Abstract: Methods for making a heterogeneous polymer blend comprising one or more anionic polymers, one or more cationic polymers, and one or more non-ionic polymers, which method comprises (a) adding to a non-neutral solution a first amount of polymerization initiator and one or more anionic or cationic monomers, wherein each monomer has the same charge; (b) a second amount of the polymerization initiator and one or more non-ionic monomers; (c) adding a third amount of the polymerization initiator and one or more ionic monomers that are oppositely charged from the monomers of (a); adding stepwise, a fourth amount of the polymerization initiator to react any residual monomer, and (e) neutralizing the resulting polymer blend. Also claimed are heterogeneous polymer blends containing polymers formed from one or more anionic, cationic, and non-ionic monomers, either polymerized in situ or separately and then combined.

Abstract: A method and system for administering a benefit plan for a sponsor with a widely diverse participant population. Using a combination of Internet enabled tools and databases, participants can enter and confirm their own data. Plan sponsors can view that information with reference to plan parameters and guidelines coded into the benefit plan. Databases contain the plan choices, sponsor's rules, and who has access to which information. The system computes liabilities owed by the sponsor, assets used to informally fund those liabilities, and cost recovery opportunities, if any. The browser enabled system uses the advantages of the Worldwide Web (and any thin-client intranet on the sponsor's site) as its primary contact tool, with alternatives of telephone, modem, or fax. Financial information is provided to the plan sponsor as participants make choices, provides payout options to the participants, and provides considerably more interactivity than prior methods of servicing employee benefits.

Abstract: A unique Hall-Current ion source apparatus is used for direct ion beam deposition of DLC coatings with hardness values greater than 10 GPa and at deposition rates greater than 10 Å per second. This ion source has a unique fluid-cooled anode with a shadowed gap through which ion sources feed gases are introduced while depositing gases are injected into the plasma beam. The shadowed gap provides a well maintained, electrically active area at the anode surface which stays relatively free of non-conductive deposits. The anode discharge region is insulatively sealed to prevent discharges from migrating into the interior of the ion source. A method is described in which a substrate is disposed within a vacuum chamber, coated with a coating of DLC or Si-DLC at a high deposition rate using a Hall-Current ion source operating on carbon-containing or carbon-containing and silicon-containing precursor gases, respectively.

Abstract: This invention relates to a method and system for operating a client in a client/server system. A plurality of requests for action to one or more servers in the system are made and a corresponding plurality of responses to the requests are received from the system. Data relating to the requests and responses are recorded at the client and then the client disconnected from communication with the system. One or more further requests for action are made and responses to the further requests are determined based on the recorded data.

Abstract: A method is provided for manufacturing a diamond-like carbon (DLC) coated optical phase-change recording medium for use with near-field optical head devices and which exhibits superior wear resistance and improved lifetime. According to the method, the surface of a composite optical phase-change media structure deposited onto a substrate is subjected to ion beam deposition of a DLC over-coat to a thickness of no greater than about 450 .ANG.. Preferably the DLC is ion beam deposited onto the phase-change recording layer at the surface of the medium structure or onto a germanium-containing adhesion-promoting interlayer to achieve the desired adhesion of the DLC to the surface of the medium structure.

Abstract: A unique Hall-Current ion source apparatus is used for direct ion beam deposition of DLC coatings with hardness values greater than 10 GPa and at deposition rates greater than 10 .ANG. per second. This ion source has a unique fluid-cooled anode with a shadowed gap through which ion sources feed gases are introduced while depositing gases are injected into the plasma beam. The shadowed gap provides a well maintained, electrically active area at the anode surface which stays relatively free of non-conductive deposits. The anode discharge region is insulatively sealed to prevent discharges from migrating into the interior of the ion source. A method is described in which a substrate is disposed within a vacuum chamber, coated with a coating of DLC or Si-DLC at a high deposition rate using a Hall-Current ion source operating on carbon-containing or carbon-containing and silicon-containing precursor gases, respectively.

Abstract: Plasma beam apparatus and method for the purpose of vacuum processing temperature sensitive materials at high discharge power and high processing rates. A gridless, closed or non-closed Hall-Current ion source is described which features a unique fluid-cooled anode with a shadowed gap through which ion source feed gases are introduced while depositing feed gases are injected into the plasma beam. The shadowed gap provides a well maintained, electrically active area at the anode surface which stays relatively free of non-conductive deposits. The anode discharge region is insulatively sealed to prevent discharges from migrating into the interior of the ion source. Thin vacuum gaps are also used between anode and non-anode components in order to preserve electrical isolation of the anode when depositing conductive coatings. The magnetic field of the Hall-Current ion source is produced by an electromagnet driven either by the discharge current or a periodically alternating current.

Abstract: An ion beam deposition method is provided for manufacturing a coated substrate with improved wear-resistance, and improved lifetime. The substrate is first chemically cleaned to remove contaminants. Secondly, the substrate is inserted into a vacuum chamber onto a substrate holder, and the air therein is evacuated via pump. Then the substrate surface is bombarded with energetic ions from an ion beam source supplied from inert or reactive gas inlets to assist in removing residual hydrocarbons and surface oxides, and activating the surface. After sputter-etching the surface, a protective, wear-resistant coating is deposited by plasma ion beam deposition where a portion of the precursor gases are introduced into the ion beam downstream of the ion source, and hydrogen is introduced directly into the ion source plasma chamber. The plasma ion beam-deposited coating may contain one or more layers.