Patents by Inventor Joya Satoshi

Joya Satoshi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Apparatus and method for substrate processing
    Patent number: 7467635
    Abstract: A substrate processing apparatus 10 includes a holding table 20 for rotatably holding a wafer W, a nozzle 40 for supplying chemical solutions L1 and L2 to the wafer W, at least one light irradiation units G1 and G2, and a pot 30 placed in the outer radius of the holding table 20for collecting the processing solutions L1 and L2 that are scattered from the wafer W. The pot 30 also includes a cover 70 that can be moved in the direction of the axis of the holding table 20so that a plurality of chemical solution collecting chambers M1 and M2 are formed in the pot by changing the position of the cover 70.
    Type: Grant
    Filed: May 11, 2004
    Date of Patent: December 23, 2008
    Assignee: Sprout Co., Ltd.
    Inventors: Joya Satoshi, Kazuyoshi Takeda, Tohru Watari
  • Apparatus and method for substrate processing
    Publication number: 20040226582
    Abstract: A substrate processing apparatus 10 includes a holding table 20 for rotatably holding a wafer W, a nozzle 40 for supplying chemical solutions L1 and L2 to the wafer W, at least one light irradiation units G1 and G2, and a pot 30 placed in the outer radius of the holding table 20 for collecting the processing solutions L1 and L2 that are scattered from the wafer W. The pot 30 also includes a cover 70 that can be moved in the direction of the axis of the holding table 20 so that a plurality of chemical solution collecting chambers M1 and M2 are formed in the pot by changing the position of the cover 70.
    Type: Application
    Filed: May 11, 2004
    Publication date: November 18, 2004
    Inventors: Joya Satoshi, Kazuyoshi Takeda, Tohru Watari