Patents by Inventor Ju Yeon Hong

Ju Yeon Hong has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11792050
    Abstract: An operating method of a power estimation apparatus comprising a fixed antenna and a mobile antenna may comprise: a first operation of obtaining N measurement values by receiving a signal from signal sources using the fixed antenna and the mobile antenna that moves at a speed v from a first point to an Nth point; a second operation of generating a two-dimensional (2D) data collection set comprising N×M measurement values, by repeating the first operation M times; applying an approximation singular value decomposition (SVD) algorithm to the 2D data collection set; and obtaining information of the signal sources based on an application result of the approximation SVD algorithm, wherein N and M are natural numbers.
    Type: Grant
    Filed: November 29, 2021
    Date of Patent: October 17, 2023
    Assignee: Electronics and Telecommunications Research Institute
    Inventors: Chung Sup Kim, Jun Seok Kim, Jong Soo Lim, Ju Yeon Hong, Young Jun Chong
  • Publication number: 20230147708
    Abstract: An operating method of a power estimation apparatus comprising a fixed antenna and a mobile antenna may comprise: a first operation of obtaining N measurement values by receiving a signal from signal sources using the fixed antenna and the mobile antenna that moves at a speed v from a first point to an Nth point; a second operation of generating a two-dimensional (2D) data collection set comprising N×M measurement values, by repeating the first operation M times; applying an approximation singular value decomposition (SVD) algorithm to the 2D data collection set; and obtaining information of the signal sources based on an application result of the approximation SVD algorithm, wherein N and M are natural numbers.
    Type: Application
    Filed: November 29, 2021
    Publication date: May 11, 2023
    Applicant: ELECTRONICS AND TELECOMMUNICATIONS RESEARCH INSTITUTE
    Inventors: Chung Sup KIM, Jun Seok KIM, Jong Soo LIM, Ju Yeon HONG, Young Jun CHONG
  • Patent number: 11456809
    Abstract: Disclosed is a position estimation method for estimating a position of an interference signal source and a position estimation system for performing the method. The position estimation method may implement an indoor delay-space analysis structure by transmitting and receiving a known signal and a virtual array structure-based direction finding algorithm in an indoor environment in which a plurality of reflected waves is present and may increase an estimation probability for the position of the interference signal source.
    Type: Grant
    Filed: December 4, 2018
    Date of Patent: September 27, 2022
    Assignee: ELECTRONICS AND TELECOMMUNICATIONS RESEARCH INSTITUTE
    Inventors: Chung Sup Kim, Hyuk Je Kim, Young Jun Chong, Jong Soo Lim, Ju Yeon Hong
  • Patent number: 11246100
    Abstract: A method of selecting a path for transmitting a maximum power from a base station to a terminal includes simplifying a plurality of structures in an area by using OBBs, the area being an area in which beam search is to be performed; forming the plurality of simplified structures into a tree structure for ray tracing; performing the ray tracing by applying a ray tracing relation tree reduction (RRTR) algorithm for reducing an amount of computation of a GPU to the tree structure; and applying a linear regression (LR) algorithm for calculating the maximum power to be transmitted from the base station to the terminal based on a result of the ray tracing.
    Type: Grant
    Filed: December 3, 2020
    Date of Patent: February 8, 2022
    Assignee: ELECTRONICS AND TELECOMMUNICATIONS RESEARCH INSTITUTE
    Inventors: Chung Sup Kim, Sung Woong Choi, Jong Soo Lim, Ju Yeon Hong, Young Jun Chong
  • Patent number: 10992038
    Abstract: A method and apparatus for calibrating a phased array antenna system is disclosed. The method includes receiving a first transmission signal transmitted from a transmitting antenna device, receiving a second transmission signal that is generated by the transmitting antenna device based on an unoccupied frequency band of a receiving array antenna system and a bandwidth of the frequency band, and generating a calibration matrix to calibrate a plurality of antenna elements included in the receiving array antenna system based on a signal magnitude and a phase difference which are calculated for each of the antenna elements using the first transmission signal and the second transmission signal.
    Type: Grant
    Filed: December 4, 2019
    Date of Patent: April 27, 2021
    Assignee: Electronics and Telecommunications Research Institute
    Inventors: Chung Sup Kim, hyuk Je Kim, Jong Soo Lim, Ju Yeon Hong, Young Jun Chong
  • Publication number: 20210075101
    Abstract: A method and apparatus for calibrating a phased array antenna system is disclosed. The method includes receiving a first transmission signal transmitted from a transmitting antenna device, receiving a second transmission signal that is generated by the transmitting antenna device based on an unoccupied frequency band of a receiving array antenna system and a bandwidth of the frequency band, and generating a calibration matrix to calibrate a plurality of antenna elements included in the receiving array antenna system based on a signal magnitude and a phase difference which are calculated for each of the antenna elements using the first transmission signal and the second transmission signal.
    Type: Application
    Filed: December 4, 2019
    Publication date: March 11, 2021
    Applicant: Electronics and Telecommunications Research Institute
    Inventors: Chung Sup KIM, hyuk Je KIM, Jong Soo LIM, Ju Yeon HONG, Young Jun CHONG
  • Publication number: 20200016795
    Abstract: The present invention relates to a method of manufacturing a hyaluronate film and a hyaluronate film manufactured thereby, and more particularly to a method of manufacturing a hyaluronate film through a solvent-casting process or using an automatic film applicator that facilitates mass production and to a hyaluronate film manufactured thereby, which is useful as a mask pack for cosmetics, a patch for medicaments and medical devices, a film-type adhesion inhibitor, etc. Unlike conventional liquid products, the hyaluronate film according to the present invention has a dry surface and thus entails no concern about microbial contamination, is easy to produce/manage/distribute/use, and has superior mechanical properties, whereby it can be utilized for various applications such as packs, patches, artificial skin and the like for cosmetics, medicaments, and medical devices.
    Type: Application
    Filed: March 7, 2018
    Publication date: January 16, 2020
    Inventors: Dong Keon KWEON, Ju Yeon HONG, Ji Hyun BANG, Seung Taik LIM, So Mang CHOI, Seul Ki KIM, Man HA, Young Mo LEE
  • Publication number: 20190369204
    Abstract: Disclosed is a position estimation method for estimating a position of an interference signal source and a position estimation system for performing the method. The position estimation method may implement an indoor delay-space analysis structure by transmitting and receiving a known signal and a virtual array structure-based direction finding algorithm in an indoor environment in which a plurality of reflected waves is present and may increase an estimation probability for the position of the interference signal source.
    Type: Application
    Filed: December 4, 2018
    Publication date: December 5, 2019
    Inventors: Chung Sup KIM, Hyuk Je KIM, Young Jun CHONG, Jong Soo LIM, Ju Yeon HONG
  • Publication number: 20180241497
    Abstract: Provided are a technique for providing focused Bessel beams having orbital angular momentum (OAM) to a plane to solve a problem of the related art in which Laguerre-Gaussian (LG) beams having OAM and used for multiplexing of a microwave transmission system are dispersed, and an electromagnetic wave generation apparatus and method for implementing the technique.
    Type: Application
    Filed: February 22, 2018
    Publication date: August 23, 2018
    Applicant: Electronics and Telecommunications Research Instit ute
    Inventors: Ju Yeon HONG, Myung Sun SONG, Wang Joo LEE
  • Patent number: 9111714
    Abstract: Provided is a backward-wave oscillator in a communication system, including a waveguide formed of a metamaterial. A unit structure of the waveguide may include: a top plate; a short-circuited stub; a bottom plate separated at a predetermined gap from the top plate, and having the short-circuited stub formed in the center thereof; a first metal pillar connecting the top plate at a first port positioned on one surface based on the short-circuited stub to the bottom plate at a second port positioned on the opposite surface of the first port based on the short-circuited stub; and a second metal pillar separated from the first metal pillar, and connecting the top plate at the second port to the bottom plate at the first port.
    Type: Grant
    Filed: September 3, 2014
    Date of Patent: August 18, 2015
    Assignee: ELECTRONICS AND TELECOMMUNICATIONS RESEARCH INSTITUTE
    Inventors: Ju Yeon Hong, Young Jun Chong, Jeong Hae Lee, Dong Jin Kim
  • Publication number: 20150061784
    Abstract: Provided is a backward-wave oscillator in a communication system, including a waveguide formed of a metamaterial. A unit structure of the waveguide may include: a top plate; a short-circuited stub; a bottom plate separated at a predetermined gap from the top plate, and having the short-circuited stub formed in the center thereof; a first metal pillar connecting the top plate at a first port positioned on one surface based on the short-circuited stub to the bottom plate at a second port positioned on the opposite surface of the first port based on the short-circuited stub; and a second metal pillar separated from the first metal pillar, and connecting the top plate at the second port to the bottom plate at the first port.
    Type: Application
    Filed: September 3, 2014
    Publication date: March 5, 2015
    Inventors: Ju Yeon HONG, Young Jun CHONG, Jeong Hae LEE, Dong Jin KIM
  • Publication number: 20120256703
    Abstract: A bandpass filter includes resonator coupling line on which a plurality of composite right/left-handed (CRLH) resonators are disposed. The plurality of CRLH resonators are inductively coupled with each other. The design variables can be increased through inductive coupling in the resonance period. Also, the skirt characteristics and the isolation can be improved.
    Type: Application
    Filed: November 25, 2011
    Publication date: October 11, 2012
    Applicants: IUCF-HYU ( Industry-University Cooperation Foundation Hanyang University, Electronics and Telecommunications Research Institute
    Inventors: Ju Yeon HONG, Jae Ick CHOI, Sungtek KAHNG, Geonho JANG, Boram LEE, Jaehoon CHOI
  • Publication number: 20110241798
    Abstract: Provided are a resonator and a filter performing a filtering operation by using the resonator. The filter includes a first resonation unit connected in series to an input terminal and having a first resonant frequency, a filtering unit connected in series to the first resonation unit to filter a signal inputted through the input terminal, a second resonation unit connected in series between the filtering unit and an output terminal and having a second resonant frequency, a first zero-order resonation unit connected in parallel to a connection terminal between the input terminal and the first resonation unit and having a first zero-order resonant frequency equal to the first resonant frequency, and a second zero-order resonation unit connected in parallel to a connection terminal between the output terminal and the second resonation unit and having a second zero-order resonant frequency equal to the second resonant frequency.
    Type: Application
    Filed: March 24, 2011
    Publication date: October 6, 2011
    Applicant: ELECTRONICS AND TELECOMMUNICATIONS RESEARCH INSTITUTE
    Inventors: Ju-Yeon HONG, Jeong-Ho Ju, Dong-Ho Kim, Young-Jun Chong, Wangjoo Lee, Jae-Ick Choi
  • Patent number: 7915106
    Abstract: A method of fabricating a T-gate is provided. The method includes the steps of: forming a photoresist layer on a substrate; patterning the photoresist layer formed on the substrate and forming a first opening; forming a first insulating layer on the photoresist layer and the substrate; removing the first insulating layer and forming a second opening to expose the substrate; forming a second insulating layer on the first insulating layer; removing the second insulating layer and forming a third opening to expose the substrate; forming a metal layer on the second insulating layer on which the photoresist layer and the third opening are formed; and removing the metal layer formed on the photoresist layer. Accordingly, a uniform and elaborate opening defining the length of a gate may be formed by deposition of the insulating layer and a blanket dry etching process, and thus a more elaborate micro T-gate electrode may be fabricated.
    Type: Grant
    Filed: November 13, 2008
    Date of Patent: March 29, 2011
    Assignee: Electronics and Telecommunications Research Institute
    Inventors: Jae Yeob Shim, Hyung Sup Yoon, Dong Min Kang, Ju Yeon Hong, Kyung Ho Lee
  • Publication number: 20100142115
    Abstract: Provided are a buried capacitor, a method of manufacturing the same, and a method of changing a capacitance thereof. The buried capacitor includes an upper electrode including at least one first hole, a lower electrode including at least one second hole, and a dielectric interposed between the upper electrode and the lower electrode.
    Type: Application
    Filed: July 8, 2009
    Publication date: June 10, 2010
    Applicant: ELECTRONICS AND TELECOMMUNICATIONS RESEARCH INSTITUTE
    Inventors: Hyun-Cheol Bae, Kwang-Seong Choi, Ju Yeon Hong, Jong Tae Moon, Yong il Jun
  • Publication number: 20090075463
    Abstract: A method of fabricating a T-gate is provided. The method includes the steps of: forming a photoresist layer on a substrate; patterning the photoresist layer formed on the substrate and forming a first opening; forming a first insulating layer on the photoresist layer and the substrate; removing the first insulating layer and forming a second opening to expose the substrate; forming a second insulating layer on the first insulating layer; removing the second insulating layer and forming a third opening to expose the substrate; forming a metal layer on the second insulating layer on which the photoresist layer and the third opening are formed; and removing the metal layer formed on the photoresist layer. Accordingly, a uniform and elaborate opening defining the length of a gate may be formed by deposition of the insulating layer and a blanket dry etching process, and thus a more elaborate micro T-gate electrode may be fabricated.
    Type: Application
    Filed: November 13, 2008
    Publication date: March 19, 2009
    Inventors: Jae Yoeb SHIM, Hyung Sup YOON, Dong Min KANG, Ju Yeon HONG, Kyung Ho LEE
  • Patent number: 7468295
    Abstract: A method of fabricating a T-gate is provided. The method includes the steps of: forming a photoresist layer on a substrate; patterning the photoresist layer formed on the substrate and forming a first opening; forming a first insulating layer on the photoresist layer and the substrate; removing the first insulating layer and forming a second opening to expose the substrate; forming a second insulating layer on the first insulating layer; removing the second insulating layer and forming a third opening to expose the substrate; forming a metal layer on the second insulating layer on which the photoresist layer and the third opening are formed; and removing the metal layer formed on the photoresist layer. Accordingly, a uniform and elaborate opening defining the length of a gate may be formed by deposition of the insulating layer and a blanket dry etching process, and thus a more elaborate micro T-gate electrode may be fabricated.
    Type: Grant
    Filed: December 1, 2006
    Date of Patent: December 23, 2008
    Assignee: Electronics and Telecommunications Research Institute
    Inventors: Jae Yoeb Shim, Hyung Sup Yoon, Dong Min Kang, Ju Yeon Hong, Kyung Ho Lee
  • Publication number: 20080080599
    Abstract: Provided is an RF transceiver for a 77 GHz forward-looking radar sensor. The RF transceiver whose essential components use a Monolithic Microwave Integrated Circuit (MMIC) includes an IF terminal including a transmitter, a receiver, and an Automatic Gain Control (AGC) circuit, one transmitting antenna, and three receiving antennas. The heterodyne RF transceiver for a radar sensor includes; a transmitter for generating a transmission signal and emitting the generated signal to a transmitting antenna; a local oscillating portion for generating a local oscillation wave; a first mixer for up-mixing the transmission signal with the low frequency; a receiver for receiving a reception signal from a receiving antenna; a second mixer for down-mixing a mixing signal of the first mixer with the reception signal; and an RF portion for outputting a beat signal from a mixing signal of the second mixer and the local oscillation wave.
    Type: Application
    Filed: April 20, 2007
    Publication date: April 3, 2008
    Inventors: Dong Min KANG, Ju Yeon HONG, Jae Yeob SHIM, Hyung Sup YOON, Kyung Ho LEE
  • Publication number: 20070128752
    Abstract: A method of fabricating a T-gate is provided. The method includes the steps of: forming a photoresist layer on a substrate; patterning the photoresist layer formed on the substrate and forming a first opening; forming a first insulating layer on the photoresist layer and the substrate; removing the first insulating layer and forming a second opening to expose the substrate; forming a second insulating layer on the first insulating layer; removing the second insulating layer and forming a third opening to expose the substrate; forming a metal layer on the second insulating layer on which the photoresist layer and the third opening are formed; and removing the metal layer formed on the photoresist layer. Accordingly, a uniform and elaborate opening defining the length of a gate may be formed by deposition of the insulating layer and a blanket dry etching process, and thus a more elaborate micro T-gate electrode may be fabricated.
    Type: Application
    Filed: December 1, 2006
    Publication date: June 7, 2007
    Inventors: Jae Yoeb Shim, Hyung Sup Yoon, Dong Min Kang, Ju Yeon Hong, Kyung Ho Lee