Patents by Inventor Jr., Raymond W. Ryan

Jr., Raymond W. Ryan has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Radiation-sensitive composition containing a poly (N-acyl-alkyleneimine) and use thereof in lithographic printing plates
    Patent number: 5043250
    Abstract: Radiation-sensitive compositions which are especially useful in the production of negative-working lithographic printing plates comprise a photocrosslinkable polymer containing the photosensitive group ##STR1## as an integral part of the polymer backbone and, in an amount sufficient to improve the properties of the composition, a poly(N-acyl-alkleneimine). The poly(N-acyl-alkyleneimine) improves the properties of the radiation-sensitive composition in regard to such factors as shelf life, image contrast, developability and reduction in mottle and thereby provides a superior lithographic printing plate.
    Type: Grant
    Filed: July 17, 1990
    Date of Patent: August 27, 1991
    Assignee: Eastman Kodak Company
    Inventors: Paul R. West, James E. Mitchell, Gary R. Miller, Paul R. Josephson, Jr., Jr., Raymond W. Ryan