Abstract: Disclosed is a mobile communication terminal including a separate antenna for receiving multimedia public broadcasting signals. The mobile communication terminal has a sender/receiver antenna, a diversity antenna for performing a diversity function, a diplexer connected to the sender/receiver antenna for outputting signals from the sender/receiver antenna, a satellite antenna detachably mounted on the mobile communication terminal for receiving multimedia public broadcasting signals or satellite broadcasting signals. A receiving/transmitting signal processing section is provided for processing signals transmitted from the sender/receiver antenna, the diversity antenna and the satellite antenna.

Abstract: The present invention relates to a system and method, which establish a plug-in relationship with a graphic program, such as Adobe Illustrator, and are adapted to reconstruct each face in three dimensions to include content designed in a two-dimensional development figure, thus converting a two-dimensional object into a three-dimensional object. In the three-dimensional design method, shapes of basic boxes are presented to a user. Dimensions corresponding to a box shape selected by the user are received. Coordinate values of a development figure are changed depending on the dimensions received from the user. A development figure suitable for the changed coordinate values is presented to the user. The design made by the user is partitioned to correspond to faces of the development figure. Three-dimensional coordinate values are set based on input coordinate values. The partitioned design is arranged on the three-dimensional coordinate values, thus generating three-dimensional data.

Abstract: Methods and apparatus are provided for processing a substrate with a hermetic dielectric layer. In one aspect, the invention provides a method for processing a substrate including providing the substrate to a processing chamber, introducing a processing gas comprising a reducing agent, an oxygen containing compound, and an organosilicon compound, into the processing chamber, generating a plasma from a dual frequency RF power source, and depositing a dielectric material comprising silicon, carbon, and oxygen. The dielectric material may be used as an etch stop, an anti-reflective coating, or a passivation layer.

Abstract: An optical pickup includes a light source module in which first and second light sources that emit first and second light beams of different wavelengths are integrated into a single package, an objective lens that focuses the first and second light beams to form a light spot on a recording surface of a recording medium, a light path changer that changes a path along which the first and second light beams propagate, a photodetector that receives the first and second light beams entered via the objective lens and the light path changer and detects an information signal and/or error signal, and an optical element disposed on a path along which the first and second light beams propagate to act as a lens with respect to only one of the first and second light beams so as to correct a position difference along a light propagation direction between the first and second light sources.

Abstract: A silicon oxide layer is produced by plasma enhanced decomposition of an organosilicon compound to deposit films having a carbon content of at least 1% by atomic weight. An optional carrier gas may be introduced to facilitate the deposition process at a flow rate less than or equal to the flow rate of the organosilicon compounds. An oxygen rich surface may be formed adjacent the silicon oxide layer by temporarily increasing oxidation of the organosilicon compound.

Abstract: Methods are provided for depositing an oxygen-doped dielectric layer. The oxygen-doped dielectric layer may be used for a barrier layer or a hardmask. In one aspect, a method is provided for processing a substrate including positioning the substrate in a processing chamber, introducing a processing gas comprising an oxygen-containing organosilicon compound, carbon dioxide, or combinations thereof, and an oxygen-free organosilicon compound to the processing chamber, and reacting the processing gas to deposit an oxygen-doped dielectric material on the substrate, wherein the dielectric material has an oxygen content of about 15 atomic percent or less. The oxygen-doped dielectric material may be used as a barrier layer in damascene or dual damascene applications.

Abstract: The present invention is a method and apparatus for cleaning a chemical vapor deposition (CVD) chamber using cleaning gas energized to a plasma in a gas mixing volume separated by an electrode from a reaction volume of the chamber. In one embodiment, a source of RF power is coupled to a lid of the chamber, while a switch is used to couple a showerhead to ground terminals or the source of RF power.

Abstract: The present invention is a method and apparatus for cleaning a chemical vapor deposition (CVD) chamber using cleaning gas energized to a plasma in a gas mixing volume separated by an electrode from a reaction volume of the chamber. In one embodiment, a source of RF power is coupled to a lid of the chamber, while a switch is used to couple a showerhead to ground terminals or the source of RF power.

Abstract: A compatible optical pickup device includes a single light source to emit a light having a wavelength longer than 650 nm, an objective lens having a near axis area, a ring type annular lens area, and a far axis area to focus the light to form light spots suitable for a first relatively thin optical disk and a second relatively thick optical disk to form a first light spot having an FWHM (full width at half maximum) of 0.72 ?m or less for the first optical disk and a second light spot having an FWHM of 0.8 ?m or more for the second optical disk, an optical path changer to change a proceeding path of incident light, and a photodetector to receive light reflected by the optical disk and having passed through the objective lens and the optical path changer and to detect an information signal and/or an error signal.

Abstract: Methods and apparatus are provided for processing a substrate with a hermetic dielectric layer. In one aspect, the invention provides a method for processing a substrate including providing the substrate to a processing chamber, introducing a processing gas comprising a reducing agent, an oxygen containing compound, and an organosilicon compound, into the processing chamber, generating a plasma from a dual frequency RF power source, and depositing a dielectric material comprising silicon, carbon, and oxygen. The dielectric material may be used as an etch stop, an anti-reflective coating, or a passivation layer.

Abstract: A silicon oxide layer is produced by plasma enhanced decomposition of an organosilicon compound to deposit films having a carbon content of at least 1% by atomic weight. An optional carrier gas may be introduced to facilitate the deposition process at a flow rate less than or equal to the flow rate of the organosilicon compounds. An oxygen rich surface may be formed adjacent the silicon oxide layer by temporarily increasing oxidation of the organosilicon compound.

Abstract: A loop antenna for a mobile terminal capable of reducing SAR. The loop antenna has three lines. The first line generates and transmits predetermined electric waves upon receiving current from an oscillator for oscillating power and has a connection point to connect an external line thereto. The second line includes a first end connected to a printed circuit board to ground current supplied to the first line and a second end having an opened structure. The third line has a first end connected to one side of the first line through the connection point and a second end connected to one side of the second line coupled to the printed circuit board in order to receive current from the first line through the connection point and transmit current into the second line.

Abstract: Methods are provided for depositing an oxygen-doped dielectric layer. The oxygen-doped dielectric layer may be used for a barrier layer or a hardmask. In one aspect, a method is provided for processing a substrate including positioning the substrate in a processing chamber, introducing a processing gas comprising an oxygen-containing organosilicon compound, carbon dioxide, or combinations thereof, and an oxygen-free organosilicon compound to the processing chamber, and reacting the processing gas to deposit an oxygen-doped dielectric material on the substrate, wherein the dielectric material has an oxygen content of about 15 atomic percent or less. The oxygen-doped dielectric material may be used as a barrier layer in damascene or dual damascene applications.

Abstract: An antenna apparatus for a mobile communication terminal to achieve better portability and to prevent damage from careless handling by a user. The antenna is installed inside a main body of the mobile terminal, to render more room for accommodating its components. The antenna apparatus includes the main body having therein a main board, a keypad assembly provided with a plurality of key tops formed exposedly on the upper surface of the main body, and an antenna section disposed, between the main board and the keypad assembly, opposite to and in the vicinity of the lower end of the main body. The antenna section is comprised of an antenna sheet disposed underneath the keypad assembly.

Abstract: Methods and apparatus for cleaning deposition chambers are presented. The cleaning methods include the use of a remote plasma source to generate reactive species from a cleaning gas to clean deposition chambers. A flow of helium or argon may be used during chamber cleaning. Radio frequency power may also be used in combination with a remote plasma source to clean deposition chambers.

Abstract: An apparatus for distributing gas in a processing system. In one embodiment, the system includes a gas distribution assembly having a gas distribution plate. The gas distribution plate defines a plurality of holes through which gases are transmitted. The assembly further includes a gas box coupled to the gas distribution plate, in which the gas box is configured to supply the gases into the plurality of holes. The assembly further includes a means for reducing heat transfer from the gas box to the gas distribution plate.

Abstract: The present invention relates to a heat absorb-release plastic composition and a molded product thereof, more specifically to a heat absorb-release plastic resin composition, which can sense a temperature at a specific temperature, has flexural strength, and can absorb or release heat as a latent heat, and a molded product thereof. The heat absorb-release plastic resin composition absorbs heat at a desired temperature as a latent heat and thus temperature increase is small, and therefore, it can be used for automobile interior decoration material, housing for an electric home appliances, etc. even if it has comparatively low Heat deflection temperature.

Abstract: The present invention relates to a heat absorb-release plastic composition and a molded product thereof, more specifically to a heat absorb-release plastic resin composition, which can sense a temperature at a specific temperature, has flexural strength, and can absorb or release heat as a latent heat, and a molded product thereof. The heat absorb-release plastic resin composition absorbs heat at a desired temperature as a latent heat and thus temperature increase is small, and therefore, it can be used for automobile interior decoration material, housing for an electric home appliances, etc. even if it has comparatively low Heat deflection temperature.

Abstract: A method and apparatus for cleaning a processing chamber are provided. The cleaning method includes the use of a remote plasma source to generate reactive species and an in situ RF power to generate or regenerate reactive species. The reactive species are generated from a carbon and fluorine-containing gas and an oxygen source.