Patents by Inventor Joseph MAURINO

Joseph MAURINO has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11927549
    Abstract: The present disclosure provides an inspection system and a method of stray field mitigation. The system includes an array of electron beam columns, a first permanent magnet array, and a plurality of shielding plates. The array of electron beam columns each includes an electron source configured to emit electrons toward a stage. The first permanent magnet array is configured to condense the electrons from each electron source into an array of electron beams. The first permanent magnet array is arranged at a first end of the array of electron beam columns. The plurality of shielding plates extend across the array electron beam columns downstream of the first permanent magnet array in a direction of electron emission. The array of electron beams pass through a plurality of apertures in each of the plurality of shielding plates, which reduces stray magnetic field in a radial direction of the array of electron beams.
    Type: Grant
    Filed: September 9, 2021
    Date of Patent: March 12, 2024
    Assignee: KLA CORPORATION
    Inventors: Qian Zhang, Wayne Chiwoei Lo, Joseph Maurino, Tomas Plettner
  • Publication number: 20230076175
    Abstract: The present disclosure provides an inspection system and a method of stray field mitigation. The system includes an array of electron beam columns, a first permanent magnet array, and a plurality of shielding plates. The array of electron beam columns each includes an electron source configured to emit electrons toward a stage. The first permanent magnet array is configured to condense the electrons from each electron source into an array of electron beams. The first permanent magnet array is arranged at a first end of the array of electron beam columns. The plurality of shielding plates extend across the array electron beam columns downstream of the first permanent magnet array in a direction of electron emission. The array of electron beams pass through a plurality of apertures in each of the plurality of shielding plates, which reduces stray magnetic field in a radial direction of the array of electron beams.
    Type: Application
    Filed: September 9, 2021
    Publication date: March 9, 2023
    Inventors: Qian Zhang, Wayne Chiwoei Lo, Joseph Maurino, Tomas Plettner
  • Publication number: 20190228944
    Abstract: These electron beam separator designs address thermally-induced beam drift in an electron-optical system. A heater coil wrapped around the beam separator unit can maintain constant power. Additional coils also can be wrapped around the beam separator in a bifilar manner, which can maintain constant power in the beam separator coils. Wien power can be determined, and then heater coil current can be determined.
    Type: Application
    Filed: May 15, 2018
    Publication date: July 25, 2019
    Inventors: Sameet K. Shriyan, Oscar Florendo, Joseph Maurino, Daniel Bui
  • Patent number: 10340114
    Abstract: These electron beam separator designs address thermally-induced beam drift in an electron-optical system. A heater coil wrapped around the beam separator unit can maintain constant power. Additional coils also can be wrapped around the beam separator in a bifilar manner, which can maintain constant power in the beam separator coils. Wien power can be determined, and then heater coil current can be determined.
    Type: Grant
    Filed: May 15, 2018
    Date of Patent: July 2, 2019
    Assignee: KLA-Tencor Corporation
    Inventors: Sameet K Shriyan, Oscar Florendo, Joseph Maurino, Daniel Bui
  • Patent number: 8957394
    Abstract: One embodiment relates to a high-voltage electron gun including an insulator stand-off having a resistive layer. The resistive layer is at least on an interior surface of the insulator stand-off. A cathode holder is coupled to one end of the insulator 115 stand-off, and an anode is coupled to the other end. The resistive layer advantageously increases the surface breakdown field strength for the insulator stand-off and so enables a compact design for the high-voltage electron gun. Other embodiments, aspects and feature are also disclosed.
    Type: Grant
    Filed: November 16, 2012
    Date of Patent: February 17, 2015
    Assignee: KLA-Tencor Corporation
    Inventors: Alan D. Brodie, Joseph Maurino, Mark A. McCord, Paul F. Petric
  • Patent number: 8692204
    Abstract: One embodiment disclosed relates a method of detecting a patterned electron beam. The patterned electron beam is focused onto a grating with a pattern that has a same pitch as the patterned electron beam. Electrons of the patterned electron beam that pass through the grating un-scattered are detected. Another embodiment relates to focusing the patterned electron beam onto a grating with a pattern that has a second pitch that is different than a first pitch of the patterned electron beam. Electrons of the patterned electron beam that pass through the grating form a Moiré pattern that is detected using a position-sensitive detector. Other embodiments, aspects and features are also disclosed.
    Type: Grant
    Filed: April 23, 2012
    Date of Patent: April 8, 2014
    Assignee: KLA-Tencor Corporation
    Inventors: Shinichi Kojima, Christopher F. Bevis, Joseph Maurino, William M. Tong
  • Publication number: 20120273686
    Abstract: One embodiment disclosed relates a method of detecting a patterned electron beam. The patterned electron beam is focused onto a grating with a pattern that has a same pitch as the patterned electron beam. Electrons of the patterned electron beam that pass through the grating un-scattered are detected. Another embodiment relates to focusing the patterned electron beam onto a grating with a pattern that has a second pitch that is different than a first pitch of the patterned electron beam. Electrons of the patterned electron beam that pass through the grating form a Moiré pattern that is detected using a position-sensitive detector. Other embodiments, aspects and features are also disclosed.
    Type: Application
    Filed: April 23, 2012
    Publication date: November 1, 2012
    Inventors: Shinichi KOJIMA, Christopher F. BEVIS, Joseph MAURINO, William M. TONG