Patents by Inventor Joshua Byrne

Joshua Byrne has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Chamber monitoring and adjustment by plasma RF metrology
    Patent number: 6051284
    Abstract: A method and apparatus for monitoring a parameter of the RF power applied to a plasma-enhanced chemical vapor deposition (PECVD) chamber. The parameter is used to monitor an aspect of the chamber or a process in the chamber. In particular, the parameter can be used to determine whether the susceptor is properly aligned, determine the spacing of the susceptor from the gas discharge head, determine whether the wafer is properly aligned on the susceptor, determine whether there has been any deterioration of the susceptor or the gas discharge head, and determine whether a chamber clean operation is complete.
    Type: Grant
    Filed: May 8, 1996
    Date of Patent: April 18, 2000
    Assignee: Applied Materials, Inc.
    Inventors: Joshua Byrne, Tirunelveli S. Ravi, Martin Seamons, Eric Hanson