Patents by Inventor Jozef Jansen
Jozef Jansen has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 12270644Abstract: A compact dual pass interferometer for a plane mirror interferometer configured to receive an input radiation beam from a light source. An optical component has a partially reflective surface arranged to reflect a first portion of the input radiation beam to follow a first optical path directed towards an output terminal and further arranged to transmit a second portion of the input radiation beam to follow a second optical path, directed towards a first location on a reflective target surface and back to the partially reflective surface, then to a second location on the reflective target surface and back to the partially reflective surface, whereupon the second optical path is directed through the partially reflective surface to be recombined with the first optical path to provide a recombined optical path configured to provide an output radiation beam. The output terminal configured to deliver the output radiation beam to a detector.Type: GrantFiled: July 20, 2021Date of Patent: April 8, 2025Assignee: ASML NETHERLANDS B.V.Inventor: Maarten Jozef Jansen
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Patent number: 12270647Abstract: The invention provides a method for calibration of an optical measurement system, which may be a heterodyne interferometer system, wherein a first optical axis and a second optical axis have a different optical path length, the method comprises: ?measuring a first measurement value along the first optical axis using a first measurement beam, ?measuring a second measurement value along the second optical axis using a second measurement beam, ?changing a wavelength of the first measurement beam and the second measurement beam, ?measuring a further first measurement value along the first optical axis using the first measurement beam with changed wavelength, measuring a further second measurement value along the second optical axis using the second measurement beam with changed wavelength, ?determining a cyclic error of the optical measurement system on the basis of the measured values, and ?storing a corrective value based on the cyclic error.Type: GrantFiled: March 22, 2021Date of Patent: April 8, 2025Assignee: ASML NETHERLANDS B.V.Inventors: Maarten Jozef Jansen, Ping Liu
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Publication number: 20240061351Abstract: An interferometer system includes an optics system configured to allow a first light beam to travel along a measurement path including a target, and a second light beam to travel along a fixed reference path excluding the target; and a signal generator configured to introduce a power-modulated optical signal in the measurement path or the reference path to determine jitter caused by components of the interferometer system downstream of the signal generator.Type: ApplicationFiled: December 12, 2021Publication date: February 22, 2024Applicant: ASML NETHERLANDS B.V.Inventor: Maarten Jozef JANSEN
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Publication number: 20240011762Abstract: A compact dual pass interferometer for a plane mirror interferometer configured to receive an input radiation beam from a light source. An optical component has a partially reflective surface arranged to reflect a first portion of the input radiation beam to follow a first optical path directed towards an output terminal and further arranged to transmit a second portion of the input radiation beam to follow a second optical path, directed towards a first location on a reflective target surface and back to the partially reflective surface, then to a second location on the reflective target surface and back to the partially reflective surface, whereupon the second optical path is directed through the partially reflective surface to be recombined with the first optical path to provide a recombined optical path configured to provide an output radiation beam. The output terminal configured to deliver the output radiation beam to a detector.Type: ApplicationFiled: July 20, 2021Publication date: January 11, 2024Applicant: ASML Netherlands B.V.Inventor: Maarten Jozef JANSEN
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Publication number: 20230408933Abstract: The invention provides a positioning system to determine an absolute position of a moveable target relative to a reference, comprising an interferometer system with a first light source to emit light at a fixed frequency and a second light source to emit light at at least two different frequencies. The positioning system is configured to determine, based on movement of the target, a phase difference curve associated with a first frequency of the second light source and a phase difference curve associated with a second frequency of the second light source as a function of a phase difference associated with the fixed frequency of the first light source and to determine a cross-point to determine the absolute position of the moveable target. The invention also relates to a lithographic apparatus and corresponding method.Type: ApplicationFiled: October 25, 2021Publication date: December 21, 2023Applicant: ASML Netherlands B.V.Inventor: Maarten Jozef JANSEN
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Publication number: 20230332880Abstract: Interferometer system including a first detector for receiving a first measurement beam travelling to a reference surface; a second detector for receiving a second measurement beam travelling to the target surface; a reference variable delay path and/or measurement variable delay path and a delay path controller for adapting a delay length. A reference spectral coherence pulse occurs at the first detector, at a reference coherence arrangement and a measurement spectral coherence pulse at the second detector at a measurement coherence arrangement.Type: ApplicationFiled: August 20, 2021Publication date: October 19, 2023Applicant: ASML NETHERLANDS B.V.Inventor: Maarten Jozef JANSEN
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Publication number: 20230324164Abstract: An interferometer system including: an optical system arranged to split a radiation beam from a laser source into a first beam along a first optical path and a second beam along a second optical path, and recombine the first beam and the second beam to a recombined beam, a detector to receive the recombined beam and to provide a detector signal based on the received recombined beam, and a processing unit, wherein a first optical path length of the first optical path and a second optical path length of the second optical path have an optical path length difference, and wherein the processing unit is arranged to determine a mode hop of the laser source on the basis of a phase shift in the detector signal.Type: ApplicationFiled: May 30, 2023Publication date: October 12, 2023Applicant: ASML NETHERLANDS B.V.Inventors: Maarten Jozef JANSEN, Manoj Kumar MRIDHA, Engelbertus Antonius Fransiscus VAN DER PASCH
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Patent number: 11719529Abstract: An interferometer system including: an optical system arranged to split a radiation beam from a laser source into a first beam along a first optical path and a second beam along a second optical path, and recombine the first beam and the second beam to a recombined beam, a detector to receive the recombined beam and to provide a detector signal based on the received recombined beam, and a processing unit, wherein a first optical path length of the first optical path and a second optical path length of the second optical path have an optical path length difference, and wherein the processing unit is arranged to determine a mode hop of the laser source on the basis of a phase shift in the detector signal.Type: GrantFiled: May 11, 2020Date of Patent: August 8, 2023Assignee: ASML NETHERLANDS B.V.Inventors: Maarten Jozef Jansen, Manoj Kumar Mridha, Engelbertus Antonius Fransiscus Van der Pasch
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Publication number: 20230168077Abstract: The invention provides a method for calibration of an optical measurement system, which may be a heterodyne interferometer system, wherein a first optical axis and a second optical axis have a different optical path length, the method comprises: ?measuring a first measurement value along the first optical axis using a first measurement beam, ?measuring a second measurement value along the second optical axis using a second measurement beam, ?changing a wavelength of the first measurement beam and the second measurement beam, ?measuring a further first measurement value along the first optical axis using the first measurement beam with changed wavelength, measuring a further second measurement value along the second optical axis using the second measurement beam with changed wavelength, ?determining a cyclic error of the optical measurement system on the basis of the measured values, and ?storing a corrective value based on the cyclic error.Type: ApplicationFiled: March 22, 2021Publication date: June 1, 2023Applicant: ASML Netherlands B.V.Inventors: Maarten Jozef JANSEN, Ping LIU
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Patent number: 11556066Abstract: The invention provides a stage system comprising a stage (ST) which is movable in respect of a reference structure. One of the stage and the reference structure comprises a reflective surface (REFS). An optical position sensor (IF1) is arranged at the other one of the stage and the reference structure and is configured to determine a position of the reflective surface relative to the optical position sensor. An optical shape sensor (IF2) is configured to determine a shape of the reflective surface. The stage system further comprises a position measurement controller configured to derive a stage position of the stage from the position of the reflective surface relative to the optical position sensor and from the shape of the reflective surface as determined by the optical shape sensor.Type: GrantFiled: January 30, 2020Date of Patent: January 17, 2023Assignee: ASML Netherlands B.V.Inventors: Maarten Jozef Jansen, Frank Auer
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Patent number: 11525737Abstract: The invention provides a wavelength tracking system comprising a wavelength tracking unit and an interferometer system. The wavelength tracking unit has reflection surfaces at stabile positions providing a first reflection path with a first path length and a second reflection path with a second path length. The first path length is substantially larger than the second path length.Type: GrantFiled: January 15, 2019Date of Patent: December 13, 2022Assignee: ASML Netherland B.V.Inventor: Maarten Jozef Jansen
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Publication number: 20220205775Abstract: An interferometer system including: an optical system arranged to split a radiation beam from a laser source into a first beam along a first optical path and a second beam along a second optical path, and recombine the first beam and the second beam to a recombined beam, a detector to receive the recombined beam and to provide a detector signal based on the received recombined beam, and a processing unit, wherein a first optical path length of the first optical path and a second optical path length of the second optical path have an optical path length difference, and wherein the processing unit is arranged to determine a mode hop of the laser source on the basis of a phase shift in the detector signal.Type: ApplicationFiled: May 11, 2020Publication date: June 30, 2022Applicant: ASML NETHERLANDS B.V.Inventors: Maarten Jozef JANSEN, Manoj Kumar MRIDHA, Engelbertus Antonius Fransiscus VAN DER PASCH
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Publication number: 20220137517Abstract: The invention provides a stage system comprising a stage (ST) which is movable in respect of a reference structure. One of the stage and the reference structure comprises a reflective surface (REFS). An optical position sensor (IF1) is arranged at the other one of the stage and the reference structure and is configured to determine a position of the reflective surface relative to the optical position sensor. An optical shape sensor (IF2) is configured to determine a shape of the reflective surface. The stage system further comprises a position measurement controller configured to derive a stage position of the stage from the position of the reflective surface relative to the optical position sensor and from the shape of the reflective surface as determined by the optical shape sensor.Type: ApplicationFiled: January 30, 2020Publication date: May 5, 2022Applicant: ASML Netherlands B.V.Inventors: Maarten Jozef JANSEN, Frank AUER
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Patent number: 11287242Abstract: An interferometer system, including a heterodyne interferometer and a processing system. The heterodyne interferometer is arranged to provide a reference signal and a measurement signal. The reference signal has a reference phase. The measurement signal has a measurement phase and an amplitude. The processing system is arranged to determine a cyclic error of the heterodyne interferometer based on the reference phase, the measurement phase and the amplitude.Type: GrantFiled: June 29, 2017Date of Patent: March 29, 2022Assignee: ASML Netherlands B.V.Inventors: Maarten Jozef Jansen, Engelbertus Antonius Fransiscus Van Der Pasch, Suzanne Johanna Antonetta Geertruda Cosijns
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Publication number: 20210072088Abstract: The invention provides a wavelength tracking system comprising a wavelength tracking unit and an interferometer system. The wavelength tracking unit has reflection surfaces at stabile positions providing a first reflection path with a first path length and a second reflection path with a second path length. The first path length is substantially larger than the second path length.Type: ApplicationFiled: January 15, 2019Publication date: March 11, 2021Applicant: ASML Netherlands B.V.Inventors: Engelbertus Antonius Fransiscus VAN DER PASCH, Maarten Jozef JANSEN, Suzanne Johanna Antonetta Geertruda COSIJNS, Koen Govert Olivier VAN DE MEERAKKER, Ivo WIDDERSHOVEN
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Patent number: 10883816Abstract: A position measurement system configured to measure a position of an object, the system including: a displacement interferometer having a first capture range; a time-of-flight sensor having a second capture range that is larger than the first capture range and having an inaccuracy that is smaller than the first capture range; and a processing unit, wherein the position measurement system has a zeroing mode in which the processing unit is configured to determine a coarse position of the object within the second capture range based on an output from the time-of-flight sensor, and in which the processing unit is configured to determine a fine position of the object based on the determined coarse position and an output from the displacement interferometer.Type: GrantFiled: February 6, 2018Date of Patent: January 5, 2021Assignee: ASML Netherlands B.V.Inventor: Maarten Jozef Jansen
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Publication number: 20200191552Abstract: A position measurement system configured to measure a position of an object, the system including: a displacement interferometer having a first capture range; a time-of-flight sensor having a second capture range that is larger than the first capture range and having an inaccuracy that is smaller than the first capture range; and a processing unit, wherein the position measurement system has a zeroing mode in which the processing unit is configured to determine a coarse position of the object within the second capture range based on an output from the time-of-flight sensor, and in which the processing unit is configured to determine a fine position of the object based on the determined coarse position and an output from the displacement interferometer.Type: ApplicationFiled: February 6, 2018Publication date: June 18, 2020Applicant: ASML Netherlands B.V.Inventor: Maarten Jozef JANSEN
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Publication number: 20190265019Abstract: An interferometer system, including a heterodyne interferometer and a processing system. The heterodyne interferometer is arranged to provide a reference signal and a measurement signal. The reference signal has a reference phase. The measurement signal has a measurement phase and an amplitude. The processing system is arranged to determine a cyclic error of the heterodyne interferometer based on the reference phase, the measurement phase and the amplitude.Type: ApplicationFiled: June 29, 2017Publication date: August 29, 2019Applicant: ASML NETHERLANDS B.V.Inventors: Maarten Jozef JANSEN, Engelbertus Antonius Fransiscus VAN DER PASCH, Suzanne Johanna Antonetta Geertruda COSIJNS
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Patent number: 8937707Abstract: An interferometric displacement measuring system operable to measure displacements of a movable object of the lithographic apparatus in a first direction using a measurement beam of radiation and a reflector. The reflector being substantially planar and substantially perpendicular to the first direction. Calibration is obtained using a first set of measurements of the angular position movable object. A phase offset in the measurement beam is affected. A second set of measurements of the angular position of the movable object is obtained. The interferometric displacement measuring system is calibrated based on the first and second sets of measurements.Type: GrantFiled: July 17, 2012Date of Patent: January 20, 2015Assignee: ASML Netherlands B.V.Inventors: Maarten Jozef Jansen, Andre Schreuder
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Patent number: 8576410Abstract: The invention relates to a method and an apparatus for determining a height of a number of spatial positions on a sample, defining a height map of a surface of said sample. The method can involve irradiating the surface of the sample with light including a spatial periodic pattern in a direction perpendicular to an optical axis and moving parallel to the pattern, scanning the surface in the direction of the optical axis for each position of the surface and detecting the light reflected by the sample by a detector during the scanning. In any scanning position, only a single image is taken, and the scanning speed has a predetermined relation to the phase of the periodic pattern. Analyzing an output signal of the detector can involve, for each spatial position of the detector, determining of an amplitude of the signal detected during the scanning and determining a scanning location where the amplitude is maximal.Type: GrantFiled: November 18, 2010Date of Patent: November 5, 2013Assignee: Mitutoyo CorporationInventors: Maarten Jozef Jansen, Frans de Nooij