Abstract: A method for co-registering a semiconductor wafer (14) undergoing work in one or more blind process modules (10), (12) requires a means (16), (18) for consistently and repeatably registering the semiconductor wafer (14) to each process module (10), (12). Given this consistent and repeatable singular wafer registration means (16), (18), the location of the coordinate axes of each process module (10), (12) is determined with respect to the position of the semiconductor wafer (14) that is registered therein.

Abstract: A method for controlling the flow of semiconductor wafers within a semiconductor wafer processing facility. This method includes a wafer storage and preparation area (10) and a wafer metrology and etch area (12), both of which are monitored and/or controlled by a master controller (14). The wafer storage and preparation area (10) is typically kept at a class 10 clean room level and is comprised of a wafer storage area (16) and a wafer preparation area (18). The wafer metrology and etch area (12) is typically kept at a class 1000 clean room level and is comprised of an I/O cassette module (22), a wafer pre-aligner (24), a wafer router (26), a wafer metrology instrument (28), and a wafer etching instrument (30). The semiconductor wafers are transported, either manually or automatically, between the wafer storage area (16) and the wafer preparation area (18), as well as between the wafer storage and preparation area (10) and the wafer metrology and etch area (12), within wafer storage cassettes ( 20).

Abstract: An apparatus (10) for providing a consistent registration of a semiconductor wafer undergoing process work includes a platen (38) upon which a surround (14) is registered. The surround registers to the platen (38) by matching two pins (42), (40) that protrude from the platen (38) to a hole (44) and a notch (46) in the surround (14), respectively. A first registration surface (16) for registering a flat (20) of a semiconductor wafer (12) is permanently mounted to the surround (14). A second registration surface (18) for registering a point (24) on the circumference of the semiconductor wafer (12) is permanently mounted to the surround (14). A third, adjustable registration surface (26) also registers to a point (28) on the circumference of the wafer (12). This third registration surface (26) is springloaded to accommodate for slight diameter variations in successively processed semiconductor wafers, and to provide a force to hold the wafer (12) in place.