Patents by Inventor Jourg-Hinrich Fechner

Jourg-Hinrich Fechner has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Aluminum-free borosilicate glass and applications thereof
    Patent number: 7144835
    Abstract: The aluminum-free borosilicate glass has a composition in percent by weight based on oxide content of: SiO2, 65–77; B2O3, 7–20; Li2O, 0–2; Na2O, 0–4; K2O, 3–12; MgO, 0–2; CaO, 0–2; with MgO+CaO, 0–3; BaO, 0–3; ZnO, 0–2; ZrO2, 0.8–12; TiO2, 0–10; CeO2, 0–1; and F?, 0–0.6. This glass advantageously has a coefficient of thermal expansion ? (20° C.; 300° C.) of between 3.0×10?6/K and 6×10?6/K, good chemical resistance and a working point VA of between 990° C. and 1290° C.
    Type: Grant
    Filed: August 18, 2003
    Date of Patent: December 5, 2006
    Assignee: Schott AG
    Inventors: Christof Kass, Jourg-Hinrich Fechner
  • Aluminum-free borosilicate glass and applications thereof
    Publication number: 20040113237
    Abstract: The aluminum-free borosilicate glass has a composition in percent by weight based on oxide content of: SiO2, 65-77; B2O3, 7-20; Li2O, 0-2; Na2O, 0-4; K2O, 3-12; MgO, 0-2; CaO, 0-2; with MgO+CaO, 0-3; BaO, 0-3; ZnO, 0-2; ZrO2, 0.8-12; TiO2, 0-10; CeO2, 0-1; and F−, 0-0.6. This glass advantageously has a coefficient of thermal expansion &agr; (20° C.; 300° C.) of between 3.0×10−6/K and 6×10−6/K, good chemical resistance and a working point VA of between 990° C. and 1290° C.
    Type: Application
    Filed: August 18, 2003
    Publication date: June 17, 2004
    Inventors: Christof Kass, Jourg-Hinrich Fechner