Abstract: In various embodiments, the present disclosure provides filtering compositions, their method of production, and methods for their use. In specific implementations, the filtering composition includes lanthanum and has a surface area of at least about 125 g/m2. In more specific examples, the filtering composition is free-flowing or has a moisture content between about 10 wt % about 30 wt %. Particular compositions include at least one of iron or magnesium. Some embodiments of the present disclosure provide filtering compositions that are resilient or leach-resistant.

Abstract: In various embodiments, the present disclosure provides filtering compositions, their method of production, and methods for their use. In specific implementations, the filtering composition includes lanthanum and has a surface area of at least about 125 g/m2. In more specific examples, the filtering composition is free-flowing or has a moisture content between about 10 wt % about 30 wt %. Particular compositions include at least one of iron or magnesium. Some embodiments of the present disclosure provide filtering compositions that are resilient or leach-resistant.

Abstract: In various embodiments, the present disclosure provides filtering compositions, their method of production, and methods for their use. In specific implementations, the filtering composition includes lanthanum and has a surface area of at least about 125 g/m2. In more specific examples, the filtering composition is free-flowing or has a moisture content between about 10 wt % about 30 wt %. Particular compositions include at least one of iron or magnesium. Some embodiments of the present disclosure provide filtering compositions that are resilient or leach-resistant.

Abstract: In various embodiments, the present disclosure provides filtering compositions, their method of production, and methods for their use. In specific implementations, the filtering composition includes lanthanum and has a surface area of at least about 125 g/m2. In more specific examples, the filtering composition is free-flowing or has a moisture content between about 10 wt % about 30 wt %. Particular compositions include at least one of iron or magnesium. Some embodiments of the present disclosure provide filtering compositions that are resilient or leach-resistant.

Abstract: In various embodiments, the present disclosure provides filtering compositions, their method of production, and methods for their use. In specific implementations, the filtering composition includes lanthanum and has a surface area of at least about 125 g/m 2. In more specific examples, the filtering composition is free-flowing or has a moisture content between about 10 wt % about 30 wt %. Particular compositions include at least one of iron or magnesium. Some embodiments of the present disclosure provide filtering compositions that are resilient or leach-resistant.

Abstract: In various embodiments, the present disclosure provides filtering compositions, their method of production, and methods for their use. In specific implementations, the filtering composition includes lanthanum and has a surface area of at least about 125 g/m2. In more specific examples, the filtering composition is free-flowing or has a moisture content between about 10 wt % about 30 wt %. Particular compositions include at least one of iron or magnesium. Some embodiments of the present disclosure provide filtering compositions that are resilient or leach-resistant.

Abstract: A process for removing or stabilizing arsenic and/or selenium from aqueous streams or slurries is provided that includes contacting the streams or slurry with a composition containing lanthanum chloride. The lanthanum chloride composition can optionally contain various lanthanides. The composition can optionally contain ferric or ferrous sulfate. The process is preferably conducted by adjusting the pH of solution to between about 8 or 10, adding 2 moles of lanthanum chloride for every mole of arsenic or selenium ions present in solution, adding 5 to 6 moles ferric or ferrous ions for every mole of arsenic or selenium ions present in solution and adjusting the oxidation potential of the solution to between 200-400 mV for removal of selenium ions and between 100-200 mV for removal of arsenic ions.