Patents by Inventor Joseph K. Comeau

Joseph K. Comeau has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Vacuum trap
    Patent number: 9847213
    Abstract: A vacuum trap, a plasma etch system using the vacuum trap and a method of cleaning the vacuum trap. The vacuum trap includes a baffle housing; and a removable baffle assembly disposed in the baffle housing, the baffle assembly comprising a set of baffle plates, the baffle plates spaced along a support rod from a first baffle plate to a last baffle plate, the baffle plates alternately disposed above and below the support rod and alternately disposed in an upper region and a lower region of the baffle housing.
    Type: Grant
    Filed: May 28, 2015
    Date of Patent: December 19, 2017
    Assignee: GLOBALFOUNDRIES INC.
    Inventors: Joseph K. Comeau, David R. Crawford, Robert E. Desrosiers, Tracy C. Hetrick, Mousa H. Ishaq
  • Slurry for chemical-mechanical polishing of metals and use thereof
    Patent number: 9708508
    Abstract: A composition and a method for chemical mechanical polishing. The composition includes a surfactant anion an alkyl alcohol and a diluent. The composition further includes abrasive particles and an oxidizer. The method includes providing the composition on a surface to be polished and polishing the surface by contacting the surface with a polishing pad.
    Type: Grant
    Filed: June 8, 2015
    Date of Patent: July 18, 2017
    Assignee: GLOBALFOUNDRIES Inc.
    Inventors: Graham M. Bates, Michael T. Brigham, Joseph K. Comeau, Jason P. Ritter, Matthew T. Tiersch, Eva A. Shah, Eric J. White
  • SLURRY FOR CHEMICAL-MECHANICAL POLISHING OF METALS AND USE THEREOF
    Publication number: 20150267084
    Abstract: A composition and a method for chemical mechanical polishing. The composition includes a surfactant anion an alkyl alcohol and a diluent. The composition further includes abrasive particles and an oxidizer. The method includes providing the composition on a surface to be polished and polishing the surface by contacting the surface with a polishing pad.
    Type: Application
    Filed: June 8, 2015
    Publication date: September 24, 2015
    Applicant: INTERNATIONAL BUSINESS MACHINES CORPORATION
    Inventors: Graham M. Bates, Michael T. Brigham, Joseph K. Comeau, Jason P. Ritter, Matthew T. Tiersch, Eva A. Shah, Eric J. White
  • VACUUM TRAP
    Publication number: 20150262795
    Abstract: A vacuum trap, a plasma etch system using the vacuum trap and a method of cleaning the vacuum trap. The vacuum trap includes a baffle housing; and a removable baffle assembly disposed in the baffle housing, the baffle assembly comprising a set of baffle plates, the baffle plates spaced along a support rod from a first baffle plate to a last baffle plate, the baffle plates alternately disposed above and below the support rod and alternately disposed in an upper region and a lower region of the baffle housing.
    Type: Application
    Filed: May 28, 2015
    Publication date: September 17, 2015
    Inventors: Joseph K. Comeau, David R. Crawford, Robert E. Desrosiers, Tracy C. Hetrick, Mousa H. Ishaq
  • Slurry for chemical-mechanical polishing of metals and use thereof
    Patent number: 9057004
    Abstract: A composition and a method for chemical mechanical polishing. The composition includes a surfactant anion an alkyl alcohol and a diluent. The composition further includes abrasive particles and an oxidizer. The method includes providing the composition on a surface to be polished and polishing the surface by contacting the surface with a polishing pad.
    Type: Grant
    Filed: September 23, 2011
    Date of Patent: June 16, 2015
    Assignee: International Business Machines Corporation
    Inventors: Graham M. Bates, Michael T. Brigham, Joseph K. Comeau, Jason P. Ritter, Matthew T. Tiersch, Eva A. Shah, Eric J. White
  • Vacuum trap
    Patent number: 9057388
    Abstract: A vacuum trap, a plasma etch system using the vacuum trap and a method of cleaning the vacuum trap. The vacuum trap includes a baffle housing; and a removable baffle assembly disposed in the baffle housing, the baffle assembly comprising a set of baffle plates, the baffle plates spaced along a support rod from a first baffle plate to a last baffle plate, the baffle plates alternately disposed above and below the support rod and alternately disposed in an upper region and a lower region of the baffle housing.
    Type: Grant
    Filed: March 21, 2012
    Date of Patent: June 16, 2015
    Assignee: International Business Machines Corporation
    Inventors: Joseph K. Comeau, David Crawford, Robert E. Desrosiers, Tracy C. Hetrick, Mousa H. Ishaq
  • Slurry for chemical-mechanical polishing of copper and use thereof
    Patent number: 8734665
    Abstract: A composition and a method for chemical mechanical polishing. The composition includes a surfactant anion an alkyl alcohol, a controlled amount of chloride ion source and a diluent. The composition further includes abrasive particles and an oxidizer. The method includes providing the composition on a surface to be polished and polishing the surface by contacting the surface with a polishing pad.
    Type: Grant
    Filed: October 12, 2011
    Date of Patent: May 27, 2014
    Assignee: International Business Machines Corporation
    Inventors: Graham M. Bates, Michael T. Brigham, Joseph K. Comeau, Jason P. Ritter, Eva A. Shah, Matthew T. Tiersch, Eric J. White
  • VACUUM TRAP
    Publication number: 20130248112
    Abstract: A vacuum trap, a plasma etch system using the vacuum trap and a method of cleaning the vacuum trap. The vacuum trap includes a baffle housing; and a removable baffle assembly disposed in the baffle housing, the baffle assembly comprising a set of baffle plates, the baffle plates spaced along a support rod from a first baffle plate to a last baffle plate, the baffle plates alternately disposed above and below the support rod and alternately disposed in an upper region and a lower region of the baffle housing.
    Type: Application
    Filed: March 21, 2012
    Publication date: September 26, 2013
    Applicant: INTERNATIONAL BUSINESS MACHINES CORPORATION
    Inventors: Joseph K. Comeau, David Crawford, Robert E. Desrosiers, Tracy C. Hetrick, Mousa H. Ishaq
  • SLURRY FOR CHEMICAL-MECHANICAL POLISHING OF COPPER AND USE THEREOF
    Publication number: 20130092651
    Abstract: A composition and a method for chemical mechanical polishing. The composition includes a surfactant anion an alkyl alcohol, a controlled amount of chloride ion source and a diluent. The composition further includes abrasive particles and an oxidizer. The method includes providing the composition on a surface to be polished and polishing the surface by contacting the surface with a polishing pad.
    Type: Application
    Filed: October 12, 2011
    Publication date: April 18, 2013
    Applicant: INTERNATIONAL BUSINESS MACHINES CORPORATION
    Inventors: Graham M. Bates, Michael T. Brigham, Joseph K. Comeau, Jason P. Ritter, Eva A. Shah, Matthew T. Tiersch, Eric J. White
  • SLURRY FOR CHEMICAL-MECHANICAL POLISHING OF METALS AND USE THEREOF
    Publication number: 20130078811
    Abstract: A composition and a method for chemical mechanical polishing. The composition includes a surfactant anion an alkyl alcohol and a diluent. The composition further includes abrasive particles and an oxidizer. The method includes providing the composition on a surface to be polished and polishing the surface by contacting the surface with a polishing pad.
    Type: Application
    Filed: September 23, 2011
    Publication date: March 28, 2013
    Applicant: INTERNATIONAL BUSINESS MACHINES CORPORATION
    Inventors: Graham M. Bates, Michael T. Brigham, Joseph K. Comeau, Jason P. Ritter, Matthew T. Tiersch, Eva A. Shah, Eric J. White