Abstract: Systems and methods provide for an intelligent laboratory lockbox. The intelligent laboratory lockbox includes a vault unit and one or more presence sensors configured to detect a presence of a specimen within the one or more compartments of the vault unit. The presence sensor(s) may generate a load status based on sensing a specimen in the vault unit, wherein the load status includes one of a loaded status or an unloaded status. A control unit is operably connected to at least the vault unit and the one or more presence sensors. The control unit is configured to modify a specimen pickup workflow based on the load status.

Abstract: A method for developing or improving a process for producing a product from a material comprising steps of acquiring the composition for at least two slurries as raw material data (17) for the CMP based manufacturing process and its relevant parameters (2) by using a Data Collecting computer (9); physically performing specific method steps of a CMP process; measuring relevant parameters of the used slurries and the physically performed CMP process to determine the CMP process performance by using the Data Collecting computer (9); analyzing the measured data about the relevant parameters with a specific software performed on an Analyzing computer (11) by creating for the software and applying with it a predictive model using Machine Learning to understand the intercorrelation of the different parameters and using the results to improve the CMP process performance and the resulting product quality of the CMP based manufacturing process.

Abstract: Systems and methods provide for an intelligent laboratory lockbox. The intelligent laboratory lockbox includes a vault unit and one or more presence sensors configured to detect a presence of a specimen within the one or more compartments of the vault unit. The presence sensor(s) may generate a load status based on sensing a specimen in the vault unit, wherein the load status includes one of a loaded status or an unloaded status. A control unit is operably connected to at least the vault unit and the one or more presence sensors. The control unit is configured to modify a specimen pickup workflow based on the load status.

Abstract: Systems and methods provide for an intelligent laboratory lockbox. The intelligent laboratory lockbox self-regulates an internal temperature of one or more compartments, regardless of external temperatures. The one or more compartments can be individually climate controlled. The intelligent laboratory lockbox is in communication with a remote server, which is in communication with one or more remote sources including an electronic health record server, a courier server, and the like.

Abstract: A method for developing or improving a process for producing a product from a material comprising steps of acquiring the composition for at least two slurries as raw material data (17) for the CMP based manufacturing process and its relevant parameters (2) by using a Data Collecting computer (9); physically performing specific method steps of a CMP process; measuring relevant parameters of the used slurries and the physically performed CMP process to determine the CMP process performance by using the Data Collecting computer (9); analyzing the measured data about the relevant parameters with a specific software performed on an Analyzing computer (11) by creating for the software and applying with it a predictive model using Machine Learning to understand the intercorrelation of the different parameters and using the results to improve the CMP process performance and the resulting product quality of the CMP based manufacturing process.

Abstract: A turbine engine including a core engine cowl including a compartment, and a cooling system positioned within the compartment. The cooling system includes a cooling fan configured to exhaust heat from the compartment, a temperature sensor configured to monitor a temperature within the compartment, and a controller coupled in communication with the cooling fan and the temperature sensor. The controller is configured to actuate the cooling fan when the temperature is greater than a threshold.

Abstract: Chemical Mechanical Planarization (CMP) polishing compositions comprising abrasive particles and additives to boost removal rates of films comprising elemental silicon such as poly-silicon and Silicon-Germanium.

Abstract: Systems and methods provide for an intelligent laboratory lockbox. The intelligent laboratory lockbox self-regulates an internal temperature of one or more compartments, regardless of external temperatures. The one or more compartments can be individually climate controlled. The intelligent laboratory lockbox is in communication with a remote server, which is in communication with one or more remote sources including an electronic health record server, a courier server, and the like.

Abstract: Chemical mechanical polishing (CMP) compositions, methods and systems for polish cobalt or cobalt-containing substrates are provided. The CMP compositions comprise ?-alanine, abrasive particles, a salt of phosphate, corrosion inhibitor, oxidizer and water. The cobalt chemical mechanical polishing compositions provide high removal rate of Co as well as very high selectivity of Co film vs. dielectric film, such as TEOS, SixNy (with 1.0<x<3.0, 1.33<y<4.0), low-k, and ultra low-k films.

Abstract: Chemical Mechanical Planarization (CMP) polishing compositions comprising abrasive particles and additives to boost removal rates of films comprising elemental silicon such as poly-silicon and Silicon-Germanium.

Abstract: A turbine engine including a core engine cowl including a compartment, a cooling airflow source positioned within the compartment, and a full authority digital engine control (FADEC) system coupled in communication with the cooling airflow source. The FADEC system is configured to determine a flight status of the turbine engine, and actuate the cooling airflow source when the turbine engine is not in flight, and before the turbine engine has been shut down, such that heat is exhausted from the compartment.

Abstract: Chemical Mechanical Planarization (CMP) polishing compositions comprising abrasive particles and additives to boost removal rates of films comprising elemental silicon such as poly-silicon and Silicon-Germanium.

Abstract: A turbine engine including a core engine cowl including a compartment, a cooling airflow source positioned within the compartment, and a full authority digital engine control (FADEC) system coupled in communication with the cooling airflow source. The FADEC system is configured to determine a flight status of the turbine engine, and actuate the cooling airflow source when the turbine engine is not in flight, and before the turbine engine has been shut down, such that heat is exhausted from the compartment.

Abstract: A turbine engine including a core engine cowl including a compartment, and a cooling system positioned within the compartment. The cooling system includes a cooling fan configured to exhaust heat from the compartment, a temperature sensor configured to monitor a temperature within the compartment, and a controller coupled in communication with the cooling fan and the temperature sensor. The controller is configured to actuate the cooling fan when the temperature is greater than a threshold.

Abstract: Copper chemical mechanical polishing (CMP) formulation, method and system are disclosed. The CMP formulation comprises particulate materials, at least two or more amino acids, oxidizer, corrosion inhibitor, and rest being water.

Abstract: Chemical mechanical polishing (CMP) compositions, methods and systems for polish cobalt or cobalt-containing substrates are provided. The CMP compositions comprise ?-alanine, abrasive particles, a salt of phosphate, corrosion inhibitor, oxidizer and water. The cobalt chemical mechanical polishing compositions provide high removal rate of Co as well as very high selectivity of Co film vs. dielectric film, such as TEOS, SixNy (with 1.0<x<3.0, 1.33<y<4.0), low-k, and ultra low-k films.

Abstract: Copper chemical mechanical polishing (CMP) formulation, method and system are disclosed. The CMP formulation comprises particulate materials, at least two or more amino acids, oxidizer, corrosion inhibitor, and rest being water.

Abstract: The present invention relates to improvements in or relating to air conditioning and other installations, in particular to the removal of condensate and other liquids. We describe a method of preventing siphoning of a liquid through a pump having an inlet and an outlet, which outlet is coupled to a discharge line; the method comprising providing an air inlet valve in the discharge line. We also describe an air-inlet valve comprising a valve body having a liquid inlet and a liquid outlet and a through-bore therebetween further comprising an air-inlet in fluid communication with the through-bore. Preferably, the air-inlet comprises a non-return or one-way valve.

Abstract: The present invention relates to improvements in or relating to pump installations, It has particular relevance in the field of reciprocating piston pumps, such as condensate removal pumps which are used to remove condensate from air conditioning installations. We describe a liquid pulse damping device (20) comprising a body (21) having an inlet (22) and an outlet (23) in fluid communication. Intermediate the inlet and outlet is at least one liquid flow direction changing element (24, 25). Preferably, the at least one flow direction changing element (24, 25) is in the form of an elongate element having a closed end (30, 31) and a side wall, suitably a cylindrical side wall, having at least one bore (40) formed therethrough.

Abstract: The present invention relates to improvements in or relating to pump installations, It has particular relevance in the field of reciprocating piston pumps, such as condensate removal pumps which are used to remove condensate from air conditioning installations. We describe a liquid pulse damping device (20) comprising a body (21) having an inlet (22) and an outlet (23) in fluid communication. Intermediate the inlet and outlet is at least one liquid flow direction changing element (24, 25). Preferably, the at least one flow direction changing element (24, 25) is in the form of an elongate element having a closed end (30, 31) and a side wall, suitably a cylindrical side wall, having at least one bore (40) formed therethrough.