Abstract: A chemical filter unit includes a housing, a first filter for filtering liquid chemicals, a second filter for filtering air, and a window in the housing. The housing has an outlet and an inlet through which chemicals enter and leave the filter, respectively, and an air vent that allows air to be discharged from the filter. The first filter is disposed in a path along which chemicals flow inside the housing to filter out particles contained in the chemicals, and the second filter is disposed in a path along which air leaves the filter through the air vent. The second filter includes a medium that collects particles contained in the air. The window allows the second filter to be seen from outside the housing.

Abstract: A wafer cleaning device is disclosed in which a brush is integrally formed with a nozzle for supplying pure water, such that a uniform water screen is formed on a surface of a wafer and particles on the wafer can be entirely removed. The cleaning device includes injectors for ejecting pure water supplied from a pure water supplier onto a wafer; nozzles disposed at one end of each of the injectors; and a brush for cleaning the wafer while moving horizontally between a center and edges of the wafer. The injectors include a first injector for ejecting pure water at an upper position of the wafer toward the center of the wafer, and a second injector disposed adjacent to the brush along one side of a brush arm, the brush arm supporting the brush and moving the brush and second injector toward the wafer.

Abstract: A wafer cleaning device is disclosed in which a brush is integrally formed with a nozzle for supplying pure water, such that a uniform water screen is formed on a surface of a wafer and particles on the wafer can be entirely removed. The cleaning device includes injectors for ejecting pure water supplied from a pure water supplier onto a wafer; nozzles disposed at one end of each of the injectors; and a brush for cleaning the wafer while moving horizontally between a center and edges of the wafer. The injectors include a first injector for ejecting pure water at an upper position of the wafer toward the center of the wafer, and a second injector disposed adjacent to the brush along one side of a brush arm, the brush arm supporting the brush and moving the brush and second injector toward the wafer.