Patents by Inventor Joseph M. Rosamilia

Joseph M. Rosamilia has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Apparatus for continuously controlling the peroxide and ammonia concentration in a bath
    Patent number: 5578273
    Abstract: A method and apparatus for cleaning substrates in a process for device fabrication is disclosed. An aqueous solution of hydrogen peroxide and ammonium hydroxide is used to clean the substrates. The concentration of hydrogen peroxide and ammonium hydroxide in the cleaning solution is maintained at a certain level. The life of the cleaning solution is extended by the process. By maintaining the concentrations of the hydrogen peroxide and ammonium hydroxide in the solution within a desired range, the process also provides a cleaning solution that effectively cleans the substates throughout the entire time the solution is used to clean the substrates. The apparatus monitors certain solution parameters such as the pH and the conductivity of the cleaning solution and adds hydrogen peroxide and/or ammonium hydroxide to the cleaning solution to maintain the parameters, and thus the concentration of hydrogen peroxide and ammonium hydroxide, at desired levels.
    Type: Grant
    Filed: August 18, 1995
    Date of Patent: November 26, 1996
    Assignee: Lucent Technologies, Inc.
    Inventors: Karrie J. Hanson, Gregg S. Higashi, Joseph M. Rosamilia
  • Process and apparatus for semiconductor device fabrication
    Patent number: 5472516
    Abstract: A method and apparatus for cleaning substrates in a process for device fabrication is disclosed. An aqueous solution of hydrogen peroxide and ammonium hydroxide is used to clean the substrates. The concentration of hydrogen peroxide and ammonium hydroxide in the cleaning solution is maintained at a certain level. The life of the cleaning solution is extended by the process. By maintaining the concentrations of the hydrogen peroxide and ammonium hydroxide in the solution within a desired range, the process also provides a cleaning solution that effectively cleans the substates throughout the entire time the solution is used to clean the substrates. The apparatus monitors certain solution parameters such as the pH and the conductivity of the cleaning solution and adds hydrogen peroxide and/or ammonium hydroxide to the cleaning solution to maintain the parameters, and thus the concentration of hydrogen peroxide and ammonium hydroxide, at desired levels.
    Type: Grant
    Filed: April 15, 1994
    Date of Patent: December 5, 1995
    Assignee: AT&T Corp.
    Inventors: Karrie J. Hanson, Gregg S. Higashi, Joseph M. Rosamilia
  • Devices involving the photo behavior of fullerenes
    Patent number: 5171373
    Abstract: It has been found that fullerenes exhibit photoelectronic behavior such as photoconductivity or photovoltaic properties. Such behavior allows the fabrication of a variety of devices, such as solar cells and the use of various light-induced processes, such as the generation of a current by illumination of appropriate fullerene interfaces.
    Type: Grant
    Filed: July 30, 1991
    Date of Patent: December 15, 1992
    Assignee: AT&T Bell Laboratories
    Inventors: Arthur F. Hebard, Barry Miller, Joseph M. Rosamilia, William L. Wilson
  • Process for making metallized structure and article comprising structure
    Patent number: 4914081
    Abstract: Processes are described for electroplating metal or alloy on superconducting oxides using either a nonaqueous bath or aqueous bath with suitably applied potential. Articles made in accordance with the electroplating process are also described.
    Type: Grant
    Filed: January 15, 1988
    Date of Patent: April 3, 1990
    Assignee: American Telephone and Telegraph Company, AT&T Bell Laboratories
    Inventors: Barry Miller, Joseph M. Rosamilia