Patents by Inventor Joseph Mattia
Joseph Mattia has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 10809616Abstract: New photoacid generator compounds (“PAGs”) are provided that comprise a cholate moiety and photoresist compositions that comprise such PAG compounds.Type: GrantFiled: June 5, 2017Date of Patent: October 20, 2020Assignee: Rohm and Haas Electronic Materials LLCInventors: Emad Aqad, Mingqi Li, Joseph Mattia, Cheng-Bai Xu
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Publication number: 20170285470Abstract: New photoacid generator compounds (“PAGs”) are provided that comprise a cholate moiety and photoresist compositions that comprise such PAG compounds.Type: ApplicationFiled: June 5, 2017Publication date: October 5, 2017Applicants: Rohm and Haas Electronic Materials LLC, Rohm and Haas Electronic Materials LLCInventors: Emad Aqad, Mingqi Li, Joseph Mattia, Cheng-Bai Xu
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Patent number: 9671689Abstract: New photoacid generator compounds (“PAGs”) are provided that comprise a cholate moiety and photoresist compositions that comprise such PAG compounds.Type: GrantFiled: December 10, 2010Date of Patent: June 6, 2017Assignee: Rohm and Haas Electronic Materials LLCInventors: Emad Aqad, Mingqi Li, Joseph Mattia, Cheng-Bai Xu
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Patent number: 9507259Abstract: A photoresist composition comprises an acid-sensitive polymer, and a cyclic sulfonium compound having the formula: (Ra)1—(Ar)—S+(—CH2—)m·?O3S—(CRb2)n-(L)p-X wherein each Ra is independently a substituted or unsubstituted C1-30 alkyl group, C6-30 aryl group, C7-30 aralkyl group, or combination comprising at least one of the foregoing, Ar is a monocyclic, polycyclic, or fused polycyclic C6-30 aryl group, each Rb is independently H, F, a linear or branched C1-10 fluoroalkyl or a linear or branched heteroatom-containing C1-10 fluoroalkyl, L is a C1-30 linking group optionally comprising a heteroatom comprising O, S, N, F, or a combination comprising at least one of the foregoing heteroatoms, X is a substituted or unsubstituted, C5 or greater monocyclic, polycyclic or fused polycyclic cycloaliphatic group, optionally comprising a heteroatom comprising O, S, N, F, or a combination comprising at least one of the foregoing, and 1 is an integer of 0 to 4, m is an integer of 3 to 20, n is an integer of 0 to 4, and pType: GrantFiled: May 29, 2012Date of Patent: November 29, 2016Assignee: ROHM AND HAAS ELECTRONIC MATERIALS LLCInventors: Mingqi Li, Emad Aqad, Cong Liu, Ching-Lung Chen, Shintaro Yamada, Cheng-bai Xu, Joseph Mattia
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Publication number: 20160124304Abstract: New methods are provided for synthesis of photoacid generator compounds (“PAGs”), new photoacid generator compounds and photoresist compositions that comprise such PAG compounds. In a particular aspect, sulfonium-containing (S+) photoacid generators and methods of synthesis of sulfonium photoacid generators are provided.Type: ApplicationFiled: January 11, 2016Publication date: May 5, 2016Inventors: Mingqi Li, Emad Aqad, Cong Liu, Joseph Mattia, Cheng-Bai Xu, George G. Barclay
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Patent number: 9255079Abstract: New methods are provided for synthesis of photoacid generator compounds (“PAGs”), new photoacid generator compounds and photoresist compositions that comprise such PAG compounds. In a particular aspect, sulfonium-containing (S+) photoacid generators and methods of synthesis of sulfonium photoacid generators are provided.Type: GrantFiled: December 10, 2010Date of Patent: February 9, 2016Assignee: Rohm and Haas Electronic Materials, LLCInventors: Mingqi Li, Emad Aqad, Cong Liu, Joseph Mattia, Cheng-Bai Xu, George G. Barclay
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Publication number: 20130137038Abstract: A photoresist composition comprises an acid-sensitive polymer, and a cyclic sulfonium compound having the formula: (Ra)1—(Ar)—S+(—CH2—)m·?O3S—(CRb2)n-(L)p-X wherein each Ra is independently a substituted or unsubstituted C1-30 alkyl group, C6-30 aryl group, C7-30 aralkyl group, or combination comprising at least one of the foregoing, Ar is a monocyclic, polycyclic, or fused polycyclic C6-30 aryl group, each Rb is independently H, F, a linear or branched C1-10 fluoroalkyl or a linear or branched heteroatom-containing C1-10 fluoroalkyl, L is a C1-30 linking group optionally comprising a heteroatom comprising O, S, N, F, or a combination comprising at least one of the foregoing heteroatoms, X is a substituted or unsubstituted, C5 or greater monocyclic, polycyclic or fused polycyclic cycloaliphatic group, optionally comprising a heteroatom comprising O, S, N, F, or a combination comprising at least one of the foregoing, and 1 is an integer of 0 to 4, m is an integer of 3 to 20, n is an integer of 0 to 4, and pType: ApplicationFiled: May 29, 2012Publication date: May 30, 2013Applicants: Dow Global Technologies LLC, Rohm and Haas Electronic Materials LLCInventors: Mingqi Li, Amad Aqad, Cong Liu, Ching-Lung Chen, Shintaro Yamada, Cheng-bai Xu, Joseph Mattia
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Publication number: 20110250537Abstract: New photoacid generator compounds (“PAGs”) are provided that comprise a cholate moiety and photoresist compositions that comprise such PAG compounds.Type: ApplicationFiled: December 10, 2010Publication date: October 13, 2011Applicant: Rohm and Haas Electronic Materials LLCInventors: Emad AQAD, Mingqi Li, Joseph Mattia, Cheng-Bai Xu
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Publication number: 20110250538Abstract: New methods are provided for synthesis of photoacid generator compounds (“PAGs”), new photoacid generator compounds and photoresist compositions that comprise such PAG compounds. In a particular aspect, sulfonium-containing (S+) photoacid generators and methods of synthesis of sulfonium photoacid generators are provided.Type: ApplicationFiled: December 10, 2010Publication date: October 13, 2011Applicant: Rohm and Haas Electronic Materials LLCInventors: Mingqi LI, Emad AQAD, Cong LIU, Joseph MATTIA, Cheng-Bai XU, George G. BARCLAY
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Patent number: 7022454Abstract: The present invention provides novel alicyclic-esterified norbornene carboxylates monomers, polymers and photoresist compositions that comprise the polymers as a resin binder component. Methods for synthesis of the monomers and polymers of the invention are also provided. The photoresist compositions of the invention can provide highly resolved relief images upon exposure to short wavelengths, including sub-300 and sub-200 nm wavelengths such as 193 nm and 157 nm.Type: GrantFiled: February 26, 2001Date of Patent: April 4, 2006Assignee: Shipley Company, L.L.C.Inventors: George G. Barclay, Wang Yueh, Joseph Mattia
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Patent number: 6849381Abstract: The present invention includes polymers and photoresist compositions that comprise the polymers as a resin binder component. Photoresists of the invention include chemically-amplified positive-acting resists that can be effectively imaged at short wavelengths such as sub-200 nm, particularly 193 nm. Polymers of the invention suitably contain 1) photoacid labile groups that preferably contain an alicyclic moiety; 2) a polymerized electron-deficient monomer; 3) a polymerized cyclic olefin moiety. Particularly preferred polymers of the invention are tetrapolymers or pentapolymers, preferably with differing polymerized norbornene units.Type: GrantFiled: April 7, 2003Date of Patent: February 1, 2005Assignee: Shipley Company, L.L.C.Inventors: George G. Barclay, Stefan J. Caporale, Wang Yueh, Zhibiao Mao, Joseph Mattia
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Patent number: 6777157Abstract: The present invention includes polymers and photoresist compositions that comprise the polymers as a resin binder component. Photoresists of the invention include chemically-amplified positive-acting resists that can be effectively imaged at short wavelengths such as sub-200 nm, particularly 193 nm. Polymers of the invention suitably contain 1) photoacid labile groups that preferably contain an alicyclic moiety; 2) a polymerized electron-deficient monomer; 3) a polymerized cyclic olefin moiety. Particularly preferred polymers of the invention are tetrapolymers or pentapolymers, preferably with differing polymerized norbornene units.Type: GrantFiled: May 9, 2000Date of Patent: August 17, 2004Assignee: Shipley Company, L.L.C.Inventors: George G. Barclay, Stefan J. Caporale, Wang Yueh, Zhibiao Mao, Joseph Mattia
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Publication number: 20030215742Abstract: The present invention includes polymers and photoresist compositions that comprise the polymers as a resin binder component. Photoresists of the invention include chemically-amplified positive-acting resists that can be effectively imaged at short wavelengths such as sub-200 nm, particularly 193 nm. Polymers of the invention suitably contain 1) photoacid labile groups that preferably contain an alicyclic moiety; 2) a polymerized electron-deficient monomer; 3) a polymerized cyclic olefin moiety. Particularly preferred polymers of the invention are tetrapolymers or pentapolymers, preferably with differing polymerized norbornene units.Type: ApplicationFiled: April 7, 2003Publication date: November 20, 2003Inventors: George G. Barclay, Stefan J. Caporale, Wang Yueh, Zhibiao Mao, Joseph Mattia
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Publication number: 20020013448Abstract: The present invention provides novel alicyclic-esterified norbornene carboxylates monomers, polymers and photoresist compositions that comprise the polymers as a resin binder component. Methods for synthesis of the monomers and polymers of the invention are also provided. The photoresist compositions of the invention can provide highly resolved relief images upon exposure to short wavelengths, including sub-300 and sub-200 nm wavelengths such as 193 nm and 157 nm.Type: ApplicationFiled: February 26, 2001Publication date: January 31, 2002Applicant: Shipley Company, L.L.C.Inventors: George G. Barclay, Wang Yueh, Joseph Mattia