Abstract: Provided herein are methods for minimizing Z-image acquisition comprising receiving a first set of three-dimensional (3D) positional information of a plurality of biological molecules within a sample, wherein the first set of 3D positional information is within a first imaging volume and based on a probing cycle of the sample in an imaging instrument, wherein the probing cycle comprises generating optical signals corresponding to at least some of the plurality of biological molecules; determining, based on the first set of 3D positional information, a second imaging volume that is less than the first imaging volume; and directing the imaging instrument to image the second imaging volume in at least one subsequent probing cycle of the sample.

Abstract: Various embodiments of the present disclosure disclose methods and systems for actively monitoring an opto-fluidic instrument for vibrational disturbances and correcting images obtained during the detected disturbances. In various embodiments, an optical imaging system may acquire Z-stack images of samples supported by an XY-stage. Vibrations can cause individual stacks to be sheared, i.e., to not be co-located with respect to neighboring Z-stacks. In various embodiments, an offset between the measured positions and the expected positions of the sheared stacks may be computed, and a determination as to whether to correct or reacquire the Z-stack images may be made based at least in part on the computed offset.

Abstract: A system for utilizing more than one communication protocol on a single mass flow controller (MFC) device. Communication protocols include, but are not limited to, DeviceNet, RS-485, and analog. A D-Subminiature connector (D-Sub) of the MFC has a pin configuration system that is compatible between RS-485 and analog. In addition, a different connector plug is used for DeviceNet on the same MFC, eliminating the need for compatibility of pins with other communication protocols. Together, these above-mentioned configuration systems allow one MFC device to choose between more than one communication protocol.

Abstract: A wafer support platen heating system for low pressure chemical vapor deposition of apparatus includes multiple resistance heaters for individual heating of multiple portions of the platen to provide a predetermined uniform or non-uniform temperature gradient/profile across the platen. The multiple graphite resistance heaters of the preferred embodiment include a spiral shaped main resistance heater and two single turn edge loss graphite resistance heaters located within the inner diameter and along the periphery of the outer diameter respectively of the main spiral shaped resistance heater.