Patents by Inventor Ju Shi

Ju Shi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 12240902
    Abstract: In one aspect, antibodies that specifically bind to a human triggering receptor expressed on myeloid cells 2 (TREM2) protein are provided. In some embodiments, the antibody decreases levels of soluble TREM2 (sTREM2). In some embodiments, the antibody enhances TREM2 activity.
    Type: Grant
    Filed: August 16, 2021
    Date of Patent: March 4, 2025
    Assignee: Denali Therapeutics Inc.
    Inventors: Mark S. Dennis, Sherie Duncan, Kathleen Lisaingo, Kathryn M. Monroe, Joshua I. Park, Rachel Prorok, Ju Shi, Ankita Srivastava, Bettina Van Lengerich, Riley Walsh
  • Publication number: 20240024313
    Abstract: The disclosure is directed to compounds of Formula (I) and pharmaceutically acceptable salts and solvates thereof. The disclosure is also directed to pharmaceutical compositions containing compounds of Formula (I) and pharmaceutically acceptable salts or solvates thereof, and uses of the pharmaceutical compositions in treating diseases, conditions, and disorders associated with fatty acid amide hydrolase (FAAH) activity.
    Type: Application
    Filed: July 17, 2023
    Publication date: January 25, 2024
    Inventors: Ju SHI, Sheryl COPPOLA, Polly Rae PINE, Matthew BOYLAN, Thomas Wesley STOREY
  • Publication number: 20220119522
    Abstract: In one aspect, antibodies that specifically bind to a human triggering receptor expressed on myeloid cells 2 (TREM2) protein are provided. In some embodiments, the antibody decreases levels of soluble TREM2 (sTREM2). In some embodiments, the antibody enhances TREM2 activity.
    Type: Application
    Filed: August 16, 2021
    Publication date: April 21, 2022
    Applicant: Denali Therapeutics Inc.
    Inventors: Mark S. Dennis, Sherie Duncan, Kathleen Lisaingo, Kathryn M. Monroe, Joshua I. Park, Rachel Prorok, Ju Shi, Ankita Srivastava, Bettina Van Lengerich, Riley Walsh
  • Publication number: 20220073609
    Abstract: In one aspect, antibodies that specifically bind to a human triggering receptor expressed on myeloid cells 2 (TREM2) protein are provided. In some embodiments, the antibody decreases levels of soluble TREM2 (sTREM2). In some embodiments, the antibody enhances TREM2 activity.
    Type: Application
    Filed: August 16, 2021
    Publication date: March 10, 2022
    Applicant: Denali Therapeutics Inc.
    Inventors: Mark S. Dennis, Sherie Duncan, Kathleen Lisaingo, Kathryn M. Monroe, Joshua I. Park, Rachel Prorok, Ju Shi, Ankita Srivastava, Bettina Van Lengerich, Riley Walsh
  • Patent number: 11219859
    Abstract: The present disclosure relates to a catalyst for NOx removal. In some embodiments, the catalyst comprises a support comprising at least one selected from the group consisting of TiO2, Al2O3, SiO2, ZrO2, CeO2, zeolite, TiO2 and WO3, and combinations thereof, and catalytically active components supported on the support. The catalytically active components comprise vanadium, antimony and at least one further component selected from the group consisting of silicon, aluminum and zirconium.
    Type: Grant
    Filed: July 26, 2016
    Date of Patent: January 11, 2022
    Assignee: BASF Corporation
    Inventors: Liang Chen, Feng Zhao, Jia Di Zhang, An Ju Shi, Shau-Lin Frank Chen, Miao Mark Chen
  • Publication number: 20200277373
    Abstract: In one aspect, antibodies that specifically bind to a human triggering receptor expressed on myeloid cells 2 (TREM2) protein are provided. In some embodiments, the antibody increases levels of soluble TREM2 (sTREM2). In some embodiments, the antibody decreases levels of sTREM2. In some embodiments, the antibody enhances TREM2 activity. In some embodiments, the antibody inhibits TREM2 activity.
    Type: Application
    Filed: September 14, 2018
    Publication date: September 3, 2020
    Applicant: Denali Therapeutics Inc.
    Inventors: Hang Chen, Gilbert Di Paolo, Rui Hao, Joseph W. Lewcock, Nathan Moerke, Alicia A. Nugent, Rishi Rakhit, Ju Shi, Rinkan Shukla, Ankita Srivastava, Bettina Van Lengerich, Yin Zhang
  • Publication number: 20190160428
    Abstract: The present invention relates to a catalyst for NOx removal. More specifically, the present invention relates to a supported catalyst, a monolithic selective catalytic reduction (SCR) catalyst, preparation method therefor, and method for NOx removal.
    Type: Application
    Filed: July 26, 2016
    Publication date: May 30, 2019
    Inventors: Liang CHEN, Feng ZHAO, Jia Di ZHANG, An Ju SHI, Shau-Lin Frank CHEN, Miao Mark CHEN
  • Patent number: 9887182
    Abstract: Methods for improving hybrid bond yield for semiconductor wafers forming 3DIC devices includes first and second wafers having dummy and main metal deposited and patterned during BEOL processing. Metal of the dummy metal pattern occupies from about 40% to about 90% of the surface area of any given dummy metal pattern region. High dummy metal surface coverage, in conjunction with utilization of slotted conductive pads, allows for improved planarization of wafer surfaces presented for hybrid bonding. Planarized wafers exhibit minimum topographic differentials corresponding to step height differences of less than about 400 ?. Planarized first and second wafers are aligned and subsequently hybrid bonded with application of heat and pressure; dielectric-to-dielectric, RDL-to-RDL. Lithography controls to realize WEE from about 0.5 mm to about 1.5 mm may be employed to promote topographic uniformity at wafer edges.
    Type: Grant
    Filed: May 17, 2017
    Date of Patent: February 6, 2018
    Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Ju-Shi Chen, Cheng-Ying Ho, Chun-Chieh Chuang, Sheng-Chau Chen, Shih Pei Chou, Hui-Wen Shen, Dun-Nian Yaung, Ching-Chun Wang, Feng-Chi Hung, Shyh-Fann Ting
  • Publication number: 20170309603
    Abstract: Methods for improving hybrid bond yield for semiconductor wafers forming 3DIC devices includes first and second wafers having dummy and main metal deposited and patterned during BEOL processing. Metal of the dummy metal pattern occupies from about 40% to about 90% of the surface area of any given dummy metal pattern region. High dummy metal surface coverage, in conjunction with utilization of slotted conductive pads, allows for improved planarization of wafer surfaces presented for hybrid bonding. Planarized wafers exhibit minimum topographic differentials corresponding to step height differences of less than about 400 ?. Planarized first and second wafers are aligned and subsequently hybrid bonded with application of heat and pressure; dielectric-to-dielectric, RDL-to-RDL. Lithography controls to realize WEE from about 0.5 mm to about 1.5 mm may be employed to promote topographic uniformity at wafer edges.
    Type: Application
    Filed: May 17, 2017
    Publication date: October 26, 2017
    Inventors: Ju-Shi Chen, Cheng-Ying Ho, Chun-Chieh Chuang, Sheng-Chau Chen, Shih Pei Chou, Hui-Wen Shen, Dun-Nian Yaung, Ching-Chun Wang, Feng-Chi Hung, Shyh-Fann Ting
  • Patent number: 9728521
    Abstract: An integrated circuit (IC) using a copper-alloy based hybrid bond is provided. The IC comprises a pair of semiconductor structures vertically stacked upon one another. The pair of semiconductor structures comprise corresponding dielectric layers and corresponding metal features arranged in the dielectric layers. The metal features comprise a copper alloy having copper and a secondary metal. The IC further comprises a hybrid bond arranged at an interface between the semiconductor structures. The hybrid bond comprises a first bond bonding the dielectric layers together and a second bond bonding the metal features together. The second bond comprises voids arranged between copper grains of the metal features and filled by the secondary metal. A method for bonding a pair of semiconductor structures together using the copper-alloy based hybrid bond is also provided.
    Type: Grant
    Filed: July 23, 2015
    Date of Patent: August 8, 2017
    Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
    Inventors: Yu-Cheng Tsai, Chun-Chieh Chuang, Ching-Chun Wang, Dun-Nian Yaung, Feng-Chi Hung, Chih-Hui Huang, Yan-Chih Lu, Ju-Shi Chen
  • Patent number: 9666566
    Abstract: Methods for improving hybrid bond yield for semiconductor wafers forming 3DIC devices includes first and second wafers having dummy and main metal deposited and patterned during BEOL processing. Metal of the dummy metal pattern occupies from about 40% to about 90% of the surface area of any given dummy metal pattern region. High dummy metal surface coverage, in conjunction with utilization of slotted conductive pads, allows for improved planarization of wafer surfaces presented for hybrid bonding. Planarized wafers exhibit minimum topographic differentials corresponding to step height differences of less than about 400 ?. Planarized first and second wafers are aligned and subsequently hybrid bonded with application of heat and pressure; dielectric-to-dielectric, RDL-to-RDL. Lithography controls to realize WEE from about 0.5 mm to about 1.5 mm may also be employed to promote topographic uniformity at wafer edges.
    Type: Grant
    Filed: April 26, 2016
    Date of Patent: May 30, 2017
    Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Ju-Shi Chen, Cheng-Ying Ho, Chun-Chieh Chuang, Sheng-Chau Chen, Shih Pei Chou, Hui-Wen Shen, Dun-Nian Yaung, Ching-Chun Wang, Feng-Chi Hung, Shyh-Fann Ting
  • Publication number: 20170025381
    Abstract: An integrated circuit (IC) using a copper-alloy based hybrid bond is provided. The IC comprises a pair of semiconductor structures vertically stacked upon one another. The pair of semiconductor structures comprise corresponding dielectric layers and corresponding metal features arranged in the dielectric layers. The metal features comprise a copper alloy having copper and a secondary metal. The IC further comprises a hybrid bond arranged at an interface between the semiconductor structures. The hybrid bond comprises a first bond bonding the dielectric layers together and a second bond bonding the metal features together. The second bond comprises voids arranged between copper grains of the metal features and filled by the secondary metal. A method for bonding a pair of semiconductor structures together using the copper-alloy based hybrid bond is also provided.
    Type: Application
    Filed: July 23, 2015
    Publication date: January 26, 2017
    Inventors: Yu-Cheng Tsai, Chun-Chieh Chuang, Ching-Chun Wang, Dun-Nian Yaung, Feng-Chi Hung, Chih-Hui Huang, Yan-Chih Lu, Ju-Shi Chen
  • Publication number: 20070136353
    Abstract: A system and method for data model and content migration in content management applications is disclosed that facilitates data migration by utilizing a markup-language format to preserve dependency and enable compatibility among various platforms, applications, devices, etc. The invention generally includes retrieving a plurality of objects, determining a dependency of the plurality of objects, extracting object definitions from the objects, forming a markup-language user document with the extracted object definitions utilizing the determined object dependency, and exporting the markup-language user document.
    Type: Application
    Filed: December 9, 2005
    Publication date: June 14, 2007
    Applicant: International Business Machines Corporation
    Inventors: Hui-I Hsiao, Joshua Hui, Madhumati Krishnan, San-Ju Shi, Lin Xu