Patents by Inventor Joseph Travis Kennedy

Joseph Travis Kennedy has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Use of sacrificial inorganic dielectrics for dual damascene processes utilizing organic intermetal dielectrics
    Patent number: 6812131
    Abstract: Dual damascene methods of fabricating conducting lines and vias in organic intermetal dielectric layers utilize sacrificial inorganic dielectrics. In one embodiment, a via opening formed in organic intermetal dielectric layers is filled with sacrificial inorganic dielectric. A line opening is formed aligned with the via opening. The sacrificial inorganic dielectric is selectively removed. The via and line openings are filled with conducting material. In a second embodiment, a line opening formed in organic intermetal dielectric layers is filled with sacrificial inorganic dielectric. A via opening is formed aligned with the line opening. The sacrificial inorganic dielectric is selectively removed. The via and line openings are filled with conducting material. The sacrificial inorganic dielectrics protect the organic intermetal dielectric layers, preserving critical dimensions and facilitating photoresist rework.
    Type: Grant
    Filed: April 11, 2000
    Date of Patent: November 2, 2004
    Assignee: Honeywell International Inc.
    Inventors: Joseph Travis Kennedy, Henry Chung, Anna George