Patents by Inventor Joseph Werner De Vocht
Joseph Werner De Vocht has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11379648Abstract: A method for determining an overlapping process window (OPW) of an area of interest on a portion of a design layout for a device manufacturing process for imaging the portion onto a substrate, the method including: obtaining a plurality of features in the area of interest; obtaining a plurality of values of one or more processing parameters of the device manufacturing process; determining existence of defects, probability of the existence of defects, or both in imaging the plurality of features by the device manufacturing process under each of the plurality of values; and determining the OPW of the area of interest from the existence of defects, the probability of the existence of defects, or both.Type: GrantFiled: August 14, 2020Date of Patent: July 5, 2022Assignee: ASML Netherlands B.V.Inventors: Frank Gang Chen, Joseph Werner De Vocht, Yuelin Du, Wanyu Li, Yen-Wen Lu
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Publication number: 20200372201Abstract: A method for determining an overlapping process window (OPW) of an area of interest on a portion of a design layout for a device manufacturing process for imaging the portion onto a substrate, the method including: obtaining a plurality of features in the area of interest; obtaining a plurality of values of one or more processing parameters of the device manufacturing process; determining existence of defects, probability of the existence of defects, or both in imaging the plurality of features by the device manufacturing process under each of the plurality of values; and determining the OPW of the area of interest from the existence of defects, the probability of the existence of defects, or both.Type: ApplicationFiled: August 14, 2020Publication date: November 26, 2020Applicant: ASML NETHERLANDS B.V.Inventors: Frank Gang CHEN, Joseph Werner De Vocht, Yuelin Du, Wanyu Li, Yen-Wen Lu
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Patent number: 10755025Abstract: Disclosed herein is a computer-implemented method for determining an overlapping process window (OPW) of an area of interest on a portion of a design layout for a device manufacturing process for imaging the portion onto a substrate, the method including: obtaining a plurality of features in the area of interest; obtaining a plurality of values of one or more processing parameters of the device manufacturing process; determining existence of defects, probability of the existence of defects, or both in imaging the plurality of features by the device manufacturing process under each of the plurality of values; and determining the OPW of the area of interest from the existence of defects, the probability of the existence of defects, or both.Type: GrantFiled: November 22, 2017Date of Patent: August 25, 2020Assignee: ASML Netherlands B.V.Inventors: Frank Gang Chen, Joseph Werner De Vocht, Yuelin Du, Wanyu Li, Yen-Wen Lu
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Publication number: 20180089359Abstract: Disclosed herein is a computer-implemented method for determining an overlapping process window (OPW) of an area of interest on a portion of a design layout for a device manufacturing process for imaging the portion onto a substrate, the method including: obtaining a plurality of features in the area of interest; obtaining a plurality of values of one or more processing parameters of the device manufacturing process; determining existence of defects, probability of the existence of defects, or both in imaging the plurality of features by the device manufacturing process under each of the plurality of values; and determining the OPW of the area of interest from the existence of defects, the probability of the existence of defects, or both.Type: ApplicationFiled: November 22, 2017Publication date: March 29, 2018Applicant: ASML NETHERLANDS B.V.Inventors: Frank Gang CHEN, Joseph Werner DE VOCHT, Yuelin DU, Wanyu LI, Yen-Wen LU
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Patent number: 9842186Abstract: Disclosed herein is a computer-implemented method for determining an overlapping process window (OPW) of an area of interest on a portion of a design layout for a device manufacturing process for imaging the portion onto a substrate, the method comprising: obtaining a plurality of features in the area of interest; obtaining a plurality of values of one or more processing parameters of the device manufacturing process; determining existence of defects, probability of the existence of defects, or both in imaging the plurality of features by the device manufacturing process under each of the plurality of values; and determining the OPW of the area of interest from the existence of defects, the probability of the existence of defects, or both.Type: GrantFiled: September 22, 2015Date of Patent: December 12, 2017Assignee: ASML NETHERLANDS B.V.Inventors: Frank Gang Chen, Joseph Werner De Vocht, Yuelin Du, Wanyu Li, Yen-Wen Lu
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Patent number: 9361400Abstract: A method is provided for initializing an XML database. The method includes the steps of parsing an XML file to extract a plurality of records, the records arranged in a hierarchical form, creating, for each record, a plurality of class objects, each class having associated therewith one or more attributes, and creating a plurality of handling methods for each of one or more attributes associated with each class object, the handling methods defining how the database can be accessed.Type: GrantFiled: October 10, 2008Date of Patent: June 7, 2016Assignee: ASML NETHERLANDS B.V.Inventors: Leo Lilin Zhao, Jang Fung Chen, Joseph Werner De Vocht
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Publication number: 20160085905Abstract: Disclosed herein is a computer-implemented method for determining an overlapping process window (OPW) of an area of interest on a portion of a design layout for a device manufacturing process for imaging the portion onto a substrate, the method comprising: obtaining a plurality of features in the area of interest; obtaining a plurality of values of one or more processing parameters of the device manufacturing process; determining existence of defects, probability of the existence of defects, or both in imaging the plurality of features by the device manufacturing process under each of the plurality of values; and determining the OPW of the area of interest from the existence of defects, the probability of the existence of defects, or both.Type: ApplicationFiled: September 22, 2015Publication date: March 24, 2016Applicant: ASML NETHERLANDS B.V.Inventors: Frank Gang CHEN, Joseph Werner DE VOCHT, Yuelin DU, Wanyu LI, Yen-Wen LU
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Publication number: 20090313288Abstract: A method is provided for initializing an XML database. The method includes the steps of parsing an XML file to extract a plurality of records, the records arranged in a hierarchical form, creating, for each record, a plurality of class objects, each class having associated therewith one or more attributes, and creating a plurality of handling methods for each of one or more attributes associated with each class object, the handling methods defining how the database can be accessed.Type: ApplicationFiled: October 10, 2008Publication date: December 17, 2009Inventors: Leo Lilin Zhao, Jang Fung Chen, Joseph Werner De Vocht