Abstract: The disclosure provides a wafer searching method and device. The method includes: obtaining a target wafer and a reference wafer; determining a first specific area in the target wafer, and obtaining a first significant distribution feature of the first specific area; determining a second specific area in the reference wafer, and obtaining a second significant distribution feature of the second specific area; in response to determining that the first significant distribution feature corresponds to the second significant distribution feature, estimating a fail pattern similarity between the first specific area and the second specific area; in response to determining that the fail pattern similarity is greater than a threshold, providing the reference wafer as a search result corresponding to the target wafer.

Abstract: The disclosure provides a wafer searching method and device. The method includes: obtaining a target wafer and a reference wafer; determining a first specific area in the target wafer, and obtaining a first significant distribution feature of the first specific area; determining a second specific area in the reference wafer, and obtaining a second significant distribution feature of the second specific area; in response to determining that the first significant distribution feature corresponds to the second significant distribution feature, estimating a fail pattern similarity between the first specific area and the second specific area; in response to determining that the fail pattern similarity is greater than a threshold, providing the reference wafer as a search result corresponding to the target wafer.