Patents by Inventor Ju-Chul Park

Ju-Chul Park has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240121924
    Abstract: A water-cooled heat dissipation module assembly capable of cooling a power module of a vehicle driving inverter system using a battery or fuel cell. The water-cooled heat dissipation module assembly includes a housing unit provided in the form of a housing having an opening portion at least partially opened at one side thereof. The housing unit and at least a part of a rim region of the cooling unit are made of a plastic material, and the housing unit and the cooling unit are joined to each other by plastic welding using a laser.
    Type: Application
    Filed: August 4, 2022
    Publication date: April 11, 2024
    Inventors: Kwan Ho RYU, Jeong Keun LEE, Min Woo LEE, Ju Hyun SUN, Tae Keun PARK, Kang Wook PARK, Lee Cheol JI, Hyeok Chul YANG, Tae Heon KIM, Keun Jae LEE
  • Patent number: 8319291
    Abstract: Provided is a non-volatile memory device including at least one horizontal electrode, at least one vertical electrode, at least one data storage layer and at least one reaction prevention layer. The least one vertical electrode crosses the at least one horizontal electrode. The at least one data storage layer is located in regions in which the at least one vertical electrode crosses the at least one horizontal electrode, and stores data by varying its electrical resistance. The at least one reaction prevention layer is located in the regions in which the at least one vertical electrode crosses the at least one horizontal electrode.
    Type: Grant
    Filed: September 11, 2009
    Date of Patent: November 27, 2012
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Deok-kee Kim, June-mo Koo, Ju-chul Park, Kyoung-won Na, Dong-seok Suh, Bum-seok Seo, Yoon-dong Park
  • Patent number: 7943918
    Abstract: A phase-changeable memory device includes a phase-changeable material pattern and first and second electrodes electrically connected to the phase-changeable material pattern. The first and second electrodes are configured to provide an electrical signal to the phase-changeable material pattern. The phase-changeable material pattern includes a first phase-changeable material layer and a second phase-changeable material layer. The first and second phase-changeable material patterns have different chemical, physical, and/or electrical characteristics. For example, the second phase-changeable material layer may have a greater resistivity than the first phase-changeable material layer. For instance, the first phase-changeable material layer may include nitrogen at a first concentration, and the second phase-changeable material layer may include nitrogen at a second concentration that is greater than the first concentration. Related devices and fabrication methods are also discussed.
    Type: Grant
    Filed: September 28, 2009
    Date of Patent: May 17, 2011
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Jeong-Hee Park, Ju-Chul Park, Jun-Soo Bae, Bong-Jin Kuh, Yong-Ho Ha
  • Publication number: 20100117054
    Abstract: Provided is a non-volatile memory device including at least one horizontal electrode, at least one vertical electrode, at least one data storage layer and at least one reaction prevention layer. The least one vertical electrode crosses the at least one horizontal electrode. The at least one data storage layer is located in regions in which the at least one vertical electrode crosses the at least one horizontal electrode, and stores data by varying its electrical resistance. The at least one reaction prevention layer is located in the regions in which the at least one vertical electrode crosses the at least one horizontal electrode.
    Type: Application
    Filed: September 11, 2009
    Publication date: May 13, 2010
    Applicant: SAMSUNG ELECTRONICS CO., LTD.
    Inventors: Deok-kee Kim, June-mo Koo, Ju-chul Park, Kyoung-won Na, Dong-seok Suh, Bum-seok Seo, Yoon-dong Park
  • Patent number: 7663236
    Abstract: Disclosed herein is a semiconductor electrode with improved power conversion efficiency through inhibition of recombination reactions of electrons. The semiconductor electrode comprises a transparent electrode consisting of a substrate and a conductive material coated on the substrate, and a metal oxide layer formed on the transparent electrode wherein the metal oxide layer contains a phosphate. Further disclosed is a solar cell employing the semiconductor electrode.
    Type: Grant
    Filed: October 6, 2006
    Date of Patent: February 16, 2010
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Eun Sung Lee, Young Jun Park, Sang Cheol Park, Jung Gyu Nam, Ju Chul Park
  • Publication number: 20100019216
    Abstract: A phase-changeable memory device includes a phase-changeable material pattern and first and second electrodes electrically connected to the phase-changeable material pattern. The first and second electrodes are configured to provide an electrical signal to the phase-changeable material pattern. The phase-changeable material pattern includes a first phase-changeable material layer and a second phase-changeable material layer. The first and second phase-changeable material patterns have different chemical, physical, and/or electrical characteristics. For example, the second phase-changeable material layer may have a greater resistivity than the first phase-changeable material layer. For instance, the first phase-changeable material layer may include nitrogen at a first concentration, and the second phase-changeable material layer may include nitrogen at a second concentration that is greater than the first concentration. Related devices and fabrication methods are also discussed.
    Type: Application
    Filed: September 28, 2009
    Publication date: January 28, 2010
    Inventors: Jeong-Hee Park, Ju-Chul Park, Jun-Soo Bae, Bong-Jin Kuh, Yong-Ho Ha
  • Patent number: 7615401
    Abstract: A phase-changeable memory device includes a phase-changeable material pattern and first and second electrodes electrically connected to the phase-changeable material pattern. The first and second electrodes are configured to provide an electrical signal to the phase-changeable material pattern. The phase-changeable material pattern includes a first phase-changeable material layer and a second phase-changeable material layer. The first and second phase-changeable material patterns have different chemical, physical, and/or electrical characteristics. For example, the second phase-changeable material layer may have a greater resistivity than the first phase-changeable material layer. For instance, the first phase-changeable material layer may include nitrogen at a first concentration, and the second phase-changeable material layer may include nitrogen at a second concentration that is greater than the first concentration. Related devices and fabrication methods are also discussed.
    Type: Grant
    Filed: August 11, 2008
    Date of Patent: November 10, 2009
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Jeong-Hee Park, Ju-Chul Park, Jun-Soo Bae, Bong-Jin Kuh, Yong-Ho Ha
  • Publication number: 20090004773
    Abstract: A phase-changeable memory device includes a phase-changeable material pattern and first and second electrodes electrically connected to the phase-changeable material pattern. The first and second electrodes are configured to provide an electrical signal to the phase-changeable material pattern. The phase-changeable material pattern includes a first phase-changeable material layer and a second phase-changeable material layer. The first and second phase-changeable material patterns have different chemical, physical, and/or electrical characteristics. For example, the second phase-changeable material layer may have a greater resistivity than the first phase-changeable material layer. For instance, the first phase-changeable material layer may include nitrogen at a first concentration, and the second phase-changeable material layer may include nitrogen at a second concentration that is greater than the first concentration. Related devices and fabrication methods are also discussed.
    Type: Application
    Filed: August 11, 2008
    Publication date: January 1, 2009
    Inventors: Jeong-Hee Park, Ju-Chul Park, Jun-Soo Bae, Bong-Jin Kuh, Yong-Ho Ha
  • Patent number: 7453111
    Abstract: Disclosed is a phase-change memory device including a phase-change material pattern, a diffusion barrier layer, a bottom electrode and a top electrode. The phase-change material pattern is placed on the bottom electrode, and the diffusion barrier layer containing tellurium is placed on the phase-change material pattern. The top electrode containing titanium is placed on the diffusion barrier layer. The diffusion barrier layer acts to inhibit diffusion of titanium from the top electrode into the phase-change material pattern.
    Type: Grant
    Filed: May 29, 2007
    Date of Patent: November 18, 2008
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Kyung-Chang Ryoo, Ju-Chul Park, Se-Ahn Song, Yoon-Jong Song
  • Patent number: 7425735
    Abstract: A phase-changeable memory device includes a phase-changeable material pattern and first and second electrodes electrically connected to the phase-changeable material pattern. The first and second electrodes are configured to provide an electrical signal to the phase-changeable material pattern. The phase-changeable material pattern includes a first phase-changeable material layer and a second phase-changeable material layer. The first and second phase-changeable material patterns have different chemical, physical, and/or electrical characteristics. For example, the second phase-changeable material layer may have a greater resistivity than the first phase-changeable material layer. For instance, the first phase-changeable material layer may include nitrogen at a first concentration, and the second phase-changeable material layer may include nitrogen at a second concentration that is greater than the first concentration. Related devices and fabrication methods are also discussed.
    Type: Grant
    Filed: January 26, 2007
    Date of Patent: September 16, 2008
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Jeong-Hee Park, Ju-Chul Park, Jun-Soo Bae, Bong-Jin Kuh, Yong-Ho Ha
  • Publication number: 20080145702
    Abstract: A phase change material layer is a single layer including an upper layer portion and a lower layer portion. Crystal lattices of the upper layer portion and the lower layer portion are different. The phase change material layer is formed by forming a doped lower layer by supplying a first source with a doping gas to a substrate. The supply of the doping gas is stopped and an undoped upper layer is formed by supplying a second source onto the lower layer. The upper layer and the lower layer are formed such that crystal lattices of the upper and lower layers are different.
    Type: Application
    Filed: December 12, 2007
    Publication date: June 19, 2008
    Inventors: Woong-chul Shin, Ju-chul Park
  • Publication number: 20080081357
    Abstract: Provided herein are a method and an apparatus for isolating nucleic acids from cells. The method comprises introducing carbon nanotubes (CNTs) and silica beads into a solution containing the cells, irradiating the solution with a laser beam disrupt the cells releasing the nucleic acids from the disrupted cells, thereby binding the nucleic acids to the silica beads, and adding a nucleic acid eluting solution to the silica beads to which the nucleic acids are bound, to elute the nucleic acids from the silica beads.
    Type: Application
    Filed: April 11, 2007
    Publication date: April 3, 2008
    Applicant: SAMSUNG ELECTRONICS CO., LTD.
    Inventors: Young-nam KWON, Jeong-gun LEE, Jeong-hee LEE, Ju-chul PARK, Chang-eun YOO
  • Publication number: 20070284622
    Abstract: Disclosed is a phase-change memory device including a phase-change material pattern, a diffusion barrier layer, a bottom electrode and a top electrode. The phase-change material pattern is placed on the bottom electrode, and the diffusion barrier layer containing tellurium is placed on the phase-change material pattern. The top electrode containing titanium is placed on the diffusion barrier layer. The diffusion barrier layer acts to inhibit diffusion of titanium from the top electrode into the phase-change material pattern.
    Type: Application
    Filed: May 29, 2007
    Publication date: December 13, 2007
    Applicant: SAMSUNG ELECTRONICS CO., LTD.
    Inventors: Kyung-Chang Ryoo, Ju-Chul Park, Se-Ahn Song, Yoon-Jong SONG
  • Publication number: 20070269923
    Abstract: Disclosed herein is a semiconductor electrode with improved power conversion efficiency through inhibition of recombination reactions of electrons. The semiconductor electrode comprises a transparent electrode consisting of a substrate and a conductive material coated on the substrate, and a metal oxide layer formed on the transparent electrode wherein the metal oxide layer contains a phosphate. Further disclosed is a solar cell employing the semiconductor electrode.
    Type: Application
    Filed: October 6, 2006
    Publication date: November 22, 2007
    Applicant: SAMSUNG ELECTRONICS CO., LTD.
    Inventors: Eun Sung LEE, Young Jun PARK, Sang Cheol PARK, Jung Gyu NAM, Ju Chul PARK
  • Publication number: 20070215853
    Abstract: A phase-changeable memory device includes a phase-changeable material pattern and first and second electrodes electrically connected to the phase-changeable material pattern. The first and second electrodes are configured to provide an electrical signal to the phase-changeable material pattern. The phase-changeable material pattern includes a first phase-changeable material layer and a second phase-changeable material layer. The first and second phase-changeable material patterns have different chemical, physical, and/or electrical characteristics. For example, the second phase-changeable material layer may have a greater resistivity than the first phase-changeable material layer. For instance, the first phase-changeable material layer may include nitrogen at a first concentration, and the second phase-changeable material layer may include nitrogen at a second concentration that is greater than the first concentration. Related devices and fabrication methods are also discussed.
    Type: Application
    Filed: January 26, 2007
    Publication date: September 20, 2007
    Inventors: Jeong-Hee Park, Ju-Chul Park, Jun-Soo Bae, Bong-Jin Kuh, Yong-Ho Ha
  • Publication number: 20060093841
    Abstract: A method of forming a ferroelectric thin film for suppressing the formation of a-domain and providing a sufficient layer coverage may be provided. The method includes immersing a substrate having the miscut surface into a reaction solution including a precursor compound for perovskite-type ferroelectric and water, and implementing a hydrothermal reaction in the reaction solution at a temperature lower than the phase transition temperature of the perovskite-type ferroelectric, thereby forming a perovskite-type ferroelectric thin film on the miscut surface of the substrate.
    Type: Application
    Filed: July 7, 2005
    Publication date: May 4, 2006
    Applicant: Samsung Electronics Co., Ltd.
    Inventors: Ju-chul Park, Si-kyung Choi, Won-woong Jung