Abstract: The pellicle has a pellicle portion that allows transmission of EUV exposure light. The pellicle portion comprises a heat radiation layer for radiating heat generated by irradiation of EUV exposure light. The heat radiation layer comprises metal and silicon, and the metal content of the heat radiation layer is greater than the silicon content. This ensures a high transmittance of 90% or more, while improving the heat radiation performance of the pellicle portion, so that it can be applied to EUV exposure light powers of 600 W or more.

Abstract: A method for providing an auditory program according to an embodiment of the present disclosure may include: decoding, by a processor, first audiovisual data including a target sound to be aurally perceived by a user and an ambient sound reflecting a real-life environment, and playing back the first audiovisual data through a display and a speaker; receiving, by the processor, the user's input based on the result of aural perception of the target sound from the user through a user interface; and changing, by the processor, at least one of parameters of the audiovisual data, based on the user's input, and playing back the audiovisual data through the speaker or the display, or determining a fitting parameter of an assistive listening device, based on the user's input.

Abstract: A pellicle for extreme ultraviolet lithography includes a pellicle part configured to include a center layer and a reinforcing layer. The center layer essentially contains silicon (Si), and additionally contains at least one material of zirconium (Zr), zinc (Zn), ruthenium (Ru), and molybdenum (Mo). The reinforcing layer is made of a material containing at least one of silicon (Si), boron (B), zirconium (Zr), nitrogen (N), carbon (C), and oxygen (O). A thickness of the pellicle is minimized, and as a result, the pellicle has excellent mechanical, thermal, and chemical properties while maintaining high transmittance to EUV exposure light.

Abstract: Disclosed is a pellicle for extreme ultraviolet (EUV) lithography. The pellicle may include: a support layer pattern which is formed by etching a support layer; a pellicle layer which is formed on the support layer pattern; and an etching stop layer pattern which is formed between the support layer pattern and the pellicle layer and formed by etching an etching stop layer of stopping etching when the support layer is etched. Thus, there is provided a pellicle for EUV photomask, which maintains high transmittance with the minimum thickness for EUV exposure light, and is excellent in mechanical strength and thermal characteristics.

Abstract: Disclosed are a pellicle for an extreme ultraviolet (EUV) lithography, which is excellent in transmittance of EUV exposure light and mechanical strength, and a method of fabricating the same. The pellicle includes a support layer pattern; a buried oxide layer pattern formed on the support layer pattern; and a pellicle layer provided being supported by the buried oxide layer pattern. The pellicle may further include a reinforcement layer for reinforcing the mechanical strength of the pellicle layer, an auxiliary layer for additionally supplementing the mechanical strength of the reinforcement layer, and a heat dissipation layer for dissipating heat of the pellicle layer.

Abstract: Disclosed is a pellicle for extreme ultraviolet (EUV) lithography. The pellicle may include: a support layer pattern which is formed by etching a support layer; a pellicle layer which is formed on the support layer pattern; and an etching stop layer pattern which is formed between the support layer pattern and the pellicle layer and formed by etching an etching stop layer of stopping etching when the support layer is etched. Thus, there is provided a pellicle for EUV photomask, which maintains high transmittance with the minimum thickness for EUV exposure light, and is excellent in mechanical strength and thermal characteristics.

Abstract: Disclosed are a pellicle for an extreme ultraviolet (EUV) lithography, which is excellent in transmittance of EUV exposure light and mechanical strength, and a method of fabricating the same. The pellicle includes a support layer pattern; a buried oxide layer pattern formed on the support layer pattern; and a pellicle layer provided being supported by the buried oxide layer pattern. The pellicle may further include a reinforcement layer for reinforcing the mechanical strength of the pellicle layer, an auxiliary layer for additionally supplementing the mechanical strength of the reinforcement layer, and a heat dissipation layer for dissipating heat of the pellicle layer.

Abstract: A polymer linear actuator for a micro electro mechanical system (MEMS) and a micro manipulator for a measurement device of cranial nerve signal using the same are provided. The polymer linear actuator has first and second bodies positioned spaced apart to a distance from each other, and one or more pairs of V-type moving units connecting the first and second bodies together, wherein the moving units in pair are opposed to each other to convert a rotation motion of the respective moving units into a linear motion, thereby causing the first and second bodies to move linearly.

Abstract: A polymer linear actuator for a micro electro mechanical system (MEMS) and a micro manipulator for a measurement device of cranial nerve signal using the same are provided. The polymer linear actuator has first and second bodies positioned spaced apart to a distance from each other, and one or more pairs of V-type moving units connecting the first and second bodies together, wherein the moving units in pair are opposed to each other to convert a rotation motion of the respective moving units into a linear motion, thereby causing the first and second bodies to move linearly.

Abstract: A polymer linear actuator for a micro electro mechanical system (MEMS) and a micro manipulator for a measurement device of cranial nerve signal using the same are provided. The polymer linear actuator has first and second bodies positioned spaced apart to a distance from each other, and one or more pairs of V-type moving units connecting the first and second bodies together, wherein the moving units in pair are opposed to each other to convert a rotation motion of the respective moving units into a linear motion, thereby causing the first and second bodies to move linearly.

Abstract: A polymer linear actuator for a micro electro mechanical system (MEMS) and a micro manipulator for a measurement device of cranial nerve signal using the same are provided. The polymer linear actuator has first and second bodies positioned spaced apart to a distance from each other, and one or more pairs of V-type moving units connecting the first and second bodies together, wherein the moving units in pair are opposed to each other to convert a rotation motion of the respective moving units into a linear motion, thereby causing the first and second bodies to move linearly.