Patents by Inventor Joshua S. Holt

Joshua S. Holt has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Methods of forming doped silicide power devices
    Patent number: 11605741
    Abstract: Exemplary methods of forming a semiconductor structure may include forming a layer of metal on a semiconductor substrate. The layer of metal may extend along a first surface of the semiconductor substrate. The semiconductor substrate may be or include silicon. The methods may include performing an anneal to produce a metal silicide. The methods may include implanting ions in the metal silicide to increase a barrier height over 0.65 V.
    Type: Grant
    Filed: November 23, 2020
    Date of Patent: March 14, 2023
    Assignee: Applied Materials, Inc.
    Inventors: Joshua S. Holt, Lan Yu, Tyler Sherwood, Archana Kumar, Nicolas Louis Gabriel Breil, Siddarth Krishnan
  • METHODS OF FORMING DOPED SILICIDE POWER DEVICES
    Publication number: 20220165574
    Abstract: Exemplary methods of forming a semiconductor structure may include forming a layer of metal on a semiconductor substrate. The layer of metal may extend along a first surface of the semiconductor substrate. The semiconductor substrate may be or include silicon. The methods may include performing an anneal to produce a metal silicide. The methods may include implanting ions in the metal silicide to increase a barrier height over 0.65 V.
    Type: Application
    Filed: November 23, 2020
    Publication date: May 26, 2022
    Applicant: Applied Materials, Inc.
    Inventors: Joshua S. Holt, Lan Yu, Tyler Sherwood, Archana Kumar, Nicolas Louis Gabriel Breil, Siddarth Krishnan