Patents by Inventor Jospeh P. HASSELBACH

Jospeh P. HASSELBACH has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • LOCALLY TAILORING CHEMICAL MECHANICAL POLISHING (CMP) POLISH RATE FOR DIELECTRICS
    Publication number: 20130147067
    Abstract: A method of manufacturing a semiconductor structure includes varying local chemical mechanical polishing (CMP) abrading rates of an insulator film by selectively varying a carbon content of the insulator film.
    Type: Application
    Filed: December 12, 2011
    Publication date: June 13, 2013
    Applicant: INTERNATIONAL BUSINESS MACHINES CORPORATION
    Inventors: Yoba AMOAH, Graham M. BATES, Jospeh P. HASSELBACH, Thomas L. MCDEVITT, Eva A. SHAH