Patents by Inventor Joshua Croll

Joshua Croll has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20080015330
    Abstract: This invention relates to organic salt compositions useful in the preparation of organoclay compositions, polymer-organoclay composite compositions, and methods for the preparation of polymer nanocomposites. In one embodiment, the present invention provides novel organophosphonium salts having structure I wherein Ar1, Ar2, and Ar3 are independently C2-C50 aromatic radicals; Ar4 is a bond or a C2-C50 aromatic radical; “a” is a number from 1 to about 200; “c” is a number from 0 to 3; R1 is independently at each occurrence a halogen atom, a C1-C20 aliphatic radical, a C5-C20 cycloaliphatic radical, or a C2-C20 aromatic radical; R2 is a halogen atom, a C1-C20 aliphatic radical, a C5-C20 cycloaliphatic radical, a C2-C50 aromatic radical, or a polymer chain; and X? is a charge balancing counterion. In another embodiment, the present invention provides methodologies for the preparation of organophosphonium salts having structure I.
    Type: Application
    Filed: June 21, 2007
    Publication date: January 17, 2008
    Inventors: Kwok Chan, Joshua Croll, Balakrishnan Ganesan, Marcus Harrigan, Gurram Kishan, Ritesh Mathur, Rachel Suffield, Wenhui Wang, James White
  • Publication number: 20070299186
    Abstract: This invention relates to organic salt compositions useful in the preparation of organoclay compositions, polymer-organoclay composite compositions, and methods for the preparation of polymer nanocomposites. In one embodiment, the present invention provides an organoclay composition comprising alternating inorganic silicate layers and organic layers, said organic layers comprising a quaternary phosphonium cation having structure X wherein Ar1, Ar2, and Ar3 are independently C2-C50 aromatic radicals; Ar4 is a bond or a C2-C50 aromatic radical; “a” is a number from 1 to about 200; “c” is a number from 0 to 3; R1 is independently at each occurrence a halogen atom, a C1-C20 aliphatic radical, a C5-C20 cycloaliphatic radical, or a C2-C20 aromatic radical; and R2 is a halogen atom, a C1-C20 aliphatic radical, a C5-C20 cycloaliphatic radical, a C2-C50 aromatic radical, or a polymer chain.
    Type: Application
    Filed: June 21, 2007
    Publication date: December 27, 2007
    Inventors: Kwok Chan, Joshua Croll, Balakrishnan Ganesan, Marcus Harrigan, Farid Khouri, Gurram Kishan, Ritesh Mathur, Rachel Suffield, Wenhui Wang, James White
  • Publication number: 20060194070
    Abstract: Various embodiments of a polyetherimide film and multilayer structure are provided. In one embodiment the polyetherimide film has a glass transition temperature that ranges from about 260° C. to about 350° C. and the polyetherimide has a melt viscosity range from about 200 to about 10,000 Pascal-seconds at 425° C. as measured by ASTM method D3835.
    Type: Application
    Filed: February 25, 2005
    Publication date: August 31, 2006
    Inventors: Joshua Croll, Irene Dris, Robert Gallucci, Kapil Sheth, Guangda Shi, James White
  • Publication number: 20060084741
    Abstract: Various embodiments of a polymer composition are provided. In one embodiment the polymer composition includes, by weight, from about 50% to about 95% polyetherimide resin and from about 5% to about 50% inorganic substance. The polymer composition when formed into a film has a coefficient of thermal expansion of less than about 50 ppm/° C.
    Type: Application
    Filed: October 19, 2004
    Publication date: April 20, 2006
    Inventors: Sapna Blackburn, Joshua Croll, Irene Dris, Emine Gurel, Kapil Sheth