Abstract: An electroplating shield device, methods of fabricating the same, and methods of electroplating with the electroplating shield device are disclosed herein. The method of electroplating includes positioning an object in an electroplating shield device. The electroplating shield device may include a conduit configured to receive the object and a plurality of openings selectively extended between inner and outer surfaces of the conduit. The openings may be positioned between first and second ends of the conduit. The method may also include forming a layer on the object by transferring fluid through the plurality of openings to at least one of a first continuous section of the object comprising a minor of the object and a second continuous section of the object comprising a major of the object. A ratio of a thickness of the major to the minor after forming the layer may range from approximately 1:1 to approximately 1:18.

Abstract: Systems and methods for automated electroplating are disclosed. An electroplating system includes a first chamber configured to receive one or more parts. The first chamber includes a vessel extending from a first end to a second end, a first cap proximate to the first end a first cathode contact coupled to the first end, a second cathode contact coupled to the second end, and a plurality of anodes formed on an inner surface of the vessel. The electroplating system further includes at least one reservoir and a first conduit and a second conduit each coupled between the at least one reservoir and the first chamber. The first conduit may be configured to transfer fluid from the first reservoir to the first chamber and the second conduit may be configured to transfer fluid from the first chamber to the at least one reservoir.

Abstract: Corrosion-resistant laminated structures and methods of fabricating laminated structures are disclosed. A method of fabricating a laminated structure includes: providing an object in an electroplating solution; forming a first layer on the object by applying a first electric current, the first electric current being associated with a first current density; and forming a second layer on the first layer by applying a second electric current, the second electric current being associated with a second current density. Each of the first layer and the second layer includes, at least in part, phosphorus. The first current density and the second current density are different.

Abstract: An electroplating device includes a conduit extending from a first end to a second end. The conduit is configured to house an object for electroplating. A first set of apertures is formed on a surface of the conduit. Each of the first set of apertures has a first size. A second set of apertures is formed on the surface of the conduit adjacent the first set of apertures. Each of the second set of apertures has a second size. The first set of apertures are configured to be in alignment with a first continuous section of the object and transfer fluid to the first continuous section of the object at a first rate. The second set of apertures are configured to be in alignment with a second continuous section of the object and transfer fluid to the second continuous section of the object at a second rate.

Abstract: Systems and methods for automated electroplating are disclosed. An electroplating system includes a first chamber configured to receive one or more parts. The first chamber includes a vessel extending from a first end to a second end, a first cap proximate to the first end a first cathode contact coupled to the first end, a second cathode contact coupled to the second end, and a plurality of anodes formed on an inner surface of the vessel. The electroplating system further includes at least one reservoir and a first conduit and a second conduit each coupled between the at least one reservoir and the first chamber. The first conduit may be configured to transfer fluid from the first reservoir to the first chamber and the second conduit may be configured to transfer fluid from the first chamber to the at least one reservoir.