Abstract: A packaging device including bumps and a method of manufacturing the packaging device are presented. In the method of manufacturing a packaging device, a dielectric layer that covers a packaging base is formed and a lower layer is formed over a packaging base including first and second connecting pads. A plurality of dummy bumps that overlaps with the dielectric layer is formed. A sealing pattern that covers the dummy bumps, filling areas between the dummy bumps, is formed. A lower layer pattern in which the plurality of dummy bumps have been disposed is formed by removing portions of the lower layer that are exposed and do not overlap with the sealing pattern.

Abstract: A packaging device including bumps and a method of manufacturing the packaging device are presented. In the method of manufacturing a packaging device, a dielectric layer that covers a packaging base is formed and a lower layer is formed over a packaging base including first and second connecting pads. A plurality of dummy bumps that overlaps with the dielectric layer is formed. A sealing pattern that covers the dummy bumps, filling areas between the dummy bumps, is formed. A lower layer pattern in which the plurality of dummy bumps have been disposed is formed by removing portions of the lower layer that are exposed and do not overlap with the sealing pattern.

Abstract: A semiconductor device includes a chip body having a chip region and a residual scribe lane that surrounds the chip region; a passivation layer disposed on the chip region of the chip body; a first dielectric layer disposed on the passivation layer and the residual scribe lane of the chip body; a redistribution line disposed on the chip region of the first dielectric layer and including a wire bonding pad section; and a second dielectric layer disposed on the first dielectric layer and the redistribution line and having a first opening through which the wire bonding pad section is exposed.

Abstract: A semiconductor die includes interlayer insulating layer, a signal horizontal metal interconnection and a power horizontal metal interconnection, a front-side passivation layer, a signal front-side bump structure and a power front-side bump structure, a signal vertical via plug, and a power vertical via plug over a front-side of a substrate; and a back-side insulating layer, a back-side metal plate layer, a back-side passivation layer, a signal back-side bump structure and a power back-side bump structure, a signal through-electrode, and a power through-electrode over a back-side of the substrate. Upper ends of the signal through-electrode and the power through-electrode protrude from the back-side surface of the substrate. The back-side metal plate layer is not to be electrically connected to the signal through-electrode. The back-side metal plate layer is electrically connected to the power bump structure.

Abstract: A packaging device including bumps and a method of manufacturing the packaging device are presented. In the method of manufacturing a packaging device, a dielectric layer that covers a packaging base is formed and a lower layer is formed over a packaging base including first and second connecting pads. A plurality of dummy bumps that overlaps with the dielectric layer is formed. A sealing pattern that covers the dummy bumps, filling areas between the dummy bumps, is formed. A lower layer pattern in which the plurality of dummy bumps have been disposed is formed by removing portions of the lower layer that are exposed and do not overlap with the sealing pattern.

Abstract: There is provided a semiconductor device including through vias and a method of manufacturing the same. The semiconductor device includes a substrate including a first via hole and a second via hole, a first through via formed in the first via hole, a second through via formed in the second via hole, an insulating layer first portion formed between a sidewall surface of the first via hole and the first through via, and an insulating layer second portion formed between a sidewall surface of the second via hole and the second through via.

Abstract: A semiconductor chip includes a body portion with a front surface and a rear surface; a through electrode penetrating the body portion; a wiring portion that is disposed over the front surface of the body portion; a rear connection electrode that is disposed over the rear surface of the body portion; and a front connection electrode that is disposed over the wiring portion, wherein the rear connection electrode includes a power rear connection electrode that is simultaneously connected to two or more power through electrodes, and wherein a width of the power rear connection electrode is greater than a width of the front connection electrode.

Abstract: A semiconductor chip includes a body portion with a front surface and a rear surface; a through electrode penetrating the body portion; a wiring portion that is disposed over the front surface of the body portion; a rear connection electrode that is disposed over the rear surface of the body portion; and a front connection electrode that s disposed over the wiring portion, wherein the rear connection electrode includes a power rear connection electrode that is simultaneously connected to two or more power through electrodes, and wherein a width of the power rear connection electrode is greater than a width of the front connection electrode.

Abstract: A semiconductor device may include a substrate including a first surface and a second surface, a through electrode penetrating the substrate to include a protrusion that protrudes from the second surface of the substrate, and a front side bump electrically coupled to the through electrode and disposed on the first surface of the substrate. The semiconductor device may include a first passivation pattern disposed on the first surface of the substrate to substantially surround a sidewall of the front side bump and may be formed to include an uneven surface, and a second passivation pattern disposed on the second surface of the substrate to include an uneven surface. The protrusion of the through electrode may penetrate the second passivation pattern to protrude from the uneven surface of the second passivation pattern.

Abstract: A semiconductor chip includes a semiconductor substrate with a top surface and a bottom surface. An active layer may be formed on the top surface of the semiconductor substrate and may comprise one or more signal pads and one or more chip selection pads on an upper surface of the active layer. First and second through electrodes may be formed to pass through the semiconductor substrate and the active layer, with the first through electrodes being electrically connected with the signal pads and the second through electrodes being electrically connected with the chip selection pads. A side electrode may be formed on a side surface of the semiconductor chip in such a way as to be connected with a second through electrode.

Abstract: A semiconductor package including a semiconductor chip having a front surface and a rear surface which faces away from the front surface, pads disposed over the front surface of the semiconductor chip, and bumps formed over the pads, and each having a T-shaped configuration or defining an inverted T-shaped space.

Abstract: A semiconductor chip includes a semiconductor substrate with a top surface and a bottom surface. An active layer may be formed on the top surface of the semiconductor substrate and may comprise one or more signal pads and one or more chip selection pads on an upper surface of the active layer. First and second through electrodes may be formed to pass through the semiconductor substrate and the active layer, with the first through electrodes being electrically connected with the signal pads and the second through electrodes being electrically connected with the chip selection pads. A side electrode may be formed on a side surface of the semiconductor chip in such a way as to be connected with a second through electrode.