Patents by Inventor Jouke Krist

Jouke Krist has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method and apparatus for determining lithographic quality of a structure
    Patent number: 9518936
    Abstract: Method for determining lithographic quality of a structure produced by a lithographic process using a periodic pattern, such as a grating, detects lithographic process window edges and optimum process conditions.
    Type: Grant
    Filed: October 30, 2013
    Date of Patent: December 13, 2016
    Assignee: ASML Netherlands B.V.
    Inventors: Willem Jan Grootjans, Henricus Johannes Lambertus Megens, Jouke Krist, Miguel Garcia Granda, Lu Xu
  • Method and Apparatus for Determining Lithographic Quality of a Structure
    Publication number: 20150308966
    Abstract: Method for determining lithographic quality of a structure produced by a lithographic process using a periodic pattern, such as a grating, detects lithographic process window edges and optimum process conditions.
    Type: Application
    Filed: October 30, 2013
    Publication date: October 29, 2015
    Applicant: ASML Nertherlands B.V
    Inventors: Willem Jan GROOTJANS, Henricus Johannes Lambertu MEGENS, Jouke KRIST, Miguel GARCIA GRANDA, Lu XU
  • Method of optimizing a model, a method of measuring a property, a device manufacturing method, a spectrometer and a lithographic apparatus
    Patent number: 8868387
    Abstract: A set of parameters used in a model of a spectrometer includes free parameters and fixed parameters. A first set of values for the parameters is set and the model is used to generate a first spectrum. A value of one of the fixed parameters is changed and a second spectrum is generated. An inverse of the model of the spectrometer is then applied to the second spectrum to generate a set of values for the parameters, the values being the same as the first set of values except for one or more of the free parameters. If the free parameter has significantly changed the fixed parameter is designated a free parameter.
    Type: Grant
    Filed: October 8, 2008
    Date of Patent: October 21, 2014
    Assignee: ASML Netherlands B.V.
    Inventors: Arie Jeffrey Den Boef, Hugo Augustinus Joseph Cramer, Jouke Krist, Willem Jan Grootjans
  • Method of Optimizing a Model, a Method of Measuring a Property, A Device Manufacturing Method, a Spectrometer and a Lithographic Apparatus
    Publication number: 20090094005
    Abstract: A set of parameters used in a model of a spectrometer includes free parameters and fixed parameters. A first set of values for the parameters is set and the model is used to generate a first spectrum. A value of one of the fixed parameters is changed and a second spectrum is generated. An inverse of the model of the spectrometer is then applied to the second spectrum to generate a set of values for the parameters, the values being the same as the first set of values except for one or more of the free parameters. If the free parameter has significantly changed the fixed parameter is designated a free parameter.
    Type: Application
    Filed: October 8, 2008
    Publication date: April 9, 2009
    Applicant: ASML Netherlands B. V.
    Inventors: Arie Jeffrey DEN BOEF, Hugo Augustinus Joseph Cramer, Jouke Krist, Willem Jan Grootjans