Patents by Inventor Joseph Neil Greely

Joseph Neil Greely has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Pitch reduction technology using alternating spacer depositions during the formation of a semiconductor device and systems including same
    Patent number: 9305782
    Abstract: A method for patterning a layer increases the density of features formed over an initial patterning layer using a series of self-aligned spacers. A layer to be etched is provided, then an initial sacrificial patterning layer, for example formed using optical lithography, is formed over the layer to be etched. Depending on the embodiment, the patterning layer may be trimmed, then a series of spacer layers formed and etched. The number of spacer layers and their target dimensions depends on the desired increase in feature density. An in-process semiconductor device and electronic system is also described.
    Type: Grant
    Filed: October 6, 2014
    Date of Patent: April 5, 2016
    Assignee: Micron Technology, Inc.
    Inventors: Baosuo Zhou, Mirzafer K. Abatchev, Ardavan Niroomand, Paul A. Morgan, Shuang Meng, Joseph Neil Greely, Brian J. Coppa
  • Pitch Reduction Technology Using Alternating Spacer Depositions During the Formation of a Semiconductor Device and Systems Including Same
    Publication number: 20150021744
    Abstract: A method for patterning a layer increases the density of features formed over an initial patterning layer using a series of self-aligned spacers. A layer to be etched is provided, then an initial sacrificial patterning layer, for example formed using optical lithography, is formed over the layer to be etched. Depending on the embodiment, the patterning layer may be trimmed, then a series of spacer layers formed and etched. The number of spacer layers and their target dimensions depends on the desired increase in feature density. An in-process semiconductor device and electronic system is also described.
    Type: Application
    Filed: October 6, 2014
    Publication date: January 22, 2015
    Inventors: Baosuo Zhou, Mirzafer K. Abatchev, Ardavan Niroomand, Paul A. Morgan, Shuang Meng, Joseph Neil Greely, Brian J. Coppa