Patents by Inventor Ju Wook Lee

Ju Wook Lee has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20250192172
    Abstract: A cathode for a lithium secondary battery includes lithium metal oxide particles having CM defined by D*(EIT/HIT)/[(Li/Me)2] of of 70 or more. D is an average particle diameter value calculated in micrometers after measuring diameters of particles with a diameter of 4 ?m or more in the lithium metal oxide particles included in a scanning electron microscope (SEM) image showing a thickness*width cross-section of the cathode active material layer. EIT is a modulus value of the lithium metal oxide particles measured by a nano indentation method. HIT is a hardness value of the lithium metal oxide particles measured by a nano indentation method. Li/Me is a molar ratio of lithium to metals other than lithium in the lithium metal oxide particles.
    Type: Application
    Filed: December 4, 2024
    Publication date: June 12, 2025
    Inventors: Young Uk PARK, Seung Hyun KIM, Soon Bo LEE, Min Suk KANG, Hyun Sung KANG, Ji Yae DO, Min Cheol BEAK, Ju Wook LEE, Jeong Hoon JEUN
  • Publication number: 20240282951
    Abstract: A cathode active material precursor for a lithium secondary battery includes nickel and at least one metal except for nickel. The cathode active material precursor includes primary particles having a major axis length of 500 nm or less and an aspect ratio in a range from 1.0 to 3.0. A volume ratio of micropores having a pore diameter of 2 nm or less relative to a total pore volume is 1.4% or less.
    Type: Application
    Filed: January 31, 2024
    Publication date: August 22, 2024
    Inventors: Yeong Bin YOO, Sung Soon PARK, Jong Hwa KIM, Kyung Bin YOO, Ju Wook LEE
  • Publication number: 20240170665
    Abstract: A lithium secondary battery includes a cathode including a cathode active material layer that includes a plurality of lithium metal oxide particles, each lithium metal oxide particle having a form of a secondary particle including a plurality of aggregated primary particles, an anode facing the cathode, and an electrolyte solution containing a lithium salt and an organic solvent. The organic solvent includes a compound represented by a specific chemical formula. The plurality of primary particles include rod-shape particles having an aspect ratio of 1.5 to 5. The rod-shape particles have a major axis oriented in a direction from a center of the lithium metal oxide particle to a surface of the lithium metal oxide particle.
    Type: Application
    Filed: October 12, 2023
    Publication date: May 23, 2024
    Inventors: Jong Hwa KIM, In Haeng CHO, Yeong Bin YOO, Ju Wook LEE, Wan Uk CHOI
  • Publication number: 20230378460
    Abstract: A cathode for a lithium secondary battery includes a cathode current collector, and a cathode active material layer satisfying a specific formula formed on the cathode current collector. The cathode active material layer includes lithium metal oxide particles that have a single particle shape, and a single crystalline structure or a poly-crystalline structure including two or more single crystals. A lithium secondary battery including the cathode, and a method of preparing a cathode active material are also provided.
    Type: Application
    Filed: May 18, 2023
    Publication date: November 23, 2023
    Inventors: Sang Han LEE, Ju Wook LEE, Jong Hyuk LEE, Jung Hwan KIM, Soo Min PARK, In Haeng CHO, Dong Wook HA
  • Patent number: 7190432
    Abstract: Provided is a wafer exposure apparatus used in a semiconductor device manufacturing process, the exposure apparatus including: a reflective mirror for reflecting light provided from a light source; an optical path changer for changing a path of the light provided from the reflective mirror; first mirrors installed at both sides of the optical path changer to change the path of the light; second mirrors installed at both sides of a material to change the path of the light; and third mirrors installed at both sides of a mask to enter the light reflected by the first mirrors to the mask and to enter the light passed through the mask into the second mirrors, whereby it is possible to continuously expose one surface, both surfaces or a specific surface of a wafer in a state that the wafer is once aligned.
    Type: Grant
    Filed: October 13, 2005
    Date of Patent: March 13, 2007
    Assignee: Electronics and Telecommunications Research Institute
    Inventors: Sang Gi Kim, Ju Wook Lee, Jong Moon Park, Seong Wook Yoo, Kun Sik Park, Yong Sun Yoon, Yoon Kyu Bae, Byung Won Lim, Jin Gun Koo, Boo Woo Kim
  • Publication number: 20060109444
    Abstract: Provided is a wafer exposure apparatus used in a semiconductor device manufacturing process, the exposure apparatus including: a reflective mirror for reflecting light provided from a light source; an optical path changer for changing a path of the light provided from the reflective mirror; first mirrors installed at both sides of the optical path changer to change the path of the light; second mirrors installed at both sides of a material to change the path of the light; and third mirrors installed at both sides of a mask to enter the light reflected by the first mirrors to the mask and to enter the light passed through the mask into the second mirrors, whereby it is possible to continuously expose one surface, both surfaces or a specific surface of a wafer in a state that the wafer is once aligned.
    Type: Application
    Filed: October 13, 2005
    Publication date: May 25, 2006
    Inventors: Sang Gi Kim, Ju Wook Lee, Jong Moon Park, Seong Wook Yoo, Kun Sik Park, Yong Sun Yoon, Yoon Kyu Bae, Byung Won Lim, Jin Gun Koo, Boo Woo Kim