Patents by Inventor Jozef Benschop

Jozef Benschop has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Lithographic apparatus and device manufacturing method
    Publication number: 20070216882
    Abstract: An immersion lithographic projection apparatus is disclosed in which a shutter member is employed to block a liquid supply system during substrate swap to ensure that liquid remains in contact with anl element of the projection system during substrate swap. The shutter member is connected to a metrology frame which also supports the projection system. In this way the position of the shutter member is always known.
    Type: Application
    Filed: March 20, 2006
    Publication date: September 20, 2007
    Applicant: ASML Netherlands B.V.
    Inventors: Jozef Benschop, Hans Butler, Nicolaas Kemper, Bartholomeus Koek, Frits Van Der Meulen, Harmen Van Der Schoot
  • Lithographic apparatus, device manufacturing method, and device manufactured thereby
    Publication number: 20070132973
    Abstract: Apparatus and methods for compensating for the movement of a substrate in a lithographic apparatus during a pulse of radiation include providing an optical structure configured to move a patterned projection beam incident on the substrate in synchronism with the substrate.
    Type: Application
    Filed: December 21, 2006
    Publication date: June 14, 2007
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Arno Bleeker, Jozef Benschop
  • Lithographic apparatus and device manufacturing method
    Publication number: 20060285097
    Abstract: To improve the resolution of lithographic apparatus, a flexible member is provided between the projection system and the substrate. The flexible member may be filled with a fluid of a known refractive index. The flexible member may be in contact with both the projection system and the substrate.
    Type: Application
    Filed: August 1, 2006
    Publication date: December 21, 2006
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Johannes Hubertus Mulkens, Jozef Benschop
  • Dual stage lithographic apparatus and device manufacturing method
    Publication number: 20060227308
    Abstract: The invention relates to a dual stage lithographic apparatus, wherein to substrate stages are constructed and arranged for mutual cooperation in order to perform a joint scan movement for bringing the lithographic apparatus from a first situation, wherein immersion liquid is confined between a first substrate held by the first stage of the said stages and a final element of a projection system of the apparatus, towards a second situation, wherein the said liquid is confined between a second substrate held by the second stage of the two stages and the final element, such that during the joint scan movement the liquid is essentially confined within said space with respect to the final element.
    Type: Application
    Filed: May 24, 2005
    Publication date: October 12, 2006
    Applicant: ASML Netherlands B.V.
    Inventors: Marinus Brink, Jozef Benschop, Erik Loopstra
  • Lithographic apparatus, device manufacturing method, and device manufactured thereby
    Publication number: 20060061749
    Abstract: Apparatus and methods for compensating for the movement of a substrate in a lithographic apparatus during a pulse of radiation include providing an optical structure configured to move a patterned projection beam incident on the substrate in synchronism with the substrate.
    Type: Application
    Filed: November 15, 2005
    Publication date: March 23, 2006
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Arno Bleeker, Jozef Benschop
  • Lithographic apparatus and device manufacturing method
    Publication number: 20050030501
    Abstract: To improve the resolution of lithographic apparatus, a flexible member is provided between the projection system and the substrate. The flexible member may be filled with a fluid of a known refractive index. The flexible member may be in contact with both the projection system and the substrate.
    Type: Application
    Filed: June 15, 2004
    Publication date: February 10, 2005
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Johannes Mulkens, Jozef Benschop