Abstract: The invention relates to a method of selective doping of a material by a) radiating a predetermined pre-treated pattern/region into the material, b) treating the material for producing reactive groups in the pre-treated pattern/region, and c) doping the material by the atomic layer deposition method for producing a pattern/region doped with a dopant in the material. The invention further relates to a selectively doped material, a system for preparing a selectively doped material, and use of said method.

Abstract: The invention relates to an optical add/drop device comprising at least two optical filter units (OADE). An individual filter unit comprises a first, second and third port so that when all signals of the aggregate signal are present at the first port (A), said desired signal is present at the second port (B) and all other signals except the desired signal are present at the third port (C). To provide flexible altering possibilities, a number of filter units (OADDE . . . OADE) are placed in succession to form at least two pairs of filter units in such a way that in each pair the first filter unit operates at a given wavelength as a signal dropping unit and the second as an adding unit corresponding to the first unit, adding to the aggregate signal a signal having the same wavelength.

Abstract: A calibration system for the calibration of mass flow controllers of an apparatus used for a chemical vapor phase growth, comprising at least one mass flow meter for measuring the characteristics of the mass flow controllers and a computer for calculating correction coefficients for the different controllers. The system preferably comprises at least one flow meter for measuring at least the adjoining ranges of the mass flow controllers covering adjacent flow ranges.