Abstract: Polyhedral oligomeric silsesquioxanes (POSS) and formulations for nail coating are disclosed. By including a POSS in the nail coating topcoat formulation, gloss and hardness of the cured nail coating are improved without compromising removability. If included in the color layer formulation, the POSS provides improved adhesion to the nail such that a base layer is not needed. Incorporating a fatty alcohol methacrylate in the topcoat formulation also improves gloss and hardness. Polyurethane copolymers can provide the cured nail coating with good solvent removability without compromising adhesion to the nail, gloss or hardness.

Abstract: Polyhedral oligomeric silsesquioxanes (POSS) and formulations for nail coating are disclosed. By including a POSS in the nail coating topcoat formulation, gloss and hardness of the cured nail coating are improved without compromising removability. If included in the color layer formulation, the POSS provides improved adhesion to the nail such that a base layer is not needed. Incorporating a fatty alcohol methacrylate in the topcoat formulation also improves gloss and hardness. Polyurethane copolymers can provide the cured nail coating with good solvent removability without compromising adhesion to the nail, gloss or hardness.

Abstract: Nanoscopic silicon containing agents including polyhedral oligomeric silsesquioxane and polyhedral oligomeric silicate are used to eliminate the formation of conductive metal whiskers at the surface of lead-free solders joints and atom migration in semiconductors.

Abstract: A method of using olefin containing nanostructured chemicals and silanol containing nanostructured chemicals as high temperature resins is described. Vinyl containing nanostructured chemicals are particularity effective in thermosets as they control the motions of polymer chains, and segments, at the molecular level. Silanol containing nanostructured chemicals are particularity effective in thermosets containing polar groups as the silanol can enhance the reactivity of these groups. Because of their tailorable compatibility with fluorinated polymers, nanostructured chemicals can be readily and selectively incorporated into polymers by direct blending and polymerization processes. The incorporation of a nanostructured chemical into a polymer favorably impacts a multitude of polymer physical properties. Properties most favorably improved are heat distortion and flammability characteristics, permeability, optical properties, texture, feel and durability.

Abstract: A method of using metallized and nonmetallized nanostructured chemicals as surface and volume modification agents within polymers and on the surfaces of nano and macroscopic particulates and fillers. Because of their 0.5 nm-3.0 nm size, nanostructured chemicals can be utilized to greatly increase surface area, improve compatibility, and promote lubricity between surfaces at a length scale not previously attainable.

Abstract: A method of using nanoscopic silicon containing agents for in situ formation of nanoscopic glass layers on material surfaces is described. Because of their tailorable compatibility with polymers, metals, composites, ceramics, glasses and biological materials, nanoscopic silicon containing agents can be readily and selectively incorporated into materials at the nanometer level by direct mixing processes. Improved properties include gas and liquid barrier; stain resistance; resistance to environmental degradation; adhesion; printability; time dependent mechanical and thermal properties such as heat distortion, creep, compression set, shrinkage, and modulus; hardness and abrasion resistance; oxidation resistance; electrical and thermal conductivity; and fire resistance.

Abstract: Methods for continuous bulk production of polyolefin polyhedral oligomeric silsesquioxanes and their amino, isocyanate, and alcohol derivatives using silane coupling agents as precursors.

Abstract: The use of nanostructured chemicals based on polyhedral oligomeric silsesquioxanes (POSS) and polyhedral oligomeric silicates (POS) are used to control porosity in organic and inorganic media. The precisely defined nanoscopic dimensions of this class of chemicals enables porosity to be both created (increased) or reduced (decreased) as desired. The thermal and chemical stability of the POSS/POS nanostructures and the ability of these nano-building blocks to be selectively placed or rationally assembled with both inorganic and organic material mediums allow tailoring of porosity.

Abstract: Nanoreinforced coatings with improved hydrophobicity, thermal stability, hardness, and durability have been developed from polyhedral oligomeric silsesquioxane (POSS) reagents and resins. The nanoscopic dimensions and hybrid (organic/inorganic) composition of POSS reagents are particularly useful for coating fillers derived from minerals, metals, glasses, and polymeric materials.

Abstract: A method for barrier property enhancement using silicon containing agents and in situ formation of nanoscopic glass layers on polymer surfaces. Nanostructured chemicals such as polyhedral oligomeric silsesquioxane (POSS) are added to polymers, followed by in situ surface oxidation to form a glass layer.

Abstract: Three processes for the manufacture of polyhedral oligomeric silsesquioxanes (POSS) which utilize the action of bases that are capable of either attacking silicon or any compound that can react with a protic solvent (e.g. ROH, H2O etc.) and generate hydroxide [OH]?, alkoxide [RO]?, etc. The first process utilizes such bases to effectively redistribute the silicon-oxygen frameworks in polymeric silsesquioxanes [RSiO1.5]? where ?=1?1,000,000 or higher into POSS nanostructures of formulas [(RSiO1.5)n]?#, homoleptic, [(RXSiO1.5)n]?#, functionalized homoleptic, [(RSiO1.5)m(R?SiO1.5)n]?#, heteroleptic, and {(RSiO1.5)m(RXSiO1.0)n}?#, functionalized heteroleptic nanostructures. The second process utilizes base to aid in the formation of POSS nanostructures of formulas [(RSiO1.5)n]?# homoleptic and [(RSiO1.5)m(R?SiO1.5)n]?# heteroleptic and [(RSiO1.5)m(RXSiO1.

Abstract: A method of using metallized and nonmetallized nanoscopic silicon containing agents for physical property control, radiation absorption, and in situ formation of nanoscopic glass layers on material surfaces. Because of their tailorable compatibility with polymers, metals, composites, ceramics, glasses and biological materials, nanoscopic silicon containing agents can be readily and selectively incorporated into materials at the nanometer level by direct mixing processes. Properties improved include gas and liquid barrier, stain resistance, resistance to environmental degradation, radiation absorption, adhesion, printability, time dependent mechanical and thermal properties such as heat distortion, creep, compression set, shrinkage, modulus, hardness and abrasion resistance, electrical and thermal conductivity, and fire resistance.