Patents by Inventor Joseph S. Sedita

Joseph S. Sedita has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Imaged element with improved wet abrasion resistance
    Patent number: 6428948
    Abstract: The present invention relates to photographic elements, including photographic prints, having a protective overcoat that resists fingerprints, common stains, and spills. More particularly, the present invention provides a processing-solution-permeable protective overcoat that is water resistant in the final processed product and which, at the same time, provides improved wet-abrasion resistance.
    Type: Grant
    Filed: March 13, 2001
    Date of Patent: August 6, 2002
    Assignee: Eastman Kodak Company
    Inventors: Tiecheng A. Qiao, Joseph S. Sedita, Mridula Nair, Brian J. Kelley, Yongcai Wang
  • Imaged element with improved wet abrasion resistance
    Publication number: 20020018969
    Abstract: The present invention relates to photographic elements, including photographic prints, having a protective overcoat that resists fingerprints, common stains, and spills. More particularly, the present invention provides a processing-solution-permeable protective overcoat that is water resistant in the final processed product and which, at the same time, provides improved wet-abrasion resistance.
    Type: Application
    Filed: March 13, 2001
    Publication date: February 14, 2002
    Inventors: Tiecheng A. Qiao, Joseph S. Sedita, Mridula Nair, Brian J. Kelley, Yongcai Wang
  • Scratch resistant layer for imaging elements
    Patent number: 6346369
    Abstract: The present invention is an imaging element which includes a support and at least one imaging layer superposed on the support. The imaging layer includes a scratch resistant outermost layer either overlying the imaging layer or on the side opposite the imaging layer, and is composed of a ductile polymer having a modulus greater than 100 MPa measured at 20° C. and a tensile elongation to break greater than 50 percent, and a stiff filler having a modulus greater than 10 GPa at a volume concentration in the scratch resistant layer of 30 to 60%. The scratch resistant layer has a thickness of at least 0.5 &mgr;m.
    Type: Grant
    Filed: June 3, 1998
    Date of Patent: February 12, 2002
    Assignee: Eastman Kodak Company
    Inventors: Andy H. Tsou, Charles C. Anderson, Joseph S. Sedita
  • Protective overcoat comprising polyester ionomers for photographic elements
    Patent number: 6274298
    Abstract: The present invention is directed to a photographic element comprising a support, at least one silver halide emulsion layer superposed on the support, and a processing-solution-permeable protective overcoat overlying the silver halide emulsion layer. The processing solution permeable overcoat is composed of a polyester ionomer. The present invention is also directed to a method of making a photographic print involving developing the photographic element. The imaged photographic element exhibits water, stain, and wet-abrasion resistance.
    Type: Grant
    Filed: June 7, 2000
    Date of Patent: August 14, 2001
    Assignee: Eastman Kodak Company
    Inventors: Mridula Nair, Tamara K. Jones, Joseph S. Sedita, David M. Teegarden, Bobbi A. Wohlschlegel
  • Imaged element with improved wet abrasion resistance
    Patent number: 6258517
    Abstract: The present invention relates to photographic elements, including photographic prints, having a protective overcoat that resists fingerprints, common stains, and spills. More particularly, the present invention provides a processing-solution-permeable protective overcoat that is water resistant in the final processed product and which, at the same time, provides improved wet-abrasion resistance.
    Type: Grant
    Filed: June 6, 2000
    Date of Patent: July 10, 2001
    Assignee: Eastman Kodak Company
    Inventors: Tiecheng A. Qiao, Joseph S. Sedita, Mridula Nair, Brian J. Kelley, Yongcai Wang