Patents by Inventor Joseph S. Fragala
Joseph S. Fragala has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
-
Patent number: 11694867Abstract: A method for producing a radiation window includes patterning a photo resist structure onto a double-sided silicon wafer, plasma etching the silicon wafer to create an etched silicon wafer having a silicon supporting structure etched upon a first side of the double-sided silicon wafer, applying a silicon nitride thin film to the etched silicon wafer, patterning a photo resist structure and plasma etching a second side of the double-sided silicon wafer to create an initial window in the silicon nitride thin film, and wet etching the second side of the double-sided silicon wafer to release the silicon nitride thin film and supporting structure from the portion of the double-sided silicon wafer defined by the initial window.Type: GrantFiled: August 25, 2021Date of Patent: July 4, 2023Assignee: Bruker Nano, Inc.Inventors: Joseph S. Fragala, Xing Zhao
-
Publication number: 20220068635Abstract: A method for producing a radiation window includes patterning a photo resist structure onto a double-sided silicon wafer, plasma etching the silicon wafer to create an etched silicon wafer having a silicon supporting structure etched upon a first side of the double-sided silicon wafer, applying a silicon nitride thin film to the etched silicon wafer, patterning a photo resist structure and plasma etching a second side of the double-sided silicon wafer to create an initial window in the silicon nitride thin film, and wet etching the second side of the double-sided silicon wafer to release the silicon nitride thin film and supporting structure from the portion of the double-sided silicon wafer defined by the initial window.Type: ApplicationFiled: August 25, 2021Publication date: March 3, 2022Inventors: Joseph S. Fragala, Xing Zhao
-
Patent number: 8393011Abstract: A device comprising at least one cantilever comprising at least one piezoresistor is described, where the cantilevers comprise silicon nitride or silicon carbide and the piezoresistors comprise doped silicon. Methods for making and using such a device are also provided.Type: GrantFiled: May 13, 2009Date of Patent: March 5, 2013Assignee: NanoInk, Inc.Inventors: Joseph S. Fragala, Albert K. Henning, Raymond R. Shile
-
Patent number: 8387529Abstract: Stamps and methods of making stamps for applications in anti-counterfeiting and authentication. The stamps are relatively small in size and feature nanoscale and microscale identification regions and features. High throughput manufacturing and high resolution methods are used to make the stamps including electron beam lithography and optical lithography. Anti-fouling coatings can be applied.Type: GrantFiled: November 1, 2011Date of Patent: March 5, 2013Assignee: NanoInk, Inc.Inventors: Joseph S. Fragala, Cedric Loiret-Bernal, Hua Zhang, Raymond Roger Shile, Bjoern Rosner, Sylvain Cruchon-Dupeyrat
-
Publication number: 20120297509Abstract: Massive parallel printing of structures and nanostructures at high speed with high resolution and high quality using two dimensional arrays comprising cantilevers and tip-based transfer of material to a surface. The array is designed so only tips touch the surface. This can be accomplished by long tips and bent cantilevers and alignment. An article comprising: a two-dimensional array of a plurality of cantilevers, wherein the array comprises a plurality of base rows, each base row comprising a plurality of cantilevers, wherein each of the cantilevers comprise tips at the cantilever end away from the base, wherein the number of cantilevers is greater than 250, and wherein the tips have an apex height relative to the cantilever of at least four microns, and a support for the array. Combinatorial arrays and bioarrays can be prepared. The arrays can be manufactured by micromachining methods.Type: ApplicationFiled: June 21, 2012Publication date: November 22, 2012Inventors: Chad A. Mirkin, Khalid Salaita, Yuhuang Wang, Joseph S. Fragala, Raymond R. Shile
-
Publication number: 20120295030Abstract: Improved high density, hard tip arrays for use in patterning are provided. An article comprises a handle chip; and a silicon nitride membrane bonded to at least a portion of the handle chip. The silicon nitride membrane comprises an array of a plurality of silicon nitride tips extending directly from a surface of the silicon nitride membrane. Another article comprises an elastomeric backing member; and an array of tips disposed on the elastomeric backing member. The tips of the array comprise a refractory material. Methods of making such articles are also provided.Type: ApplicationFiled: May 16, 2012Publication date: November 22, 2012Inventors: Albert K. HENNING, Raymond Roger Shile, Joseph S. Fragala, Nabil A. Amro, Jason R. Haaheim
-
Patent number: 8261662Abstract: Improved actuated probes suitable for scanning probe lithography or microscopy, and especially direct-write nanolithography and method of fabrication thereof. In one embodiment, thermomechanically actuated cantilevers with oxide-sharpened microcast tips are inexpensively fabricated by a process that comprises low-temperature wafer bonding, such as (gold) thermocompressive bonding, eutectic or adhesive bonding. Also provided is a flexcircuit that electrically interconnects the actuated probes to external circuitry and mechanically couples them to the instrument actuator. An improved scanning probe lithography instrument, hardware and software, can be built around the actuated cantilevers and the flexcircuit. Finally, provided is an improved microfluidic circuit to deliver chemical compounds to the tips of (actuated) probes and a fabrication method for tall, high-aspect-ratio tips.Type: GrantFiled: November 8, 2005Date of Patent: September 11, 2012Assignee: Nanolnk, Inc.Inventors: Raymond Roger Shile, Terrisa Duenas, John Edward Bussan, Gregory J. Athas, Joseph S. Fragala, Jason R. Haaheim, Sylvain Cruchon-Dupeyrat, Jeffrey R. Rendlen
-
Patent number: 8261368Abstract: Devices for performing nanofabrication are provided which provide small volume reaction space and high reaction versatility. A device may include a reaction chamber adapted for nanoscale modification of a substrate and vacuum conditions; a scanning probe tip assembly enclosed within the reaction chamber; a first port coupled to the reaction chamber for delivering a gas; a second port coupled to the reaction chamber for applying a vacuum; and a substrate assembly insertedly mounted to the reaction chamber. The reaction chamber may include a body having one or more flexible walls and one or more supports to prevent the reaction chamber from collapsing under a vacuum. The device may further include an electrical conduit for coupling the tips of the scanning probe tip assembly to electrical components outside the reaction chamber. Also provided are apparatuses incorporating the devices and methods of using the devices and apparatuses.Type: GrantFiled: May 13, 2009Date of Patent: September 4, 2012Assignee: NanoInk, Inc.Inventors: John Edward Bussan, Michael R. Nelson, Joseph S. Fragala, Albert K. Henning, Jeffrey R. Rendlen
-
Patent number: 8235302Abstract: Methods for providing pharmaceutical compositions and objects with identification regions and identification features which are difficult to detect. Microlithography, nanolithography, and stamping methods are used. The identification features can be positive protrusions or negative indentations with respect to the surface. The identification regions can comprise bar codes and holograms. DPN printing or other lithographies such as electron beam lithography, optical lithography, or nanoimprint lithography can be used to prepare stamps, which are then used to prepare the identification features. Redundant patterns can be formed. The invention is useful for counterfeit prevention. An apparatus for stamping the identification features is also described.Type: GrantFiled: April 20, 2005Date of Patent: August 7, 2012Assignee: Nanolnk, Inc.Inventors: Cedric Loiret-Bernal, Linette Demers, Bjoern Rosner, Michael Nelson, Ray Eby, Joseph S. Fragala, Raymond Roger Shile, Hua Zhang, John Edward Bussan, Sylvain Cruchon-Dupeyrat
-
Patent number: 8220317Abstract: Massive parallel printing of structures and nanostructures at high speed with high resolution and high quality using two dimensional arrays comprising cantilevers and tip-based transfer of material to a surface. The array is designed so only tips touch the surface. This can be accomplished by long tips and bent cantilevers and alignment. An article comprising: a two-dimensional array of a plurality of cantilevers, wherein the array comprises a plurality of base rows, each base row comprising a plurality of cantilevers, wherein each of the cantilevers comprise tips at the cantilever end away from the base, wherein the number of cantilevers is greater than 250, and wherein the tips have an apex height relative to the cantilever of at least four microns, and a support for the array. Combinatorial arrays and bioarrays can be prepared. The arrays can be manufactured by micromachining methods.Type: GrantFiled: March 23, 2007Date of Patent: July 17, 2012Assignees: Northwestern University, NanoInk, Inc.Inventors: Chad A. Mirkin, Khalid Salaita, Yuhuang Wang, Joseph S. Fragala, Raymond R. Shile
-
Publication number: 20120164564Abstract: Additive repair of advanced photomasks with low temperature or optical curing via direct write lithographic printing with sharp tips and cantilevers. The optical properties of the materials formed from the ink can be tuned (e.g., n and k values). Sol gel inks, including silsesquioxane inks, can be used to form MoSi compositions. The repaired photomasks are resistant to washing under normal photomask washing conditions. AFM instrumentation can be used to perform the additive repair to provide the high resolution and registration.Type: ApplicationFiled: June 29, 2010Publication date: June 28, 2012Inventors: Nabil Amro, Raymond Sanedrin, Sandeep Disawal, Joseph S. Fragala
-
Publication number: 20120052415Abstract: Stamps and methods of making stamps for applications in anti-counterfeiting and authentication. The stamps are relatively small in size and feature nanoscale and microscale identification regions and features. High throughput manufacturing and high resolution methods are used to make the stamps including electron beam lithography and optical lithography. Anti-fouling coatings can be applied.Type: ApplicationFiled: November 1, 2011Publication date: March 1, 2012Inventors: Joseph S. Fragala, Cedric Loiret-Bernal, Hua Zhang, Raymond Roger Shile, Bjoern Rosner, Sylvain Cruchon-Dupeyrat
-
Patent number: 8069782Abstract: Stamps and methods of making stamps for applications in anti-counterfeiting and authentication. The stamps are relatively small in size and feature nanoscale and microscale identification regions and features. High throughput manufacturing and high resolution methods are used to make the stamps including electron beam lithography and optical lithography. Anti-fouling coatings can be applied.Type: GrantFiled: December 19, 2005Date of Patent: December 6, 2011Assignee: Nanoink, Inc.Inventors: Joseph S. Fragala, Cedric Loiret-Bernal, Hua Zhang, Raymond Roger Shile, Bjoern Rosner, Sylvain Cruchon-Dupeyrat
-
Publication number: 20110274839Abstract: Cantilever design for patterning from a cantilever tip can be improved with, for example, a recessed area surrounding the cantilever tip. A device for printing nanoscopic and microscopic patterns includes at least one cantilever having a front surface, a first side edge, a second side edge, and a first end which is a free end and a second end which is a non-free end.Type: ApplicationFiled: April 13, 2011Publication date: November 10, 2011Inventors: Joseph S. Fragala, R. Roger Shile, Sergey V. Rozhok
-
Publication number: 20110195850Abstract: An apparatus for use in fabricating structures and depositing materials from tips to surfaces for patterning in direct-write mode, providing ability to travel macroscopic distances and yet provide for nanoscale patterning. Useful in small scale fabrication and nanolithography. The instrument can be compact and used on a laboratory bench or desktop. An apparatus comprising: at least one multi-axis assembly comprising a plurality of nanopositioning stages, at least one pen assembly, wherein the pen assembly and the multi-axis assembly are adapted for delivery of material from the pen assembly to a substrate which is positioned by the multi-axis assembly, at least one viewing assembly, at least one controller. Nanopositioning by piezoelectric methods and devices and motors is particularly useful. The apparatus can include integrated environmental chambers and housings, as well as ink reservoirs for materials to be delivered. The viewing assembly can be a microscope with a long working distance.Type: ApplicationFiled: April 15, 2011Publication date: August 11, 2011Inventors: Sergey V. ROZHOK, Michael Nelson, Nabil A. Amro, Joseph S. Fragala, Raymond Roger Shile, John Edward Bussan, Dirk N. vanMerkestyn
-
Publication number: 20110014378Abstract: Devices for leveling an object for patterning a substrate surface, including an array of scanning probe tips, are provided. A device may include a support structure adapted to mount an object, the object having a plurality of protrusions adapted to form a pattern on a surface of a substrate upon contact of the object to the surface; and at least one flexible joint assembly mounted to the support structure and adapted to allow the object to achieve a parallel orientation with respect to the surface upon contact of the object to the surface. Also provided are apparatuses and kits incorporating the devices and methods of making and using the devices and apparatuses.Type: ApplicationFiled: July 16, 2010Publication date: January 20, 2011Inventors: John Edward BUSSAN, Sergey V. Rozhok, Vadim Val-Khvalabov, Joseph S. Fragala, Jason R. Haaheim, Michael R. Nelson, Edward R. Solheim, Javad M. Vakil
-
Publication number: 20100294844Abstract: Methods for providing pharmaceutical compositions and objects with identification regions and identification features which are difficult to detect. Microlithography, nanolithography, and stamping methods are used. The identification features can be positive protrusions or negative indentations with respect to the surface. The identification regions can comprise bar codes and holograms. DPN printing or other lithographies such as electron beam lithography, optical lithography, or nanoimprint lithography can be used to prepare stamps, which are then used to prepare the identification features. Redundant patterns can be formed. The invention is useful for counterfeit prevention. An apparatus for stamping the identification features is also described.Type: ApplicationFiled: April 20, 2005Publication date: November 25, 2010Inventors: Cedric Loiret-Bernal, Linette Demers, Bjoern Rosner, Michael Nelson, Ray Eby, Joseph S. Fragala, Raymond Roger Shile, Hua Zhang, John Edward Bussan, Sylvain Cruchon-Dupeyrat
-
Publication number: 20100294146Abstract: Stamps and methods of making stamps for applications in anti-counterfeiting and authentication. The stamps are relatively small in size and feature nanoscale and microscale identification regions and features. High throughput manufacturing and high resolution methods are used to make the stamps including electron beam lithography and optical lithography. Anti-fouling coatings can be applied.Type: ApplicationFiled: December 19, 2005Publication date: November 25, 2010Inventors: Joseph S. Fragala, Cedric Loiret-Bernal, Hua Zhang, Raymond Roger Shile, Bjoern Rosner, Sylvain Cruchon-Dupeyrat
-
Publication number: 20100297190Abstract: Methods for providing pharmaceutical compositions and objects with identification regions and identification features which are difficult to detect. Microlithography, nanolithography, and stamping methods are used. The identification features can be positive protrusions or negative indentations with respect to the surface. The identification regions can comprise bar codes and holograms. DPN printing or other lithographies such as electron beam lithography, optical lithography, or nanoimprint lithography can be used to prepare stamps, which are then used to prepare the identification features. Redundant patterns can be formed. The invention is useful for counterfeit prevention. An apparatus for stamping the identification features is also described.Type: ApplicationFiled: August 5, 2009Publication date: November 25, 2010Inventors: Cedric Loiret-Bernal, Linette Demers, Bjoern Rosner, Michael Nelson, Ray Eby, Joseph S. Fragala, Raymond Roger Shile, Hua Zhang, John Edward Bussan, Sylvain Cruchon-Dupeyrat
-
Publication number: 20100242765Abstract: Inkwells adapted for use in direct-write nanolithography and other applications including use of wells, channels, and posts. The wells can possess a geometry which matches the geometry of tips which are dipped into the inkwells. The channels can be open or closed. Hydrophilicity and hydrophobicity can be used to control ink flow. SEM can be used to characterize the inkwells. Ink flow can be monitored with video. Hydrophobic material layers can be used to prevent cross contamination. Microsyringes can be used to fill reservoirs. Satellite reservoirs can be used to prevent bubble formation.Type: ApplicationFiled: March 26, 2010Publication date: September 30, 2010Inventors: Sylvain Cruchon-Dupeyrat, Michael Nelson, Robert Elghanian, Joseph S. Fragala, Igor Touzov, Debjyoti Banerjee