Patents by Inventor Ju-hyun Oh

Ju-hyun Oh has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 12374568
    Abstract: A method of selective metal removal via gradient oxidation for a gap-fill includes performing process cycles, each process cycle including placing a wafer having a semiconductor structure thereon into a first processing station, the semiconductor structure including a dielectric layer patterned with a feature formed therein and a seed layer formed on sidewalls and a bottom surface of the feature and a top surface of the dielectric layer, performing a reduction process on the wafer in the first processing station, performing a gradient oxidation process on the wafer in the second processing station, performing a gradient etch process on the wafer in the third processing station, and performing the gradient etch process on the wafer in the fourth processing station, wherein the first, second, third, and fourth processing stations are located in an interior volume of a processing chamber.
    Type: Grant
    Filed: August 29, 2023
    Date of Patent: July 29, 2025
    Assignee: APPLIED MATERIALS, INC.
    Inventors: Shiyu Yue, Sahil Jaykumar Patel, Yu Lei, Wei Lei, Chih-Hsun Hsu, Yi Xu, Abulaiti Hairisha, Cong Trinh, Yixiong Yang, Ju Hyun Oh, Aixi Zhang, Xingyao Gao, Rongjun Wang
  • Publication number: 20250079199
    Abstract: A method of selective metal removal via gradient oxidation for a gap-fill includes performing process cycles, each process cycle including placing a wafer having a semiconductor structure thereon into a first processing station, the semiconductor structure including a dielectric layer patterned with a feature formed therein and a seed layer formed on sidewalls and a bottom surface of the feature and a top surface of the dielectric layer, performing a reduction process on the wafer in the first processing station, performing a gradient oxidation process on the wafer in the second processing station, performing a gradient etch process on the wafer in the third processing station, and performing the gradient etch process on the wafer in the fourth processing station, wherein the first, second, third, and fourth processing stations are located in an interior volume of a processing chamber.
    Type: Application
    Filed: August 29, 2023
    Publication date: March 6, 2025
    Inventors: Shiyu YUE, Sahil Jaykumar PATEL, Yu LEI, Wei LEI, Chih-Hsun HSU, Yi XU, Abulaiti HAIRISHA, Cong TRINH, Yixiong YANG, Ju Hyun OH, Aixi ZHANG, Xingyao GAO, Rongjun WANG
  • Publication number: 20250006518
    Abstract: Embodiments herein relate to a method, semiconductor device structures, and multi-chamber processing system for exposing a semiconductor device structure to an oxidizing plasma to form an oxide layer on at least one electrical connection formed in at least one feature formed within a dielectric layer of the semiconductor device structure, performing an etch process to remove the oxide layer and form an etch recess between a portion of the electrical connection and the dielectric layer At least a portion of the etch recess extends underneath at least a portion of the dielectric layer, and filling the at least one feature and the etch recess with a metal material.
    Type: Application
    Filed: June 25, 2024
    Publication date: January 2, 2025
    Inventors: Shiyu YUE, Wei LEI, Yu LEI, Ju Hyun OH, Zhimin QI, Sahil Jaykumar PATEL, Yi XU, Aixi ZHANG, Bingqian LIU, Cong TRINH, Xianmin TANG, Hayrensa ABLAT
  • Publication number: 20240420947
    Abstract: A method of pre-cleaning in a semiconductor structure includes performing a plasma pre-treatment process to remove impurities from a surface of a semiconductor structure comprising a metal layer and a dielectric layer, performing a selective etch process to remove molybdenum oxide from a surface of the metal layer, the selective etch process comprising soaking the semiconductor structure in a precursor including molybdenum chloride (MoCl5, MoCl6) at a temperature of between 250° C. and 350° C., and performing a post-treatment process to remove chlorine residues and by-products of the selective etch process on the surface of the semiconductor structure.
    Type: Application
    Filed: June 16, 2023
    Publication date: December 19, 2024
    Inventors: Shiyu YUE, Jiajie CEN, Sahil Jaykumar PATEL, Zhimin QI, Ju Hyun OH, Aixi ZHANG, Xingyao GAO, Wei LEI, Yi XU, Yu LEI, Tsung-Han YANG, Xiaodong WANG, Xiangjin XIE, Yixiong YANG, Kevin KASHEFI, Rongjun WANG
  • Patent number: 8745740
    Abstract: The invention relates to an apparatus for detecting malicious sites, comprising: a monitoring unit for monitoring all processes being executed in a computing apparatus; a hook code insertion unit for inserting a hook code in a process executed in a browser when the execution of the browser is detected by the monitoring unit; a danger level determining unit that, upon the detection of a website movement, uses the hook code to inspect a stack structure of a process implemented according to the website movement and determine whether or not to perform the stack structure inspection, and determines whether or not the website to which the movement has been made is a malicious site; and a database for storing a list of sites determined to be malicious.
    Type: Grant
    Filed: November 1, 2010
    Date of Patent: June 3, 2014
    Assignee: AHNLAB., Inc.
    Inventors: Ju Hyun Oh, Chang Woo Lee, Chong Phil Park
  • Publication number: 20120233692
    Abstract: The invention relates to an apparatus for detecting malicious sites, comprising: a monitoring unit for monitoring all processes being executed in a computing apparatus; a hook code insertion unit for inserting a hook code in a process executed in a browser when the execution of the browser is detected by the monitoring unit; a danger level determining unit that, upon the detection of a website movement, uses the hook code to inspect a stack structure of a process implemented according to the website movement and determine whether or not to perform the stack structure inspection, and determines whether or not the website to which the movement has been made is a malicious site; and a database for storing a list of sites determined to be malicious.
    Type: Application
    Filed: November 1, 2010
    Publication date: September 13, 2012
    Applicant: AHNLAB., Inc.
    Inventors: Ju Hyun Oh, Chang Woo Lee, Chong Phil Park
  • Patent number: 8054482
    Abstract: A method of managing data contained in a file includes extracting locality information contained in a printing data file; determining whether the same locality information exists between the extracted locality information and input locality information; and analyzing printing data contained in the printing data file if it is determined that the same locality information exists. A method of managing data contained in a document includes extracting locality information by reading a document; determining whether the same locality information exists between the extracted locality information and input locality information; and duplicating information contained in the document if it is determined that the same locality information exists.
    Type: Grant
    Filed: June 27, 2006
    Date of Patent: November 8, 2011
    Assignee: Samsung Electronics Co., Ltd.
    Inventor: Ju-hyun Oh
  • Publication number: 20080028307
    Abstract: An image forming system is disclosed. The image forming system comprises a URL acquiring part to acquire URL data corresponding to a location of a web page acquired through an Internet in a web browser; a URL format converting part to convert the URL data into at least one predetermined URL format data; and a print data generating part to convert the web page and the predetermined URL format data into print data to be outputted.
    Type: Application
    Filed: July 18, 2007
    Publication date: January 31, 2008
    Applicant: Samsung Electronics Co., Ltd.
    Inventor: Ju-hyun OH
  • Publication number: 20060290981
    Abstract: A method of managing data contained in a file includes extracting locality information contained in a printing data file; determining whether the same locality information exists between the extracted locality information and input locality information; and analyzing printing data contained in the printing data file if it is determined that the same locality information exists. A method of managing data contained in a document includes extracting locality information by reading a document; determining whether the same locality information exists between the extracted locality information and input locality information; and duplicating information contained in the document if it is determined that the same locality information exists.
    Type: Application
    Filed: June 27, 2006
    Publication date: December 28, 2006
    Inventor: Ju-hyun Oh