Patents by Inventor Joseph Michael Imhof

Joseph Michael Imhof has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 8967992
    Abstract: Imprint lithography templates having alignment marks with highly absorptive material. The alignment marks are insensitive to the effects of liquid spreading and can provide stability and increase contrast to alignment system during liquid imprint filling of template features.
    Type: Grant
    Filed: April 25, 2012
    Date of Patent: March 3, 2015
    Assignees: Canon Nanotechnologies, Inc., Molecular Imprints, Inc.
    Inventors: Niyaz Khusnatdinov, Kosta S. Selinidis, Joseph Michael Imhof, Dwayne L. LaBrake
  • Patent number: 8935981
    Abstract: Two-stage imprinting techniques capable of protecting fine patterned features of an imprint lithography template are herein described. In particular, such techniques may be used during fabrication of recessed high-contrast alignment marks for preventing deposited metal layers from coming into contact with fine features etched into the template.
    Type: Grant
    Filed: September 26, 2011
    Date of Patent: January 20, 2015
    Assignee: Canon Nanotechnologies, Inc.
    Inventors: Joseph Michael Imhof, Kosta S. Selinidis, Dwayne L. LaBrake
  • Publication number: 20120269972
    Abstract: Imprint lithography templates having alignment marks with highly absorptive material. The alignment marks are insensitive to the effects of liquid spreading and can provide stability and increase contrast to alignment system during liquid imprint filling of template features.
    Type: Application
    Filed: April 25, 2012
    Publication date: October 25, 2012
    Applicant: MOLECULAR IMPRINTS, INC.
    Inventors: Niyaz Khusnatdinov, Kosta S. Selinidis, Joseph Michael Imhof, Dwayne L. LaBrake
  • Publication number: 20120073462
    Abstract: Two-stage imprinting techniques capable of protecting fine patterned features of an imprint lithography template are herein described. In particular, such techniques may be used during fabrication of recessed high-contrast alignment marks for preventing deposited metal layers from coming into contact with fine features etched into the template.
    Type: Application
    Filed: September 26, 2011
    Publication date: March 29, 2012
    Applicant: MOLECULAR IMPRINTS, INC.
    Inventors: Joseph Michael Imhof, Kosta S. Selinidis, Dwayne L. LaBrake