Abstract: The invention relates to novel pyrazole derivatives with an ergoline skeleton of the general formula I, ##STR1## wherein x . . . y stands for a ##STR2## R is a hydrogen atom or methyl group, R.sub.1 stands for a hydrogen atom, C.sub.1-4 alkyl, carbethoxy or pyridyl-group,R.sub.2 stands for a hydrogen atom, C.sub.1-4 alkyl, allyl, C.sub.2-4 oxoalkyl-, C.sub.2-4 hydroxyalkyl or C.sub.2-4 hydroxyiminoalkyl group,R.sub.3 stands for a hydrogen atom, C.sub.1-4 alkyl, hydroxy or pyridyl group, furthermoreR.sub.2 and R.sub.3 may stand together for a group of general formula (II), ##STR3## wherein Z stands for a methylene, carbonyl, hydroxymethylene or hydroxyiminomethylene group,R.sub.4 stands for a hydrogen atom or one or two C.sub.1-4 alkyl group(s), andn is 1 or 2,and pharmaceutically acceptable salts thereof.Furthermore the invention relates to a process for the preparation of these compounds.The novel compounds are potent PGF.sub.2.alpha. receptor antagonists.

Abstract: The invention relates to new ergol-8-ene and ergoline derivatives of the general formula /I/ ##STR1## wherein x y stands for --CH.dbd.C.dbd. or --CH.sub.2 --CH.dbd. group,R stands for hydrogen atom or methyl group,R.sub.1 stands for hydrogen or halogen atom,R.sub.2 stands for lower alkylsulfonyloxy group, phenylsulfonyloxy group optionally substituted with a lower alkyl group, or azido group,R.sub.3 stands for lower alkylsulfonyloxy group or phenylsulfonyloxy group optionally substituted with a lower alkyl group, and acid addition salts thereof. These compounds can be prepared from compounds of the general formula II ##STR2## wherein x y and R are as defined above, by reacting at least two equivalents of a lower alkylsulfonic acid chloride or phenylsulfonic acid chloride substituted with lower alkyl group.

Abstract: 2-phenoxy-, 2-phenylthio-, and 2-phenylamino-alkyl-2-oxazolines suitable for pharmaceutical use as hypolipemic and hypocholestric agents are disclosed.

Abstract: This invention relates to compounds of the formula ##SPC1##WhereinR.sup.1 is hydrogen or an alkyl group having 1-4 carbon atoms;R.sup.2 but R.sup.3 are hydrogen and if both R.sup.4 and R.sup.5 are hydrogen, R.sup.2 and R.sup.3 are alkyl groups having 1-4 carbon atoms or hydroxymethyl groups;R.sup.4 and R.sup.5 are hydrogen but where both R.sup.2 and R.sup.3 are hydrogen, R.sup.4 but R.sup.5 stand for alkyl groups having 1-4 carbon atoms, are amino groups, which may be mono or di-substituted by alkyl groups having 1-4 carbon atoms, or are allyloxymethyl groups;X is an oxygen or sulphur atom or an NH group;Y stands for a halogen atom or a halogeno-substituted phenyl group. The disclosure also concerns a process for the preparation of such compounds.