Patents by Inventor Joshua Guske

Joshua Guske has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • ETCHING COMPOSITIONS
    Publication number: 20240287384
    Abstract: The present disclosure is directed to etching compositions that are useful for, e.g., selectively removing tantalum nitride (TaN) from a semiconductor substrate.
    Type: Application
    Filed: February 21, 2024
    Publication date: August 29, 2024
    Inventors: Joshua Guske, Atsushi Mizutani
  • Cleaning Compositions
    Publication number: 20220306971
    Abstract: This disclosure relates to a cleaning composition that contains 1) hydroxylamine, 2) an amino alcohol, 3) hexylene glycol, and 4) water.
    Type: Application
    Filed: June 2, 2022
    Publication date: September 29, 2022
    Inventors: Thomas Dory, Mick Bjelopavlic, Joshua Guske, Kazutaka Takahashi
  • Cleaning compositions
    Patent number: 11407966
    Abstract: This disclosure relates to a cleaning composition that contains 1) hydroxylamine, 2) an amino alcohol, 3) hexylene glycol, and 4) water.
    Type: Grant
    Filed: January 26, 2022
    Date of Patent: August 9, 2022
    Assignee: Fujifilm Electronic Materials U.S.A., Inc.
    Inventors: Thomas Dory, Mick Bjelopavlic, Joshua Guske, Kazutaka Takahashi
  • Cleaning Compositions
    Publication number: 20220145221
    Abstract: This disclosure relates to a cleaning composition that contains 1) hydroxylamine, 2) an amino alcohol, 3) hexylene glycol, and 4) water.
    Type: Application
    Filed: January 26, 2022
    Publication date: May 12, 2022
    Inventors: Thomas Dory, Mick Bjelopavlic, Joshua Guske, Kazutaka Takahashi
  • Cleaning compositions
    Patent number: 11279903
    Abstract: This disclosure relates to a cleaning composition that contains 1) at least one redox agent; 2) at least one alkylsulfonic acid or a salt thereof, the alkylsulfonic acid containing an alkyl group substituted by OH or NH2; and 3) at least one aminoalcohol.
    Type: Grant
    Filed: July 8, 2020
    Date of Patent: March 22, 2022
    Assignee: Fujifilm Electronic Materials U.S.A., Inc.
    Inventors: Thomas Dory, Mick Bjelopavlic, Joshua Guske, Kazutaka Takahashi
  • ETCHING COMPOSITIONS
    Publication number: 20200377792
    Abstract: The present disclosure is directed to etching compositions that are useful for, e.g., selectively removing tantalum nitride (TaN) from a semiconductor substrate.
    Type: Application
    Filed: May 27, 2020
    Publication date: December 3, 2020
    Inventors: Joshua Guske, Atsushi Mizutani
  • Cleaning Compositions
    Publication number: 20200332231
    Abstract: This disclosure relates to a cleaning composition that contains 1) at least one redox agent; 2) at least one alkylsulfonic acid or a salt thereof, the alkylsulfonic acid containing an alkyl group substituted by OH or NH2; and 3) at least one aminoalcohol.
    Type: Application
    Filed: July 8, 2020
    Publication date: October 22, 2020
    Inventors: Thomas Dory, Mick Bjelopavlic, Joshua Guske, Kazutaka Takahashi
  • Cleaning compositions
    Patent number: 10752867
    Abstract: This disclosure relates to a cleaning composition that contains 1) at least one redox agent; 2) at least one alkylsulfonic acid or a salt thereof, the alkylsulfonic acid containing an alkyl group substituted by OH or NH2; 3) at least one aminoalcohol; 4) at least one corrosion inhibitor; 5) at least one water soluble organic solvent; 6) water; and 7) optionally, at least one pH adjusting agent.
    Type: Grant
    Filed: February 19, 2019
    Date of Patent: August 25, 2020
    Assignee: Fujifilm Electronic Materials U.S.A., Inc.
    Inventors: Thomas Dory, Mick Bjelopavlic, Joshua Guske, Kazutaka Takahashi
  • Cleaning Compositions
    Publication number: 20190300825
    Abstract: This disclosure relates to a cleaning composition that contains 1) at least one redox agent; 2) at least one alkylsulfonic acid or a salt thereof, the alkylsulfonic acid containing an alkyl group substituted by OH or NH2; 3) at least one aminoalcohol; 4) at least one corrosion inhibitor; 5) at least one water soluble organic solvent; 6) water; and 7) optionally, at least one pH adjusting agent.
    Type: Application
    Filed: February 19, 2019
    Publication date: October 3, 2019
    Inventors: Thomas Dory, Mick Bjelopavlic, Joshua Guske, Kazutaka Takahashi