined metal-containing unit, exposing the film comprising the refined metal-containing composition to a source of actinic radiation, and transferring the pattern to substrate. The disclosed embodiments are useful in producing patterned substrates by direct or indirect pattern transfer from films comprising the refined metal-containing unit.

Abstract: The present disclosure relates to a process for forming a refined metal-containing unit by reducing yield impurities with acidified deionized water. Another embodiment is a composition comprising the refined metal-containing unit. Yet another embodiment is a process for forming a patterned substrate by depositing a composition comprising the refined metal-containing unit on a substrate, drying the film comprising the refined metal-containing unit, exposing the film comprising the refined metal-containing composition to a source of actinic radiation, and transferring the pattern to substrate. The disclosed embodiments are useful in producing patterned substrates by direct or indirect pattern transfer from films comprising the refined metal-containing unit.

Abstract: The present invention relates to a process for forming metal-containing films by applying a photosensitive metal-containing composition on a substrate, drying the photosensitive metal-containing composition, exposing the photosensitive metal-containing composition to a source of actinic radiation and applying a post-treatment to the metal-containing composition. The process also includes exposing the photosensitive metal-containing composition to a source of actinic radiation through a mask or mold and developing the unexposed portion of the composition. Another embodiment of the invention is a metal-containing film, three-dimensional object or article formed by the process. The invention is useful in producing a directly patterned metal-containing film and a microdevice.

Abstract: The present invention relates to a process for forming metal-containing films by applying a photosensitive metal-containing composition on a substrate, drying the photosensitive metal-containing composition, exposing the photosensitive metal-containing composition to a source of actinic radiation and applying a post-treatment to the metal-containing composition. The process also includes exposing the photosensitive metal-containing composition to a source of actinic radiation through a mask or mold and developing the unexposed portion of the composition. Another embodiment of the invention is a metal-containing film, three-dimensional object or article formed by the process. The invention is useful in producing a directly patterned metal-containing film and a microdevice.

Abstract: The present invention relates to metal-containing compositions comprising a metal-containing precursor unit (MU), a prepolymer unit (PU), and a catalyst or an initiator capable of inducing a combining reaction of ethylenically unsaturated groups of the metal-containing precursor unit and the prepolymer unit. In another embodiment, the composition comprises MU and a catalyst or initiator capable of inducing a combining reaction of the metal-containing precursor units. Both MU and PU contain additional functional groups, which may be selected to impart compatibility with each other and to produce optically clear films. The metal-containing compositions can be used to produce films or articles having a transmittance of at least 90% and index of refraction in the range of 1.4 to 1.8 in the 400-700 nm range of light and 1.4 to 2.4 in the 150-400 nm range of light.

Abstract: The present invention relates to a process for forming metal-containing films by applying a photosensitive metal-containing composition on a substrate, drying the photosensitive metal-containing composition, exposing the photosensitive metal-containing composition to a source of actinic radiation and applying a post-treatment to the metal-containing composition. The process also includes exposing the photosensitive metal-containing composition to a source of actinic radiation through a mask or mold and developing the unexposed portion of the composition. Another embodiment of the invention is a metal-containing film, three-dimensional object or article formed by the process. The invention is useful in producing a directly patterned metal-containing film and a microdevice.

Abstract: A synthetic process for polyhedral oligomeric silsesquioxanes (POSS) and polyhedral oligomeric silicates (POS) produces silanol and siloxide molecules containing both olefinic groups and alkyl or aromatic groups. Olefin-bearing POSS silanol/siloxides are derivatized into a variety of chemical species while retaining the ability to further derivatize the silanol/siloxide.

Abstract: Methods for continuous bulk production of polyolefin polyhedral oligomeric silsesquioxanes and their amino, isocyanate, and alcohol derivatives using silane coupling agents as precursors.

Abstract: The present invention relates to a process for forming metal-containing films by applying a photosensitive metal-containing composition on a substrate, drying the photosensitive metal-containing composition, exposing the photosensitive metal-containing composition to a source of actinic radiation and applying a post- treatment to the metal-containing composition. The process also includes exposing the photosensitive metal-containing composition to a source of actinic radiation through a mask or mold and developing the unexposed portion of the composition. Another embodiment of the invention is a metal-containing film, three-dimensional object or article formed by the process. The invention is useful in producing a directly patterned metal-containing film and a microdevice.

Abstract: The present invention relates to metal-containing compositions comprising a metal-containing precursor unit (MU), a prepolymer unit (PU), and a catalyst or an initiator capable of inducing a combining reaction of ethylenically unsaturated groups of the metal-containing precursor unit and the prepolymer unit. In another embodiment, the composition comprises MU and a catalyst or initiator capable of inducing a combining reaction of the metal-containing precursor units. Both MU and PU contain additional functional groups, which may be selected to impart compatibility with each other and to produce optically clear films. The metal-containing compositions can be used to produce films or articles having a transmittance of at least 90% and index of refraction in the range of 1.4 to 1.8 in the 400-700 nm range of light and 1.4 to 2.4 in the 150-400 nm range of light.

Abstract: A method of using fluorinated-nanostructured POSS chemicals as alloying agents for the reinforcement of polymer microstructures, including polymer coils, domains, chains, and segments, at the molecular level. Because of their tailorable compatibility with nonfluorinated polymers, nanostructured chemicals can be readily and selectively incorporated into polymers by direct blending processes. The incorporation of a nanostructured chemical into a polymer favorably impacts a multitude of polymer physical properties. Properties most favorably improved are surface properties, such as lubricity, contact angle, water repellency, deicing, surface tension, and abrasion resistance. Improved surface properties may be useful for applications such as anti-icing surfaces, non-wetting surfaces, low friction surfaces, self cleaning. Other properties improved include time dependent mechanical and thermal properties such as heat distortion, creep, compression set, shrinkage, modulus, hardness and biological compatibility.

Abstract: The present invention relates to metal-containing compositions comprising a metal-containing precursor unit (MU), a prepolymer unit (PU), and a catalyst or an initiator capable of inducing a combining reaction of ethylenically unsaturated groups of the metal-containing precursor unit and the prepolymer unit. In another embodiment, the composition comprises MU and a catalyst or initiator capable of inducing a combining reaction of the metal-containing precursor units. Both MU and PU contain additional functional groups, which may be selected to impart compatibility with each other and to produce optically clear films. The metal-containing compositions can be used to produce films or articles having a transmittance of at least 90% and index of refraction in the range of 1.4 to 1.8 in the 400-700 nm range of light and 1.4 to 2.4 in the 150-400 nm range of light.

Abstract: Methods for continuous bulk production of polyolefin polyhedral oligomeric silsesquioxanes and their amino, isocyanate, and alcohol derivatives using silane coupling agents as precursors.

Abstract: Metallized polyhedral oligomeric silsesquioxanes and metallized polyhedral oligomeric silicates are used as cure promoters, catalysts, and alloying agents for the reinforcement of polymer microstructures, including polymer coils, domains, chains, and segments, at the molecular level. Because of their tailorable compatibility with polymers, polyhedral oligomeric metallosesquioxanes (POMS) can be readily and selectively incorporated into polymers by common mixing processes.

Abstract: A method of using metallized polyhedral oligomeric silsesquioxanes as cure promoters and catalysts for polyurethanes.

Abstract: The use of nanostructured chemicals based on polyhedral oligomeric silsesquioxanes (POSS) and polyhedral oligomeric silicates (POS) are used to control porosity in organic and inorganic media. The precisely defined nanoscopic dimensions of this class of chemicals enables porosity to be both created (increased) or reduced (decreased) as desired. The thermal and chemical stability of the POSS/POS nanostructures and the ability of these nano-building blocks to be selectively placed or rationally assembled with both inorganic and organic material mediums allow tailoring of porosity.

Abstract: Metallized polyhedral oligomeric silsesquioxanes and metallized polyhedral oligomeric silicates are used as cure promoters, catalysts, and alloying agents for the reinforcement of polymer microstructures, including polymer coils, domains, chains, and segments, at the molecular level. Because of their tailorable compatibility with polymers, polyhedral oligomeric metallosesquioxanes (POMS) can be readily and selectively incorporated into polymers by common mixing processes.

Abstract: Nanoreinforced coatings with improved hydrophobicity, thermal stability, hardness, and durability have been developed from polyhedral oligomeric silsesquioxane (POSS) reagents and resins. The nanoscopic dimensions and hybrid (organic/inorganic) composition of POSS reagents are particularly useful for coating fillers derived from minerals, metals, glasses, and polymeric materials.

Abstract: The present invention relates to metal-containing compositions with refractive indices of at least 1.5 comprising a metal-containing precursor unit (MU), a prepolymer unit (PU), and a catalyst or an initiator capable of inducing a combining reaction of ethylenically unsaturated functional groups of the metal-containing precursor unit and reactive functional groups of the prepolymer unit. In another embodiment, the composition comprises MU and a catalyst or initiator capable of inducing a combining reaction of the metal-containing precursor units. Both MU and PU contain additional functional groups, which may be selected to impart compatibility with each other and to produce optically clear films. The metal-containing compositions can be used to produce films or articles having a transmittance of at least 90% and index of refraction in the range of 1.5 to 1.8 in the 400-700 nm range of light and 1.5 to 2.4 in the 150-400 nm range of light.

Abstract: Metallized nanostructured chemicals are incorporated at the molecular level as alloying agents for the reinforcement of polymer microstructures, including polymer coils, domains, chains, and segments. Direct blending processes are effective because of the tailorable compatibility of the metallized nanostructured chemicals with polymers.