Patents by Inventor Joseph Maher

Joseph Maher has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 5013385
    Abstract: The present invention includes plural plasma etching vessels and a wafer queuing station arrayed with a wafer transfer arm in a controlled environment. Wafers are movable within the controlled environment one at a time selectably between the several plasma vessels and the wafer queuing station without atmospheric or other exposure to that possible contamination of the moved wafers is prevented. The system is selectively operative in either single-step or multiple-step processing modes, and in either of the modes, the several plasma etching vessels are operable to provide a desirably high system throughput. In the preferred embodiment, the several plasma vessels and the queuing station are arrayed about a closed pentagonal locus with the wafer transfer arm disposed within the closed locus.
    Type: Grant
    Filed: December 1, 1989
    Date of Patent: May 7, 1991
    Assignee: General Signal Corporation
    Inventors: Joseph A. Maher, E. John Vowles, Joseph D. Napoli, Arthur W. Zafiropoulo, Mark W. Miller
  • Patent number: 4715921
    Abstract: The present invention includes plural plasma etching vessels and a wafer queuing station arrayed with a wafer transfer arm in a controlled environment. Wafer processing in each vessel is regulated by a state controller for processing a plurality of wafers from a single cassette, contained within the vacuum environment of the plural plasma etching vessels and wafer queuing station, to provide an orderly and efficient throughput of wafers for diverse or similar processing in the plural vessels. In this manner a wafer can be processed as soon as a vessel becomes available.
    Type: Grant
    Filed: October 24, 1986
    Date of Patent: December 29, 1987
    Assignee: General Signal Corporation
    Inventors: Joseph A. Maher, E. John Vowles, Joseph D. Napoli, Arthur W. Zafiropoulo, Mark W. Miller
  • Patent number: 4381965
    Abstract: Dry plasma etching of a plurality of planar thin-film semiconductor wafers is effected simultaneously and uniformly in a relatively small chamber enveloping a vertically-stacked array of laminar electrode sub-assemblies each of which includes a pair of oppositely-excited electrode plates tightly sandwiching a solid insulating layer of dielectric material, the parallel sub-assemblies being vertically separated to subdivide the chamber into a plurality of reactor regions where RF discharges can excite a normally inert ambient gas to develop reactive plasma for simultaneous planar plasma etching or reactive ion etching (RIE) of all wafers within the several regions.
    Type: Grant
    Filed: January 6, 1982
    Date of Patent: May 3, 1983
    Assignee: Drytek, Inc.
    Inventors: Joseph A. Maher, Jr., Arthur W. Zafiropoulo
  • Patent number: 3973316
    Abstract: A plant container is formed from a plastic foam cup having a funnel-shaped sidewall and a disk-shaped bottom closing the small end of the sidewall by severing a first portion of the cup, including the bottom and a part of the sidewall, from a second portion of the cup, including the remaining part of the sidewall, along a plane perpendicular to a central axis passing through the cup and inserting and wedging the first portion into the second portion.
    Type: Grant
    Filed: March 17, 1975
    Date of Patent: August 10, 1976
    Inventor: William Joseph Maher
  • Patent number: D275032
    Type: Grant
    Filed: January 6, 1982
    Date of Patent: August 7, 1984
    Assignee: Drytek, Inc.
    Inventors: Joseph A. Maher, Jr., Arthur W. Zafiropoulo